Optical system for detecting anomalies and/or features of surfaces
    21.
    发明授权
    Optical system for detecting anomalies and/or features of surfaces 有权
    用于检测表面异常和/或特征的光学系统

    公开(公告)号:US07365834B2

    公开(公告)日:2008-04-29

    申请号:US10874861

    申请日:2004-06-22

    IPC分类号: G01N21/00

    摘要: A surface inspection of the system applies a first oblique illumination beam and may also apply a second illumination beam to illuminate a surface either sequentially or simultaneously. Radiation reflected or scattered is collected by preferably three collection channels and detected by three corresponding detector arrays, although a different number of channels and detector arrays may be used. One or both illumination beams are focused to a line on the surface to be inspected and each line is imaged onto one or more detector arrays in the up to three or more detection and collection channels. Relative motion is caused between the lines and the surface inspected in a direction perpendicular to the lines, thereby increasing throughput while retaining high resolution and sensitivity. The same detection channels may be employed by detecting scattered or reflected radiation from both illumination beams. Fourier filters may be employed to filter out diffraction at one or more different spatial frequencies.

    摘要翻译: 系统的表面检查应用第一倾斜照明光束并且还可以施加第二照明光束以顺序地或同时地照射表面。 尽管可以使用不同数量的通道和检测器阵列,但优选地通过三个收集通道收集反射或散射的辐射并且由三个对应的检测器阵列检测。 一个或两个照明光束被聚焦到要检查的表面上的线,并且每条线被成像到多达三个或更多个检测和收集通道中的一个或多个检测器阵列上。 在垂直于线路的方向上在线和表面之间产生相对运动,从而在保持高分辨率和灵敏度的同时增加产量。 可以通过检测来自两个照明光束的散射或反射辐射来采用相同的检测通道。 可以使用傅立叶滤波器来滤出在一个或多个不同空间频率处的衍射。

    System for detecting anomalies and/or features of a surface
    22.
    发明授权
    System for detecting anomalies and/or features of a surface 有权
    用于检测表面的异常和/或特征的系统

    公开(公告)号:US07280199B2

    公开(公告)日:2007-10-09

    申请号:US10949078

    申请日:2004-09-24

    IPC分类号: G01N21/88

    CPC分类号: G01N21/9501

    摘要: A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.

    摘要翻译: 使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上,其中线基本上在聚焦束的入射平面中。 光束的图像被投影到平行于线的电荷耦合器件的阵列上,用于检测表面的异常和/或特征,其中阵列位于聚焦光束的入射平面之外。

    Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination
    23.
    发明申请
    Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination 有权
    使用多角度和多波长照明的晶圆检查系统的系统和方法

    公开(公告)号:US20060007435A1

    公开(公告)日:2006-01-12

    申请号:US11227555

    申请日:2005-09-14

    IPC分类号: G01N21/88

    摘要: A method for detecting an anomaly on a top surface of a substrate comprises directing a first radiation beam having a first wavelength at the top surface of the substrate at a first angle measured from normal, and directing a second radiation beam having a second wavelength at the top surface of the substrate at a second angle measured from normal, wherein the second wavelength is not equal to the first wavelength. The method then comprises detecting scattered radiation from the first radiation beam and the second radiation beam to detect the presence of particles or COPs, and to differentiate between the two. Differences in the scattered radiation detected from the first radiation beam and from the second radiation beam provide the data needed to differentiate between particles and COPs.

    摘要翻译: 用于检测衬底的顶表面上的异常的方法包括以从正常测量的第一角度引导具有第一波长的第一辐射束在衬底的顶表面处,并且将具有第二波长的第二辐射束引导到 从正常测量的第二角度的衬底的顶表面,其中第二波长不等于第一波长。 该方法然后包括检测来自第一辐射束和第二辐射束的散射辐射,以检测颗粒或COP的存在,并区分两者。 从第一辐射束和第二辐射束检测的散射辐射的差异提供了区分颗粒和COP之间所需的数据。

    Systems and methods for simultaneous or sequential multi-perspective specimen defect inspection
    24.
    发明授权
    Systems and methods for simultaneous or sequential multi-perspective specimen defect inspection 有权
    用于同时或顺序多视角样本缺陷检查的系统和方法

    公开(公告)号:US06922236B2

    公开(公告)日:2005-07-26

    申请号:US10192813

    申请日:2002-07-10

    摘要: Systems and methods for inspecting a surface of a specimen such as a semiconductor wafer are provided. A system may include an illumination system configured to direct a first beam of light to a surface of the specimen at an oblique angle of incidence and to direct a second beam of light to a surface of the specimen at a substantially normal angle. The system may also include a collection system configured to collect at least a portion of the first and second beams of light returned from the surface of the specimen. In addition, the system may include a detection system. The detection system may be configured to process the collected portions of the first and second beams of light. In this manner, a presence of defects on the specimen may be detected from the collected portions of the first and second beams of light.

    摘要翻译: 提供了用于检查诸如半导体晶片的样本的表面的系统和方法。 系统可以包括照明系统,其被配置为以倾斜的入射角度将第一光束引导到样品的表面,并以基本上一般的角度将第二光束引导到样品的表面。 系统还可以包括收集系统,其被配置为收集从样本表面返回的第一和第二光束的至少一部分。 另外,该系统可以包括检测系统。 检测系统可以被配置为处理第一和第二光束的收集部分。 以这种方式,可以从第一和第二光束的收集部分检测出样本上的缺陷。

    Metrology system using optical phase
    25.
    发明授权
    Metrology system using optical phase 失效
    计量系统采用光学相位

    公开(公告)号:US06710876B1

    公开(公告)日:2004-03-23

    申请号:US09639495

    申请日:2000-08-14

    IPC分类号: G01B1100

    CPC分类号: G03F7/70633

    摘要: Misalignment error between two periodic structures such as two overlay targets placed side-by-side is measured. The two structures are illuminated by coherent radiation and the positive and negative diffraction beams of the input beam by the two structures are detected to discover the optical phase difference between the positive and negative diffraction beams. The misalignment between the two structures may then be ascertained from the phase difference.

