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    Photopolymer Composition Usable for Lithographic Plates
    21.
    发明申请
    Photopolymer Composition Usable for Lithographic Plates 有权
    用于平版印刷板的光聚合物组合物

    公开(公告)号：US20090011363A1

    公开(公告)日：2009-01-08

    申请号：US12159287

    申请日：2007-01-02

    申请人： Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

    发明人： Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

    IPC分类号： G03C1/705 ,  G03C1/73 ,  G03F7/20

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368

    摘要： Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.

    摘要翻译： 辐射敏感元件包括基材和辐射敏感涂层，其包含（a）选自光引发剂和敏化剂/共引发剂体系中的至少一种成分，其吸收波长在250-1200nm范围内的辐射; （b）由三异氰酸酯与（i）至少一种丙烯酸或甲基丙烯酸单体与两个游离OH基团反应得到的至少一种平均分子量在3,500-9,000范围内的可自由基聚合的低聚物A， 至少一种（甲基）丙烯酸基和（ii）分子中至少一种含有一个OH基，至少一个（甲基）丙烯酸基和至少一个聚（环氧烷）链的化合物，其中（甲基）丙烯酸单体 基于具有OH官能度的（甲基）丙烯酸酯化合物的总量，i）的存在量为2至20摩尔％。

    Process for Production of Lithographic Printing Plates
    22.
    发明申请
    Process for Production of Lithographic Printing Plates 审中-公开

    公开(公告)号：US20080145790A1

    公开(公告)日：2008-06-19

    申请号：US11815578

    申请日：2006-02-01

    申请人： Harald Baumann ,  Ulrich Fiebag ,  Udo Dwars ,  Michael Flugel ,  Bernd Strehmel ,  Hans-Joachim Timpe

    发明人： Harald Baumann ,  Ulrich Fiebag ,  Udo Dwars ,  Michael Flugel ,  Bernd Strehmel ,  Hans-Joachim Timpe

    IPC分类号： G03F7/12

    CPC分类号： G03F7/322

    摘要： Process for the production of lithographic printing plates comprising (a) providing a lithographic substrate with a hydrophilic surface; (b) applying a negative working radiation-sensitive composition onto the hydrophilic surface, wherein the composition comprises: (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer which in the presence of at least one coinitiator and upon exposure to radiation of a wavelength of 300 to 750 to 1,100 nm initiates the free-radical polymerization of component (i); and (iii) at least one binder with acidic functional groups and is substantially not sensitive to the wavelength range of 480 to 750 nm; (c) image-wise exposure of the resulting negative working lithographic printing plate precursor to radiation selected from the wavelength range of 300 to 750 to 1,100 nm depending on the sensitizer or initiator system used; and (d) removing the non-irradiated areas by means of a treatment with an alkaline developer with a pH value in the range of 9 to 14 comprising (i) water, (ii) one or more alkali hydroxides in an amount sufficient for adjusting a pH value in the range of 9 to 14; and (iii) 1 to 30 wt.-% of at least one compound of formula (I) wherein R1, R2, R3 and R4 are each independently selected from C1-C12 alkyl groups and aryl groups, X is selected from —CH═CH—, —C≡C—, formula (II), formula (III), and formula (IV), n+m results in a value of 2 to 30 and p+q results in a value of 0 to 30, wherein in the case of p+q≠0 the ethylene oxide and propylene oxide units are present as blocks or randomly distributed.

    Method for Making a Lithographic Plate
    23.
    发明申请
    Method for Making a Lithographic Plate 失效
    制作平版印刷版的方法

    公开(公告)号：US20070254238A1

    公开(公告)日：2007-11-01

    申请号：US11573916

    申请日：2005-08-23

    申请人： Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Tanja Ebhradt ,  Detlef Pietsch

    发明人： Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Tanja Ebhradt ,  Detlef Pietsch

    IPC分类号： G03C1/00

    CPC分类号： B41N3/08

    摘要： Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs

    摘要翻译： 一种成像的平版印刷版的后处理方法，包括：（a）在平版印刷基板上提供包括图像区域和非图像区域的平版印刷版; （b）使步骤（a）的平版印刷版与包含亲水聚合物的溶液接触，所述溶液包含衍生自以下化合物的结构单元：（i）包含聚环氧烷链和至少一个自由基的结构单元的化合物 - 可聚合的，和（ii）能够与（i）的自由基可聚合结构单元共聚并且还包含至少一个具有pK <5的酸性官能团的单体，其中酸性 官能团可以作为游离酸基团或以盐的形式存在; （c）干燥。

    UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer
    24.
    发明授权
    UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer 失效
    用苯并恶唑衍生物及其类似物作为敏化剂的UV敏感平版印刷版前体

    公开(公告)号：US08632937B2

    公开(公告)日：2014-01-21

    申请号：US12161720

    申请日：2007-01-31

    申请人： Bernd Strehmel ,  Harald Baumann

    发明人： Bernd Strehmel ,  Harald Baumann

    IPC分类号： B41M5/00 ,  B41N1/00 ,  G03F7/00 ,  G03F7/26 ,  C07D413/00 ,  C07D498/00

    CPC分类号： G03F7/031 ,  C08F2/50 ,  Y10T428/24802

    摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer, and (iii) at least one coinitiator capable of forming free radicals together with the sensitizer, said coinitiator being other than metallocenes, characterized in that the at least one sensitizer comprises a compound of formula (I) wherein at least one of the groups R9 to R12 is a bulky group which has a van der Waals volume of at least 55 Å3.

    摘要翻译： 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由基聚合的烯键式不饱和基团，（ii）至少一种敏化剂，和（iii）至少一种能够与敏化剂一起形成自由基的共引发剂，所述共引发剂不是茂金属，其特征在于： 至少一种敏化剂包括式（I）的化合物，其中基团R 9至R 12中的至少一个是大体积基团，范德华体积至少为Å3。

    Negative-working imageable elements with overcoat
    25.
    发明授权
    Negative-working imageable elements with overcoat 有权
    负面工作可成像元素与大衣

    公开(公告)号：US08318405B2

    公开(公告)日：2012-11-27

    申请号：US12403458

    申请日：2009-03-13

    申请人： Christopher D. Simpson ,  Harald Baumann ,  Udo Dwars ,  Bernd Strehmel

    发明人： Christopher D. Simpson ,  Harald Baumann ,  Udo Dwars ,  Bernd Strehmel

    IPC分类号： B32B3/10 ,  G03F7/09 ,  G03F7/11

    CPC分类号： G03F7/092 ,  G03F7/11 ,  Y10T428/24802

    摘要： Negative-working imageable element can be used to provide lithographic printing plates. The imageable element has a suitable radiation-sensitive imageable layer and a water-soluble overcoat disposed on the imageable layer. This overcoat comprises at least one poly(vinyl alcohol) having a saponification degree of at least 90%, an alkoxylation product of an alkanol, and either a 2-sulfonato succinic acid dialkylester or an alkoxylation product of a 1,4-butanediol.

    摘要翻译： 负性可成像元件可用于提供平版印刷版。 可成像元件具有合适的辐射敏感可成像层和设置在可成像层上的水溶性外涂层。 该外涂层包含至少一种皂化度至少为90％的聚（乙烯醇），链烷醇的烷氧基化产物，2-磺酸丁二酸二烷基酯或1,4-丁二醇的烷氧基化产物。