Apparatus for electrowinning multivalent metals
    21.
    发明授权
    Apparatus for electrowinning multivalent metals 失效
    电渗析多价金属的装置

    公开(公告)号:US4116801A

    公开(公告)日:1978-09-26

    申请号:US722916

    申请日:1976-09-13

    IPC分类号: C25C3/28 C25C7/04 C25C3/22

    CPC分类号: C25C7/04 C25C3/28

    摘要: An apparatus to electrolytically produce multivalent metals, such as titanium, from compounds thereof. The apparatus includes a suitable containing body with an anode and a cathode in compartments therein spaced apart by a foraminous metallic diaphragm. The diaphragm has a diaphragm coefficient of greater than zero to about 0.5 when the coefficient of flow is about 0.1 to about 25. A multivalent metal compound feed means is combined with the cathode compartment to supply a multivalent metal compound to a molten salt electrolyte in the cathode compartment. The apparatus is sealed from the atmosphere to avoid contamination of the bath and metal product with certain atmospheric gases. Means of providing sufficient electrical and thermal energy to operate the cell are provided.

    摘要翻译: 从其化合物电解制造多价金属如钛的设备。 该装置包括适当的容纳体,其中隔室中具有阳极和阴极,其间隔有多孔金属隔膜。 当流动系数为约0.1至约25时,膜片具有大于零至约0.5的膜片系数。多价金属化合物进料装置与阴极室结合,以将多价金属化合物供应至熔融盐电解质 阴极室。 该装置与大气密封,以避免浴和金属产品被某些大气气体污染。 提供了提供足够的电和热能来操作电池的手段。

    Method to produce multivalent metals from fused bath and metal
electrowinning feed cathode apparatus
    22.
    发明授权
    Method to produce multivalent metals from fused bath and metal electrowinning feed cathode apparatus 失效
    从熔池和金属电解提取阴极装置制备多价金属的方法

    公开(公告)号:US4113584A

    公开(公告)日:1978-09-12

    申请号:US722851

    申请日:1976-09-13

    申请人: David R. Johnson

    发明人: David R. Johnson

    摘要: Feed cathode for an electrolytic cell with a feed conduit suited to pass a metal compound therethrough from a source to an electrolyte in the cell. The feed cathode includes a member surrounding and substantially entirely enclosing at least an outlet of the conduit. The member is at least partially formed of an electrically conductive foraminous body suited to pass the electrolyte and ions of a multivalent metal compound therethrough. Preferably, the foraminous body has an electrical coefficient of greater than zero to about 1 and a flow coefficient of from about 0.1 to about 300.

    摘要翻译: 用于具有适于使金属化合物从源极通过电池中的电解质的馈电导管的电解池的进料阴极。 进料阴极包括围绕并基本上完全包围导管的至少一个出口的构件。 该构件至少部分地由适于使电解质和多价金属化合物的离子通过的导电多孔体形成。 优选地,多孔体具有大于零至约1的电系数和约0.1至约300的流动系数。

    Process to enhance oxidation stability of base oils by analysis of olefins using Â1H NMR
    24.
    发明授权
    Process to enhance oxidation stability of base oils by analysis of olefins using Â1H NMR 失效
    通过使用1 H NMR分析烯烃来提高基础油的氧化稳定性的方法

    公开(公告)号:US07578926B2

    公开(公告)日:2009-08-25

    申请号:US11111120

    申请日:2005-04-20

    摘要: A process for producing a lubricating base oil having high oxidation stability, wherein the feed used to prepare the lubricating base oil contains at least 5 wt. % olefins, said process comprising (a) determining the weight percent of olefins present in the feed by means of 1H NMR; (b) hydroprocessing the feed under hydroprocessing conditions selected to reduce the amount of olefins present to a target value which has been pre-determined by means of 1H NMR to produce a lubricating base oil having the desired oxidation stability; and (c) collecting a lubricating base oil having the selected oxidation stability from the hydroprocessing zone.

    摘要翻译: 一种生产具有高氧化稳定性的润滑基础油的方法,其中用于制备润滑油基础油的进料含有至少5wt。 所述方法包括(a)通过1 H NMR确定进料中存在的烯烃的重量百分比; (b)在加氢处理条件下加氢处理所述进料,所述加氢处理条件被选择以将存在的烯烃的量减少到已经通过1 H NMR预测的目标值,以产生具有所需氧化稳定性的润滑油基础油; 和(c)从加氢处理区收集具有选择的氧化稳定性的润滑基础油。

    Method and apparatus for automated, in situ material detection using filtered fluoresced, reflected, or absorbed light
    25.
    发明授权
    Method and apparatus for automated, in situ material detection using filtered fluoresced, reflected, or absorbed light 失效
    使用过滤的荧光,反射或吸收光进行自动化,原位材料检测的方法和装置

    公开(公告)号:US07102737B2

    公开(公告)日:2006-09-05

    申请号:US10861738

    申请日:2004-06-04

    IPC分类号: G01N21/64 G01N21/88

    摘要: A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface are disclosed. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit, which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

