利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

55 条记录 (耗时 0.022 秒)

    Mask forming methods and a field emission display emitter mask forming method
    22.
    发明授权
    Mask forming methods and a field emission display emitter mask forming method 失效
    掩模形成方法和场发射显示发射体掩模形成方法

    公开(公告)号：US06586144B2

    公开(公告)日：2003-07-01

    申请号：US09819165

    申请日：2001-03-27

    申请人： John Michiels ,  David Wells ,  Eric J. Knappenberger ,  James J. Alwan

    发明人： John Michiels ,  David Wells ,  Eric J. Knappenberger ,  James J. Alwan

    IPC分类号： G03F900

    CPC分类号： G03F7/00 ,  G03F7/0015 ,  H01J9/025 ,  H01J2329/00 ,  H01L21/0271 ,  H01L21/3081 ,  H01L21/31144 ,  Y10S430/15

    摘要： The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.

    摘要翻译： 本发明包括结构，光刻掩模形成溶液，掩模形成方法，场致发射显示发射体掩模形成方法以及形成多场发射显示发射体的方法。 本发明的一个方面提供一种掩模形成方法，包括在衬底的表面上形成掩模层; 在掩模层的表面上方式印刷多个掩蔽粒子; 以及使用所述掩模颗粒作为掩模去除所述掩蔽层的至少一部分。 本发明的另一方面提供了一种形成多个场发射显示发射器的方法。 该方法包括在发射极基板上形成掩模层; 在掩模层上方丝网印刷多个掩模颗粒; 去除屏幕印刷掩模颗粒之间的掩模层的部分以形成多个掩模元件; 从掩蔽元件去除掩蔽粒子; 以及去除所述发射极基板的部分以形成多个发射极。

    Method of making a field emission device with buffer layer
    23.
    发明授权
    Method of making a field emission device with buffer layer 有权
    制造具有缓冲层的场致发射器件的方法

    公开(公告)号：US06425791B1

    公开(公告)日：2002-07-30

    申请号：US09652746

    申请日：2000-08-31

    申请人： Kanwal K. Raina ,  James J. Alwan

    发明人： Kanwal K. Raina ,  James J. Alwan

    IPC分类号： H01J902

    CPC分类号： H01J1/3044 ,  H01J31/127 ,  H01J2201/30403

    摘要： A field emission device is disclosed having a buffer layer positioned between an underlying cathode conductive layer and an overlying resistor layer. The buffer layer consists of substantially undoped amorphous silicon. Any pinhole defects or discontinuities that extend through the resistor layer terminate at the buffer layer, thereby preventing the problems otherwise caused by pinhole defects. In particular, the buffer layer prevents breakdown of the resistor layer, thereby reducing the possibility of short circuiting. The buffer layer further reduces the risk of delamination of various layers or other irregularities arising from subsequent processing steps. Also disclosed are methods of making and using the field emission device having the buffer layer.

    摘要翻译： 公开了一种场致发射器件，其具有位于下面的阴极导电层和上覆电阻层之间的缓冲层。 缓冲层由基本上未掺杂的非晶硅组成。 延伸通过电阻层的任何针孔缺陷或不连续性终止于缓冲层，从而防止由针孔缺陷引起的问题。 特别地，缓冲层防止了电阻层的破坏，从而降低了短路的可能性。 缓冲层进一步降低了由后续处理步骤引起的各种层的分层或其它不规则的风险。 还公开了制造和使用具有缓冲层的场致发射器件的方法。

    Apparatuses for forming layers
    24.
    发明授权
    Apparatuses for forming layers 失效
    用于形成层的装置

    公开(公告)号：US06409835B1

    公开(公告)日：2002-06-25

    申请号：US09396388

    申请日：1999-09-15

    申请人： James J. Alwan

    发明人： James J. Alwan

    IPC分类号： B05C300

    CPC分类号： H01J9/025 ,  B05D1/20

    摘要： In one aspect, the invention includes a method of forming a layer of particulates on a substrate, comprising: a) fastening a first substrate to a second substrate; b) while the first substrate is fastened to the second substrate, submerging at least a portion of the first substrate in a liquid; c) suspending particulates on an upper surface of the liquid; d) moving the submerged first substrate relative to the suspended particulates to form a layer of the particulates supported on the first substrate; and e) removing the first substrate from the second substrate. In another aspect, the invention includes a layer forming apparatus, comprising: a) a vessel configured to retain a liquid; b) a pusher bar joined to the vessel and configured to compress particulates on an upper surface of the liquid; c) a conveyor which enters and exits the vessel, the conveyor being configured to removably retain substrates and to transport such substrates through the vessel, the conveyor having a front surface that faces the pusher bar and a back surface in opposing orientation relative to the front surface; and d) the vessel, conveyor and pusher bar being configured to form a layer of the particulates on substrates as the substrates are transported through the vessel by the conveyor.

