公开(公告)号：US06706454B2

公开(公告)日：2004-03-16

申请号：US09899741

申请日：2001-07-05

Applicant: Mathias Jarek

Inventor： Mathias Jarek

IPC: G03F7023

CPC classification number: G03F7/0233

Abstract: A coating solution useful in the preparation of printing plate precursors comprises: a) a radiation sensitive composition C comprising a phenolic resin; b) at least one thermoplastic polymer P which has a solubility in aqueous alkaline media ranging from sparingly soluble to insoluble; c) a first solvent component A which is capable of solubilizing both composition C and thermoplastic polymer P; d) a second solvent component B having a volatility less than component A, wherein component B is capable of volatilizing composition C but not thermoplastic polymer P, and composition C and thermoplastic P are homogeneously dissolved in a mixture of components A and B; and e) at least one further polymer AP having a higher molecular weight than the phenolic resin of composition C, wherein polymer AB is miscible with the phenolic resin and immiscible with thermoplastic polymer P. The coating provides a radiation-sensitive layer for the substrate, and the coating contains homogeneously distributed thermoplastic polymer particles.

Abstract translation: 用于制备印版前体的涂布溶液包括：a）包含酚醛树脂的辐射敏感组合物C; b）至少一种热塑性聚合物P，其在含水碱性介质中具有从微溶到难溶的溶解度; c） 能够溶解组合物C和热塑性聚合物P的第一溶剂组分A; d）挥发性小于组分A的第二溶剂组分B，其中组分B能够挥发组合物C而不是热塑性聚合物P，组合物 C和热塑性P均匀地溶解在组分A和B的混合物中; 和）与聚合物C的酚醛树脂相比具有更高分子量的至少一种聚合物AP，其中聚合物AB可与酚醛树脂混溶并与热塑性聚合物P不混溶。涂层为基底提供辐射敏感层， 该涂层含有均匀分布的热塑性聚合物颗粒。

公开(公告)号：US06517988B1

公开(公告)日：2003-02-11

申请号：US09903824

申请日：2001-07-12

Applicant: Gerhard Hauck ,  Mathias Jarek

Inventor： Gerhard Hauck ,  Mathias Jarek

IPC: G03F7021

CPC classification number: G03F7/0233

Abstract: A radiation-sensitive composition, positive-working coating compositions useful for the preparation of lithographic printing plates and lithographic printing plate precursors comprising the composition are disclosed. The composition comprises at least one quinonediazide compound and at least one carboxylic copolymer. The compositions produce lithographic printing plates that show high print run stability.

Abstract translation: 公开了一种辐射敏感组合物，用于制备平版印刷版的正性涂料组合物和包含该组合物的平版印刷版前体。 该组合物包含至少一种醌二叠氮化合物和至少一种羧酸共聚物。 该组合物产生显示高印刷运行稳定性的平版印刷版。

公开(公告)号：USRE41083E1

公开(公告)日：2010-01-19

申请号：US11190154

申请日：2005-07-26

Applicant: Mathias Jarek

Inventor： Mathias Jarek

IPC: G03F7/023

CPC classification number: G03F7/0233 ,  C08F222/40

Abstract: A radiation-sensitive composition for use in printing plates is described. The composition comprises: (a) at least one novolak; (b) at least one naphthoquinone diazide derivative; and (c) a copolymer comprising units A, B, and a unit C comprising a cyclic terminal urea group, wherein unit A is present in an amount of about 5 to about 50 mol % and has the formula is represented by wherein R1 is selected such that the homopolymer of A is alkali-soluble, unit B is present in an amount of about 20 to about 70 mol % and has the following formula is represented by wherein R2 is selected such that the homopolymer of B has a glass transition temperature greater than 100° C., preferably a glass transition temperature in the range from about 100 to about 380° C., and the unit C comprising a cyclic terminal urea group is present in an amount of about 10 to about 50 mol % and has the formula is represented by wherein X is a spacer group which is preferably selected from the group consisting of (a) a —(CR2)m— chain, (b) a —[CH2—CH2—O]m— chain; and (c) a —[Si(R2)—O]m— unit, wherein m is an integer greater than or equal to 1, more preferably between 2 and 12, the spacer group is connected to one of the carbon ring atoms of the cyclic urea unit or to one of the nitrogen atoms of the cyclic urea unit, and n is an integer greater than or equal to 1, more preferably between 1 and 5; and Y is a group selected from the group consisting of:  wherein each R in units A, B, and C, the —(CR2)m— chain, the —[Si(R2)—O]m— unit, and group Y represents a bond between the cyclic urea and the spacer group X, or is independently selected from hydrogen, aryl, (C1-C12) alkyl, and or halogen.

