公开(公告)号：US20120157902A1

公开(公告)日：2012-06-21

申请号：US12973645

申请日：2010-12-20

Applicant: David Castillo ,  Daniel Castillo

Inventor： David Castillo ,  Daniel Castillo

IPC: A61F5/00

CPC classification number: A61F5/0123

Abstract: Provided is a brace including upper and lower frame members and upper and lower cuff members. An upper adjuster is coupled to the upper frame member and upper cuff member and is configured to enable selective adjustment of the distance between the upper frame member and the upper cuff member. An upper connector is coupled to the upper frame member and the upper cuff member and is configured to enable selective engagement between the upper frame member and the upper cuff member. A lower adjuster is coupled to the lower frame member and the lower cuff member and is configured to enable selective adjustment of the distance between the lower frame member and the lower cuff member. A lower connector is coupled to the lower frame member and the lower cuff member and is configured to enable selective engagement between the lower frame member and the lower cuff member.

Abstract translation: 提供了一种支架，其包括上框架构件和下框架构件以及上下袖口构件。 上调节器联接到上框架构件和上上箍构件，并且构造成能够选择性地调节上框架构件和上上箍构件之间的距离。 上连接器联接到上框架构件和上箍圈构件，并且构造成使得能够选择性地接合上框架构件和上箍圈构件。 下调节器联接到下框架构件和下袖套构件，并且构造成能够选择性地调节下框架构件和下袖套构件之间的距离。 下连接器联接到下框架构件和下袖套构件，并且构造成使得能够选择性地接合下框架构件和下袖套构件。

公开(公告)号：USD646790S1

公开(公告)日：2011-10-11

申请号：US29379234

申请日：2010-11-16

Applicant: David Castillo ,  Daniel Castillo

Designer： David Castillo ,  Daniel Castillo

公开(公告)号：US20060117667A1

公开(公告)日：2006-06-08

申请号：US11264027

申请日：2005-11-02

Applicant: Junaid Siddiqui ,  Robert Small ,  Daniel Castillo

Inventor： Junaid Siddiqui ,  Robert Small ,  Daniel Castillo

IPC: C09K3/14

CPC classification number: C09G1/02 ,  C03C19/00 ,  C09K3/1463 ,  C23F3/04 ,  G11B5/3163 ,  G11B5/3169 ,  H01L21/3212

Abstract: A CMP composition having: a fluid comprising water and at least one oxidizing compound that produces free radicals when contacted with an activator; and a plurality of particles having a surface and comprising at least one activator selected from ions or compounds of Cu, Fe, Mn, Ti, or mixtures thereof disposed on said surface, wherein at least a portion of said surface comprises a stabilizer. Preferred activators are selected from inorganic oxygen-containing compounds of B, W, Al, and P, for example borate, tungstate, aluminate, and phosphate. The activators are preferably ions of Cu or Fe. Surprisingly, as little as 0.2 ppm and 12 ppm of activator is useful, if the activator-containing particles are suspended in the fluid as a slurry. Advantageously, certain organic acids, and especially dihydroxy enolic acids, are included in an amount less than about 4000 ppm. Advantageously, activator is coated onto abrasive particles after the particles have been coated with stabilizer.