    摘要翻译: 测量两个周期性结构(如并排放置的两个叠加目标)之间的对准误差。 这两个结构被相干辐射照射,并且检测由两个结构的输入光束的正和负衍射光束以发现正和负衍射光束之间的光学相位差。 然后可以从相位差确定两个结构之间的未对准。

    System for detecting anomalies and/or features of a surface
    27.
    发明授权
    System for detecting anomalies and/or features of a surface 失效
    用于检测表面的异常和/或特征的系统

    公开(公告)号:US06608676B1

    公开(公告)日:2003-08-19

    申请号:US08904892

    申请日:1997-08-01

    IPC分类号: G01N2100

    CPC分类号: G01N21/9501

    摘要: A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.

    摘要翻译: 使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上,其中线基本上在聚焦束的入射平面中。 光束的图像被投影到平行于线的电荷耦合器件的阵列上,用于检测表面的异常和/或特征,其中阵列位于聚焦光束的入射平面之外。

    Massively parallel inspection and imaging system
    28.
    发明授权
    Massively parallel inspection and imaging system 有权
    大规模并行检测和成像系统

    公开(公告)号:US06208411B1

    公开(公告)日:2001-03-27

    申请号:US09161864

    申请日:1998-09-28

    IPC分类号: G01N2188

    摘要: A massively parallel inspection and imaging system is provided which employs multiple focused beams to illuminate a specimen. Laser light energy passes through a relatively low resolution diffraction grating or digital optical element, which is either one or two dimensional, and concentrates the transmitted energy into multiple discrete directions or orders. The beams split by the diffraction grating pass through a beam expander or telescope and are recombined onto an optical element and diverted toward the specimen. On reflection toward the specimen, the beams diverge again toward a focusing objective. The resultant light thus comprises multiple focused beams, and a relatively large area of the specimen is illuminated simultaneously by these beams. Upon reflection of the light from the sample, light passes back through the focusing objective in multiple beams, and the beams converge toward the optical element and diverge outward in collimated beams. The collimated beams pass through a focusing lens, which brings all beams onto foci on a detector array. Scanning of patterned wafers by the system may occur using coordinated motion of both the scanning beam and the wafer. To achieve proper orientation and observation, the stage speed in the cross direction is set at the ratio of the distance between the first and last lines divided by the period of the scanner.

    摘要翻译: 提供了大量平行的检查和成像系统,其采用多个聚焦光束照射样本。 激光能量通过相对低分辨率的衍射光栅或数字光学元件,其为一维或二维,并将透射的能量集中到多个离散的方向或次序。 由衍射光栅分裂的光束通过光束扩展器或望远镜,并重新组合到光学元件上并朝向样本转移。 在对样本的反射时,光束再次朝向聚焦目标发散。 所得到的光由此包括多个聚焦光束,并且通过这些光束同时照射样本的相对较大的面积。 当来自样品的光反射时,光以多个光束返回穿过聚焦物镜,并且光束朝向光学元件会聚,并在准直光束中向外发散。 准直光束通过聚焦透镜,其将所有光束带到检测器阵列上的焦点上。 通过系统扫描图案化晶片可以使用扫描光束和晶片两者的协调运动来进行。 为了实现适当的取向和观察,将横向的台阶速度设定为第一行和最后一行之间的距离除以扫描仪的周期之间的比率。

    Single laser bright field and dark field system for detecting anomalies
of a sample
    30.
    发明授权
    Single laser bright field and dark field system for detecting anomalies of a sample 失效
    单个激光亮场和暗场系统,用于检测样品的异常

    公开(公告)号:US5798829A

    公开(公告)日:1998-08-25

    申请号:US611109

    申请日:1996-03-05

    CPC分类号: G01N21/9501 G01N2021/8825

    摘要: A single laser is used to provide light for both dark and bright field detection. The laser beam is split into two beams by a Wollaston prism and both beams are directed towards a sample to be inspected to illuminate two areas of the sample. The light reflected by or transmitted through the sample at the two spots is then combined by the same or a different Wollaston prism and the phase shift caused by any anomaly of a sample is detected as a phase shift between the two beams by a bright field detector. Light scattered by the sample at the two spots is detected by a dark field detector. A halfwave plate is used to orient the polarization plane of light from the laser incident on the Wollaston prism so that one of the two beams incident on the sample has a much higher intensity than the other and so that the sensitivity and the detection operation of dark field is not altered by the presence of two illuminated spots on the sample. A transparent dielectric at a suitable angle to the incident beam and the reflected or transmitted beam may be used to enhance bright field detection.

    摘要翻译: 单个激光器用于为暗场和明场检测提供光。 激光束被Wollaston棱镜分成两个光束,并且两个光束被引向待检查的样品以照射样品的两个区域。 然后通过相同或不同的Wollaston棱镜将由两个点反射或透过样品的光组合起来,并且由样品的任何异常引起的相移通过亮场检测器被检测为两个光束之间的相移 。 在两个点处由样品散射的光由暗场检测器检测。 使用半波片来定向来自入射在渥拉斯顿棱镜上的激光的光的偏振平面,使得入射到样品上的两束光束中的一个具有比另一个更强的强度,并且使得黑暗的灵敏度和检测操作 样品上存在两个发光斑点不会改变光场。 可以使用与入射光束和反射或透射光束成适当角度的透明电介质来增强亮场检测。