-
公开(公告)号：US20070192756A1
公开(公告)日：2007-08-16
申请号：US11674133
申请日：2007-02-12
申请人： Daniel Abrams , Danping Peng , Stanley Osher
发明人： Daniel Abrams , Danping Peng , Stanley Osher
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.
-
22.发明授权公开(公告)号：US07178127B2
公开(公告)日：2007-02-13
申请号：US11209268
申请日：2005-08-22
申请人： Daniel Abrams , Danping Peng , Stanley Osher
发明人： Daniel Abrams , Danping Peng , Stanley Osher
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.
摘要翻译： 光掩模图案使用由级别集函数定义的轮廓来表示。 给定目标图案，轮廓被优化，使得定义的光掩模在光刻工艺中使用时，将晶片图案忠实地印刷到目标图案上。 优化利用“优点功能”来编码光刻工艺的方面，与所产生的图案有关的偏好（例如对直线图案的限制），对工艺变化的鲁棒性以及与光掩模的实际和经济可制造性有关的限制。
-
公开(公告)号：US20070011647A1
公开(公告)日：2007-01-11
申请号：US11225378
申请日：2005-09-12
申请人： Daniel Abrams , Danping Peng , Stanley Osher
发明人： Daniel Abrams , Danping Peng , Stanley Osher
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G03F1/36 , G06F2217/12 , Y02P90/265
摘要： Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.
-
公开(公告)号：US20070186208A1
公开(公告)日：2007-08-09
申请号：US11538420
申请日：2006-10-03
申请人： Daniel Abrams , Christopher Ashton
发明人： Daniel Abrams , Christopher Ashton
IPC分类号： G06F17/50
摘要： A method for determining a mask pattern is described. During the method, a first mask pattern that includes a plurality of second regions corresponding to the first regions of the photo-mask is provided. Then, a second mask pattern is determined based on the first mask pattern and differences between a target pattern and an estimate of a wafer pattern that results from the photolithographic process that uses at least a portion of the first mask pattern. Note that the determining includes different treatment for different types of regions in the target pattern, and the second mask pattern and the target pattern include pixilated images.
摘要翻译： 描述用于确定掩模图案的方法。 在该方法期间，提供了包括对应于光掩模的第一区域的多个第二区域的第一掩模图案。 然后，基于第一掩模图案确定第二掩模图案，并且使用由使用至少一部分第一掩模图案的光刻处理得到的目标图案与晶片图案的估计之间的差。 注意，确定包括对目标图案中的不同类型的区域的不同处理，并且第二掩模图案和目标图案包括像素化图像。
-
公开(公告)号：US20070198486A1
公开(公告)日：2007-08-23
申请号：US11466826
申请日：2006-08-24
申请人： Daniel Abrams , Sami Vaaraniemi
发明人： Daniel Abrams , Sami Vaaraniemi
IPC分类号： G06F17/30
CPC分类号： G06F16/951
摘要： A system and method for searching the Internet is presented wherein the search results are ordered and selected using one or more preference tools. One such tool consists of the user defining a reference index number that is employed to prioritize and re-rank at least some of the sites obtained by the search, comparing each site's parameters to the reference index number. Each index number includes several parameters in a preset order, each parameter being assigned a quantized relevance based on particular search criteria. Another tool makes use of at least one bundle of websites having particular user-settings designating credibility or trustworthiness. Websites from the search results are then accepted or ordered based on the contents of the bundles. Other tools adjust search criteria based on a desired number of search results and separate browser cookies into (1) those personally trusted and (2) all other cookies that are routinely purged.
摘要翻译： 呈现用于搜索因特网的系统和方法，其中使用一个或多个偏好工具对搜索结果进行排序和选择。 一个这样的工具包括用户定义参考索引号码，其用于对通过搜索获得的至少一些站点进行优先排序和重新排序，将每个站点的参数与参考索引号进行比较。 每个索引号码以预设顺序包括几个参数，每个参数根据特定的搜索条件分配一个量化的相关性。 另一个工具使用至少一个具有指定可信度或可信度的特定用户设置的网站。 搜索结果的网站将根据捆绑的内容进行接受或订购。 其他工具根据所需数量的搜索结果和单独的浏览器Cookie调整搜索条件（1）个人信任和（2）常规清除的所有其他Cookie。
-
公开(公告)号：US20070191695A1
公开(公告)日：2007-08-16
申请号：US11567597
申请日：2006-12-06
IPC分类号： A61B5/00
CPC分类号： A61B3/18 , A61B3/1233 , A61B3/125 , A61B3/16 , A61B5/0261 , A61B5/14555
摘要： A patient is monitored during a medical procedure, such as spinal surgery, to identify a condition indicative of the possible onset of blindness or damage to the patient's eye or eyes. Parameters that may be monitored in this regard include ocular perfusion, retinal oxygen saturation and ocular pressure. In one implementation, a device for monitoring the desired parameters includes a contact lens with fiber optic pathways mounted thereon. Light of multiple wavelengths can be transmitted into the patient's eyes via input optical pathways. Output optical pathways are associated with a camera for obtaining images of an area of interest within the patient's eyes. The images can be processed to obtain information regarding ocular perfusion and/or oxygen saturation. Changes in this regard can be used to identify a condition of interest.