    摘要翻译: 公开了一种在样品表面上检测特定材料如光致抗蚀剂材料的方法和装置。 将窄光束投影到样品表面上,并且通过光检测器测量在特定波长带处的荧光和/或反射光强度。 光强度被转换为数值,并以电子方式传输到逻辑电路,这决定了样品的正确配置。 逻辑电路控制一个样本处理机器人装置,该装置将样本顺序地传送到用于测试和随后的配置的阶段。 该方法对于在半导体晶片的表面上检测光致抗蚀剂材料特别有用。

    Method and apparatus for plasma etching a wafer
    26.
    发明授权
    Method and apparatus for plasma etching a wafer 失效
    用于等离子体蚀刻晶片的方法和装置

    公开(公告)号:US06838390B2

    公开(公告)日:2005-01-04

    申请号:US09507465

    申请日:2000-02-22

    IPC分类号: H01L21/00 H01L21/302

    摘要: A method utilizing a plasma etching machine which comprises a process chamber defining an interior region and including a bottom wall having an aperture and a block disposed in the aperture and including a longitudinally extending bore. A shaft extends through the bore and includes a spider push rod extending longitudinally therethrough. An internally cooled chuck is coupled to the shaft and disposed in the interior region and cooperates with the shaft to define a chamber. A spider is disposed in the chamber and is coupled to the push rod. A lift mechanism is coupled to the shaft and the push rod so that the spider pushes up on a wafer in response to actuation of the lift mechanism. A wafer clamping mechanism is coupled to the push rod if a mechanical clamp is used. In the case of electrostatic clamp the bias applied to the chuck is coupled with the use of a rotational roller to allow the bias to be applied to the chuck for the duration of the etch process. A RF source is needed for ionization of the gas. If the plasma etching machine has RF power applied through the bottom, then a rotational roller is used for this as well and must be isolated from the electrostatic voltage used to clamp the wafer.

    Conveyor and lubricating apparatus, lubricant dispensing device, and method for applying lubricant to conveyor
    27.
    发明授权
    Conveyor and lubricating apparatus, lubricant dispensing device, and method for applying lubricant to conveyor 有权
    输送和润滑装置,润滑剂分配装置以及向输送机施加润滑剂的方法

    公开(公告)号:US06688434B2

    公开(公告)日:2004-02-10

    申请号:US10080909

    申请日:2002-02-22

    IPC分类号: F16N1322

    CPC分类号: B65G45/02

    摘要: A conveyor and lubricating apparatus includes a conveyor and a dispensing device. The conveyor includes a conveyor surface and is provided for transporting items on the conveyor surface. Exemplary items that can be transported include plastic bottles, glass bottles, cans, and cartons. The dispensing device provides a spray pattern of a lubricant composition onto the conveyor surface. The dispensing device includes a nozzle that generates the spray pattern, a lubricant dispensing line that supplies the lubricant composition to the nozzle, a nozzle valve that opens and closes in response to the pressure conditions within the lubricant dispensing line to control flow of the lubricant composition to the nozzle, and a spray valve constructed to move between a first position and a second position, wherein the first position causes pressurization of the lubricant dispensing line and the second position provides depressurization of the lubricant dispensing line. A dispensing device is provided and a method for applying a lubricant composition to a conveyor is provided.

    摘要翻译: 输送机和润滑装置包括输送机和分配装置。 输送机包括输送机表面,并且用于输送输送机表面上的物品。 可运输的示例性物品包括塑料瓶,玻璃瓶,罐和纸箱。 分配装置在输送机表面上提供润滑剂组合物的喷雾图案。 分配装置包括产生喷射图案的喷嘴,将润滑剂组合物供应到喷嘴的润滑剂分配管线,响应于润滑剂分配管线内的压力条件而打开和关闭以控制润滑剂组合物的流动的喷嘴阀 以及构造成在第一位置和第二位置之间移动的喷射阀,其中所述第一位置引起所述润滑剂分配管线的加压,并且所述第二位置提供所述润滑剂分配管线的减压。 提供了一种分配装置,并且提供了一种将润滑剂组合物施加到输送机的方法。

    Dynamically updating impedance compensation code for input and output drivers
    28.
    发明授权
    Dynamically updating impedance compensation code for input and output drivers 有权
    动态更新输入和输出驱动器的阻抗补偿代码

    公开(公告)号:US06624659B1

    公开(公告)日:2003-09-23

    申请号:US09608529

    申请日:2000-06-30

    IPC分类号: H03K190175

    CPC分类号: H03K19/0005

    摘要: In one embodiment of the invention, an update circuit having a bus driver to drive a bus dynamically receives an update compensation code. The bus driver receives data at a data clock signal. The update compensation code controls impedance matching at the bus driver according to the data. A code generator generates the update compensation code at a base clock signal. The base clock signal is synchronized with the data clock signal. The base clock signal has an update interval and a quiet interval. A distribution ring interface distributes the update compensation code to the update circuit synchronously with the base clock signal.

    摘要翻译: 在本发明的一个实施例中,具有驱动总线的总线驱动器的更新电路动态地接收更新补偿代码。 总线驱动器以数据时钟信号接收数据。 更新补偿代码根据数据控制总线驱动器的阻抗匹配。 代码生成器以基本时钟信号生成更新补偿代码。 基本时钟信号与数据时钟信号同步。 基本时钟信号具有更新间隔和静默间隔。 分配环接口将更新补偿代码与基本时钟信号同步地分配给更新电路。