    摘要翻译： 一方面，本发明包括在基底上形成颗粒层的方法，包括：a）将第一基底固定到第二基底; b）当第一基板紧固到第二基板时，将第一基板的至少一部分浸没在液体中; c）将颗粒悬浮在液体的上表面上; d）相对于悬浮颗粒移动浸没的第一衬底以形成支撑在第一衬底上的微粒层; 以及e）从所述第二衬底移除所述第一衬底。 在另一方面，本发明包括层形成装置，包括：a）构造成保持液体的容器; b）连接到容器并被构造成压缩液体上表面上的微粒的推杆; c）进入和离开容器的输送机，所述输送机被配置为可移除地保持基板并且将所述基板运送通过所述容器，所述输送机具有面向所述推杆的前表面和相对于所述前端的相反方向的后表面 表面; 以及d）所述容器，输送机和推杆构造成在基板通过输送机输送通过容器时在基底上形成一层颗粒。

    Magnetically patterned etch mask
    26.
    发明授权
    Magnetically patterned etch mask 失效
    磁图案蚀刻掩模

    公开(公告)号：US06174449B1

    公开(公告)日：2001-01-16

    申请号：US09079252

    申请日：1998-05-14

    申请人： James J. Alwan ,  Eric Knappenberger

    发明人： James J. Alwan ,  Eric Knappenberger

    IPC分类号： G03G1900

    CPC分类号： H01J9/025 ,  H01L21/0337

    摘要： A method for forming an etch mask is described. In particular, an etch mask is formed using masking particles positionally restrained by a matrix medium. Either the masking particles or the matrix medium is more magnetically conductive with respect to the other. A magnetic field is applied for making a random distribution of the masking particles less random. Consequently, agglomeration of the masking particles is reduced. Masking particles with submicron dimensions may be used for providing features of less than a micron. The mask formed may be an etch mask employed in forming a field emitter tip for a field emission display.

    摘要翻译： 描述了形成蚀刻掩模的方法。 特别地，使用由基质介质位置约束的掩模颗粒形成蚀刻掩模。 掩模颗粒或基质介质相对于另一个更具有导磁性。 施加磁场以使掩蔽粒子的随机分布更少随机。 因此，掩蔽颗粒的团聚减少。 具有亚微米尺寸的掩模颗粒可用于提供小于一微米的特征。 形成的掩模可以是用于形成用于场致发射显示的场发射器尖端的蚀刻掩模。

    Process for low temperature semiconductor fabrication
    27.
    发明授权
    Process for low temperature semiconductor fabrication 失效
    低温半导体制造工艺

    公开(公告)号：US6080032A

    公开(公告)日：2000-06-27

    申请号：US356852

    申请日：1999-07-19

    申请人： James J. Alwan

    发明人： James J. Alwan

    IPC分类号： H01J9/02

    CPC分类号： H01J9/025

    摘要： A method for forming semiconductor devices without utilizing high temperature processing involves forming a surface porous silicon layer. The surface porous silicon layer may be removed by selective etching or it may be oxidized and then removed by selective etching. In the case of a field emission display, the porous silicon formation process is sufficiently controllable that uniform emitters may be formed. Moreover, by maintaining the structure at a temperature below the temperature at which substantial diffusion of alkaline constituents occurs, soda-lime glass may be used as a substrate for making semiconductor devices.

    摘要翻译： 在不利用高温处理的情况下形成半导体器件的方法包括形成表面多孔硅层。 表面多孔硅层可以通过选择性蚀刻去除，或者可以被氧化，然后通过选择性蚀刻除去。 在场发射显示的情况下，可以充分地控制多孔硅形成过程，从而可以形成均匀的发射体。 此外，通过将结构保持在低于碱性成分的实质扩散的温度以下的温度，钠钙玻璃可以用作制造半导体器件的基板。

    Structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters
    30.
    发明授权
    Structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters 失效
    结构，光刻掩模形成方法，掩模形成方法，场发射显示发射体掩模形成方法和形成多个场发射显示发射体的方法

    公开(公告)号：US06458515B2

    公开(公告)日：2002-10-01

    申请号：US09947648

    申请日：2001-09-05

    申请人： John Michiels ,  David Wells ,  Eric J. Knappenberger ,  James J. Alwan

    发明人： John Michiels ,  David Wells ,  Eric J. Knappenberger ,  James J. Alwan

    IPC分类号： G03C500

    CPC分类号： G03F7/00 ,  G03F7/0015 ,  H01J9/025 ,  H01J2329/00 ,  H01L21/0271 ,  H01L21/3081 ,  H01L21/31144 ,  Y10S430/15

    摘要： The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.

    摘要翻译： 本发明包括结构，光刻掩模形成溶液，掩模形成方法，场致发射显示发射体掩模形成方法以及形成多场发射显示发射体的方法。 本发明的一个方面提供一种掩模形成方法，包括在衬底的表面上形成掩模层; 在掩模层的表面上方式印刷多个掩蔽粒子; 以及使用所述掩模颗粒作为掩模去除所述掩蔽层的至少一部分。 本发明的另一方面提供了一种形成多个场发射显示发射器的方法。 该方法包括在发射极基板上形成掩模层; 在掩模层上方丝网印刷多个掩模颗粒; 去除屏幕印刷掩模颗粒之间的掩模层的部分以形成多个掩模元件; 从掩蔽元件去除掩蔽粒子; 以及去除所述发射极基板的部分以形成多个发射极。