Abstract translation: 描述了用于印版的辐射敏感组合物。 组合物包含：（a）至少一种酚醛清漆; （b）至少一种萘醌二叠氮衍生物; 和（c）包含单元A，B和包含环状末端脲基团的单元C的共聚物，其中单元A以约5至约50摩尔％的量存在并具有下式由其中R1选择 使得A的均聚物是碱溶性的，单元B的存在量为约20至约70mol％，并且由下式表示，其中R2选择为使得B的均聚物具有较高的玻璃化转变温度 优选玻璃化转变温度在约100至约380℃的范围内，并且包含环状末端脲基团的单元C的存在量为约10至约50摩尔％，并且具有 式中X为间隔基，优选选自（a）a - （CR 2）m-链，（b）a - [CH 2 -CH 2 -O] m-链; 和（c）a- [Si（R 2）-O] m - 单元，其中m是大于或等于1的整数，更优选在2和12之间，间隔基连接到碳原子之一 环脲单元或环脲单元的氮原子之一，n为大于或等于1，更优选为1至5的整数; 并且Y是选自下组的基团：其中单元A，B和C中的每个R， - （CR 2）m-链， - [Si（R 2）-O] m - 单元和Y基团 表示环状脲和间隔基X之间的键，或独立地选自氢，芳基，（C1-C12）烷基和/或卤素。

公开(公告)号：US20090183647A1

公开(公告)日：2009-07-23

申请号：US12017366

申请日：2008-01-22

Applicant: Mathias Jarek

Inventor： Mathias Jarek

IPC: G03F7/004 ,  G03F7/12 ,  B41M5/00 ,  B41N1/08

CPC classification number: B41C1/1025 ,  B41C2201/04 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/24 ,  B41C2210/26 ,  B41C2210/264 ,  B41C2210/266 ,  B41M5/368

Abstract: Single layer IR-sensitive negative-working imageable elements include thermally coalesceable core-shell particles without a polymeric binder in an imageable layer. Thermal imaging causes coalescence of the particles in imaged regions while non-imaged regions can be removed with plain water or an aqueous solution containing an acidic polymer.

Abstract translation: 单层IR敏感负性可成像元件包括在可成像层中不具有聚合物粘合剂的热可聚结核 - 壳颗粒。 热成像使成像区域中的颗粒聚结，而非成像区域可以用纯水或含有酸性聚合物的水溶液除去。

公开(公告)号：US06645689B2

公开(公告)日：2003-11-11

申请号：US10096651

申请日：2002-03-13

Applicant: Mathias Jarek

Inventor： Mathias Jarek

IPC: G03F7023

CPC classification number: G03F7/0233 ,  C08F222/40

Abstract: A radiation-sensitive composition for use in printing plates is described. The composition comprises: (a) at least one novolak; (b) at least one naphthoquinone diazide derivative; and (c) a copolymer comprising units A, B, and a unit C comprising a cyclic terminal urea group, wherein unit A is present in an amount of about 5 to about 50 mol % and has the formula wherein R1 is selected such that the homopolymer of A is alkali-soluble, unit B is present in an amount of about 20 to about 70 mol % and has the following formula wherein R2 is selected such that the homopolymer of B has a glass transition temperature greater than 100° C., preferably a glass transition temperature in the range from about 100 to about 380° C., and the unit C comprising a cyclic terminal urea group is present in an amount of about 10 to about 50 mol % and has the formula wherein X is a spacer group which is preferably selected from the group consisting of (a) a —(CR2)m— chain, (b) a —[CH2—CH2—O]m— chain; and (c) a —[Si(R2)—O]m— unit, wherein m is an integer greater than or equal to 1, more preferably between 2 and 12, the spacer group is connected to one of the carbon ring atoms of the cyclic urea unit or to one of the nitrogen atoms of the cyclic urea unit, and n is an integer greater than or equal to 1, more preferably between 1 and 5; and Y is a group selected from the group consisting of:  and  wherein each R in units A, B, and C, the —(CR2)m— chain, the —[Si(R2)—O]m— unit, and group Y is independently selected from hydrogen, aryl, (C1-C12) alkyl, and halogen.

