公开(公告)号：US07881010B2

公开(公告)日：2011-02-01

申请号：US11956277

申请日：2007-12-13

申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/187

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/315

摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.

摘要翻译： 一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。 该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。 形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。 第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。 从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

公开(公告)号：US20100163522A1

公开(公告)日：2010-07-01

申请号：US12345804

申请日：2008-12-30

申请人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22 ,  B05D5/12

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315

摘要： A method for manufacturing a magnetic write head. The write head is constructed by a method that includes depositing a magnetic write pole material and then depositing a hard mask over the magnetic material. An inorganic image transfer layer is formed over the hard mask. SiC, alumina, SiO2, SiN, Ta or TaOx. This image transfer is physically robust, so that it does not bend or tip over during manufacture. The image of a patterned photoresist layer can be transferred onto the underlying image transfer layer, and an ion milling can be performed to pattern the image of the image transfer layer onto the underlying hard mask and magnetic material, thereby forming a magnetic write pole.

摘要翻译： 一种用于制造磁写头的方法。 写头由包括沉积磁性写入磁极材料然后在磁性材料上沉积硬掩模的方法构成。 在硬掩模上形成无机图像转印层。 SiC，氧化铝，SiO2，SiN，Ta或TaOx。 这种图像传输是物理上坚固的，因此它在制造过程中不会弯曲或翻倒。 图案化的光致抗蚀剂层的图像可以转移到下面的图像转印层上，并且可以执行离子研磨以将图像转印层的图像图案化到下面的硬掩模和磁性材料上，从而形成磁性写入极。

公开(公告)号：US20100155364A1

公开(公告)日：2010-06-24

申请号：US12343726

申请日：2008-12-24

申请人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

摘要： A method for manufacturing a magnetic write head having a write pole a tapered trailing edge and a trailing, wrap-around magnetic shield with a slanted bump structure that steps away from the magnetic write pole. The method involves first forming a write pole and non-magnetic side gap layers, and then depositing a non-magnetic RIEable material. A mask is formed on the RIEable material and a reactive ion etching (RIE) is performed to form the RIEable material layer into a nonmagnetic bump with a tapered front edge.

摘要翻译： 一种用于制造具有锥形后缘的写入极和具有偏离磁性写入极的倾斜凸起结构的后部缠绕磁屏蔽的磁性写入头的方法。 该方法包括首先形成写磁极和非磁性侧隙层，然后沉积非磁性RIEable材料。 在RIEable材料上形成掩模，并执行反应离子蚀刻（RIE）以将RIEable材料层形成为具有锥形前边缘的非磁性凸块。

公开(公告)号：US08568601B2

公开(公告)日：2013-10-29

申请号：US11947616

申请日：2007-11-29

申请人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22 ,  H01L21/00

CPC分类号： G03B31/00

摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole using a mask that includes a hard mask layer deposited over the write pole laminate material, and a thick, physically robust image transfer layer. The image transfer layer can be a material such as AlTiO that can be patterned by a reactive ion etching process, but which also resists deformation during processing. This process allows a write pole and wrap-around trailing shield to be constructed at very narrow track widths without the mask deformation and fencing problems experienced by prior art methods.

摘要翻译： 一种用于制造用于垂直磁记录的磁写头的方法。 该方法包括使用掩模形成写入极，该掩模包括沉积在写磁极层压材料上的硬掩模层，以及厚的，物理上坚固的图像转印层。 图像转印层可以是诸如AlTiO的材料，其可以通过反应离子蚀刻工艺进行图案化，但也可以在加工过程中抵抗变形。 该过程允许在非常窄的轨道宽度上构造写极点和缠绕后挡板，而不会由现有技术方法遇到的掩模变形和围栏问题。

公开(公告)号：US08503131B2

公开(公告)日：2013-08-06

申请号：US13339310

申请日：2011-12-28

申请人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

发明人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

IPC分类号： G11B5/147

CPC分类号： G11B5/3166 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T428/11 ,  Y10T428/1186

摘要： A magnetic write head for perpendicular magnetic data recording. The write head includes a substrate and a magnetic write pole formed on the substrate, the write pole having a trailing edge and first and second sides. A magnetic stitched pole is formed over a portion of the magnetic write pole, the stitched pole having a front edge that defines a secondary flare point. First and second non-magnetic side walls are formed at the first and second sides of the write pole. The non-magnetic side walls extend from the substrate at least to the trailing edge of the write pole in a first region near an air bearing surface and wherein the first and second non-magnetic side walls extend from the substrate to a point between the substrate and the trailing edge, allowing the stitched magnetic pole to extend partially over the sides of the write pole.