摘要翻译： 在医疗过程（例如脊柱手术）期间监测患者，以识别指示可能发生失明或损害患者眼睛或眼睛的状况。 在这方面可以监测的参数包括眼睛灌注，视网膜氧饱和度和眼压。 在一个实施方案中，用于监测所需参数的装置包括其上安装有光纤路径的隐形眼镜。 多个波长的光可以通过输入光学路径传输到患者的眼睛。 输出光学路径与用于获得患者眼睛内的感兴趣区域的图像的相机相关联。 可以处理图像以获得关于眼睛灌注和/或氧饱和度的信息。 这方面的变化可以用来识别感兴趣的条件。
-
27.发明申请Fast systems and methods for calculating electromagnetic fields near photomasks 审中-公开用于计算光掩模附近的电磁场的快速系统和方法公开(公告)号：US20070011648A1
公开(公告)日：2007-01-11
申请号：US11245714
申请日：2005-10-06
申请人： Daniel Abrams
发明人： Daniel Abrams
摘要： Photomask patterns are represented using contours defined by mask functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks. Merit function may approximate electromagnetic field using model of mask pattern as infinitely thin, perfectly conducting pattern. Model may also be used for other lithographic methods, including simulation and verification.
摘要翻译： 光掩模图案使用由掩模功能定义的轮廓来表示。 给定目标图案，轮廓被优化，使得定义的光掩模在光刻工艺中使用时，将晶片图案忠实地印刷到目标图案上。 优化利用“优点功能”来编码光刻工艺的方面，与所产生的图案有关的偏好（例如对直线图案的限制），对工艺变化的鲁棒性以及与光掩模的实际和经济可制造性有关的限制。 优点功能可以使用掩模图案的模型近似电磁场作为无限薄，完美的导电图案。 模型也可用于其他光刻方法，包括模拟和验证。
-
28.发明申请OCULAR PARAMETER SENSING FOR CEREBRAL PERFUSION MONITORING AND OTHER APPLICATIONS 审中-公开用于胚胎灌注监测和其他应用的OCULAR PARAMETER SENSING公开(公告)号：US20070270673A1
公开(公告)日：2007-11-22
申请号：US11675178
申请日：2007-02-15
IPC分类号： A61B5/00
CPC分类号： A61B5/14555 , A61B3/1233 , A61B3/16 , A61B5/0261
摘要： A system and associated methodology allow for monitoring ocular parameters of a patient. Parameters that may be monitored in this regard include ocular perfusion, retinal oxygen saturation and ocular pressure. In one implementation, a device for monitoring the desired parameters includes a contact lens with fiber optic pathways mounted thereon. Light of multiple wavelengths can be transmitted into the patient's eyes via input optical pathways. Output optical pathways are associated with a camera for obtaining images of an area of interest within the patient's eyes. The images can be processed to obtain information regarding ocular perfusion and/or oxygen saturation. Changes in this regard can be used to identify a condition of interest.
摘要翻译： 系统和相关联的方法允许监视患者的眼部参数。 在这方面可以监测的参数包括眼睛灌注，视网膜氧饱和度和眼压。 在一个实施方案中，用于监测所需参数的装置包括其上安装有光纤路径的隐形眼镜。 多个波长的光可以通过输入光学路径传输到患者的眼睛。 输出光学路径与用于获得患者眼睛内的感兴趣区域的图像的相机相关联。 可以处理图像以获得关于眼睛灌注和/或氧饱和度的信息。 这方面的变化可以用来识别感兴趣的条件。
-
公开(公告)号：US20070184369A1
公开(公告)日：2007-08-09
申请号：US11538290
申请日：2006-10-03
申请人： Daniel Abrams , Christopher Ashton
发明人： Daniel Abrams , Christopher Ashton
CPC分类号： G06F17/5081 , G03F1/36
摘要： A method for verifying a lithographic process is described. During the method, a set of guard bands are defined around a target pattern that is to be printed on a semiconductor die using a photo-mask in the lithographic process. An estimated pattern is calculated using a model of the lithographic process. This model of the lithographic process includes a mask pattern corresponding to the photo-mask and a model of an optical path. Then, whether or not positions of differences between the estimated pattern and the target pattern exceeded one or more guard bands in the set of guard bands is determined.
摘要翻译： 描述了一种用于验证光刻工艺的方法。 在该方法期间，在平版印刷工艺中使用光掩模将待印刷在半导体管芯上的目标图案周围定义一组保护带。 使用光刻工艺的模型计算估计图案。 该光刻工艺的模型包括对应于光掩模的掩模图案和光路的模型。 然后，确定估计图案和目标图案之间的差异位置是否超过该组保护频带中的一个或多个保护频带。
-
公开(公告)号：US20070009808A1
公开(公告)日：2007-01-11
申请号：US11245691
申请日：2005-10-06
申请人： Daniel Abrams , David Irby
发明人： Daniel Abrams , David Irby
摘要： Photomask patterns are represented using contours defined by mask functions or other formats. Given target pattern, contours may be optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimized patterns or blocks may be simplified for mask manufacturing.
摘要翻译： 光掩模图案使用由掩模功能或其他格式定义的轮廓来表示。 给定目标图案，可以优化轮廓，使得定义的光掩模在光刻工艺中使用时，将晶片图案忠实地印刷到目标图案上。 对于掩模制造，可以简化优化的图案或块。
-
-
-
-
-
-
-
-
-
搜索结果
30 条记录 (耗时 0.03 秒)