摘要翻译： 用于垂直磁数据记录的磁写头。 写入头包括形成在衬底上的衬底和磁性写入磁极，写入极具有后缘和第一和第二侧。 在磁性写入磁极的一部分上形成有磁性的缝合磁极，缝合的磁极具有限定二次闪光点的前部边缘。 第一和第二非磁性侧壁形成在写入极的第一和第二侧。 所述非磁性侧壁在靠近空气支承表面的第一区域中从所述基板至少延伸到所述写柱的后缘，并且其中所述第一和第二非磁性侧壁从所述基板延伸到所述基板之间的点 和后缘，允许缝合的磁极部分地延伸在写柱的侧面上。

公开(公告)号：US08252190B2

公开(公告)日：2012-08-28

申请号：US12343720

申请日：2008-12-24

申请人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22 ,  G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/315 ,  G11B5/3163 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method for manufacturing a magnetic write head having a write pole with a tapered trailing edge step. The resulting tapered trailing edge step maximizes write field at very small bit sizes by preventing the magnetic saturation of the write pole at the pole tip. The method includes depositing a magnetic write pole material and then depositing a magnetic material over the magnetic write pole material. A RIE mask and hard mask are deposited over the magnetic bump material. A resist mask is formed over the RIE mask and hard mask, and a reactive ion etching is performed to transfer the pattern of the resist mask onto the underlying hard mask. Then an ion milling is performed to form a the magnetic step layer with a tapered edge that defines a tapered trailing edge step structure of the write pole.

摘要翻译： 一种用于制造具有具有锥形后缘台阶的写极的磁写头的方法。 所产生的锥形后沿步骤通过防止磁极尖端的写极的磁饱和而使非常小的位尺寸的写入场最大化。 该方法包括沉积磁性写入磁极材料，然后在磁性写入磁极材料上沉积磁性材料。 RIE掩模和硬掩模沉积在磁性凸块材料上。 在RIE掩模和硬掩模上形成抗蚀剂掩模，并且执行反应离子蚀刻以将抗蚀剂掩模的图案转移到下面的硬掩模上。 然后执行离子铣削以形成具有锥形边缘的磁性阶梯层，其限定了写入极的锥形后缘阶梯结构。

公开(公告)号：US08085497B2

公开(公告)日：2011-12-27

申请号：US12341834

申请日：2008-12-22

申请人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/127

CPC分类号： G11B5/3116 ,  G11B5/3163

摘要： A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.

摘要翻译： 根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面，并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向 所述极的沉积平面，其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。 根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层，以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面，以及从该平面以1°至89°之间的第二角度定向的第二表面 所述凸起层的沉积，其中所述第二角度大于所述第一角度。

公开(公告)号：US20100157474A1

公开(公告)日：2010-06-24

申请号：US12341834

申请日：2008-12-22

申请人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/127

CPC分类号： G11B5/3116 ,  G11B5/3163

摘要： A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.

摘要翻译： 根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面，并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向 所述极的沉积平面，其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。 根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层，以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面，以及从该平面以1°至89°之间的第二角度定向的第二表面 所述凸起层的沉积，其中所述第二角度大于所述第一角度。

公开(公告)号：US20100157472A1

公开(公告)日：2010-06-24

申请号：US12343709

申请日：2008-12-24

申请人： Wen-Chien David Hsiao ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/10 ,  B44C1/22

CPC分类号： G11B5/1278 ,  G11B5/112 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

摘要： A method for forming a magnetic write head having a trailing shield with a tapered and stepped, self aligned trailing magnetic shield. The shield has a tapered portion that tapers away from the write pole as it extends away from the ABS. This tapered portion helps to channel flux to the pole tip portion of the shield, while preventing the loss of write field to the shield. The stepped portion of the shield further helps to prevent the loss of write field and also defines a secondary throat height of the shield that can be accurately located relative to the air bearing surface.

摘要翻译： 一种用于形成具有带有锥形和阶梯式自对准拖尾磁屏蔽的后挡板的磁写头的方法。 屏蔽件具有锥形部分，当锥形部分远离ABS延伸时，该锥形部分从写入柱逐渐变细。 该锥形部分有助于将通量传导到屏蔽的极端部分，同时防止对屏蔽件的写入场的损失。 护罩的台阶部分还有助于防止写入场的损失，并且还限定可相对于空气轴承表面精确定位的护罩的次级喉部高度。

公开(公告)号：US20090139958A1

公开(公告)日：2009-06-04

申请号：US11947616

申请日：2007-11-29

申请人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22

CPC分类号： G03B31/00

摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole using a mask that includes a hard mask layer deposited over the write pole laminate material, and a thick, physically robust image transfer layer. The image transfer layer can be a material such as AlTiO that can be patterned by a reactive ion etching process, but which also resists deformation during processing. This process allows a write pole and wrap-around trailing shield to be constructed at very narrow track widths without the mask deformation and fencing problems experienced by prior art methods.

摘要翻译： 一种用于制造用于垂直磁记录的磁写头的方法。 该方法包括使用掩模形成写入极，该掩模包括沉积在写磁极层压材料上的硬掩模层，以及厚的，物理上坚固的图像转印层。 图像转印层可以是诸如AlTiO的材料，其可以通过反应离子蚀刻工艺进行图案化，但也可以在加工过程中抵抗变形。 该过程允许在非常窄的轨道宽度上构造写极点和缠绕后挡板，而不会由现有技术方法遇到的掩模变形和围栏问题。