Abstract translation: 描述了用于印版的辐射敏感组合物。 组合物包含：（a）至少一种酚醛清漆; （b）至少一种萘醌二叠氮衍生物; 和（c）包含单元A，B和包含环状末端脲基团的单元C的共聚物，其中单元A以约5至约50摩尔％的量存在并且具有式 A的均聚物是碱溶性的，单元B的存在量为约20至约70mol％，并且具有以下化学式R 2，使得B的均聚物具有大于100的玻璃化转变温度 优选玻璃化转变温度在约100至约380℃的范围内，并且包含环状末端脲基团的单元C的存在量为约10至约50摩尔％，并且具有式 是优选选自（a）a - （CR 2）m-链，（b）a - [CH 2 -CH 2 -O] m - 链的间隔基; 和（c）a- [Si（R 2）-O] m - 单元，其中m是大于或等于1的整数，更优选在2和12之间，间隔基连接到碳原子之一 环脲单元或环脲单元的氮原子之一，n为大于或等于1，更优选为1至5的整数; 且Y为选自以下的基团：其中，单元A，B和C各自的R， - （CR 2）m - 链， - [Si（R 2）-O] m - 单元和Y基团是 独立地选自氢，芳基，（C1-C12）烷基和卤素。

公开(公告)号：US20090269554A1

公开(公告)日：2009-10-29

申请号：US12297058

申请日：2007-04-12

Applicant: Mathias Jarek ,  Monika Brummer

Inventor： Mathias Jarek ,  Monika Brummer

IPC: G03F7/004 ,  B32B3/10

CPC classification number: B41M5/368 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  C08F220/06 ,  C08F220/36 ,  C08F220/54 ,  C08F220/58 ,  C08F222/40 ,  G03F7/0212 ,  G03F7/0233 ,  G03F7/033 ,  G03F7/0382 ,  Y10S430/111 ,  Y10T428/24802

Abstract: A singe- or multilayer lithographic printing plate precursor comprises on a substrate a radiation-sensitive coating that comprises a copolymer soluble or dispersible in aqueous alkaline solution and comprising (meth)acryl recurring units, imide recurring units, and amide recurring units derived from corresponding ethylenically unsaturated polymerizable monomers; the copolymer provides increased chemical resistance for the lithographic printing plate precursors which can be negatively or positively working.

Abstract translation: 单面或多层平版印刷版前体在基底上包含辐射敏感性涂层，其包含可溶于或可分散在碱性水溶液中的共聚物，并且包含（甲基）丙烯酸重复单元，酰亚胺重复单元和衍生自相应烯属的酰胺重复单元 不饱和可聚合单体; 该共聚物对平版印刷版前体提供增加的耐化学性，这可以是负面或正面的工作。

公开(公告)号：US06525152B1

公开(公告)日：2003-02-25

申请号：US09630917

申请日：2000-08-02

Applicant: Mathias Jarek

Inventor： Mathias Jarek

IPC: C08F22240

CPC classification number: C08F222/40 ,  G03F7/0233 ,  C08F220/06 ,  C08F220/56 ,  C08F2220/281 ,  C08F220/58 ,  C08F222/16 ,  C08F220/36

Abstract: Copolymers useful in radiation-sensitive layers of printing plates have the units A, B and C wherein unit A is present in an amount of 5 to a maximum of 50 mol % and R1 and R4 are selected such that the homopolymer of A is alkali-soluble, B is present in an amount of 20-70 mol % and R2, R6 and R7 are selected such that the homopolymer of B has a high glass transition temperature, and C is present in an amount of 10-50 mol % and R3 and R5 are selected such that the homopolymer of C is water-soluble and that unit A is different from unit C.

Abstract translation: 可用于印版的辐射敏感层的共聚物具有单元A，B和C，其中单元A以5至最大50mol％的量存在，并且选择R 1和R 4以使得A的均聚物是碱溶性的 ，B的含量为20-70摩尔％，R2，R6和R7的选择使得B的均聚物具有高玻璃化转变温度，C以10-50摩尔％的量存在，R3和 选择R5使得C的均聚物是水溶性的，并且单元A不同于单元C.

公开(公告)号：US06475692B1

公开(公告)日：2002-11-05

申请号：US09630920

申请日：2000-08-02

Applicant: Mathias Jarek ,  Gerhard Hauck

Inventor： Mathias Jarek ,  Gerhard Hauck

IPC: G03F7023

CPC classification number: G03F7/0233

Abstract: Radiation-sensitive compositions comprise at least one novolak, at least one naphthoquinone diazide derivative and a copolymer; the copolymer consisting of the units A, B and C wherein unit A is present in an amount of 5 to a maximum of 50 mol % and R1 and R4 are selected such that the homopolymer of A is alkali-soluble, B is present in an amount of 20 to 70 mol % and R2, R6 and R7 are selected such that the homopolymer of B has a high glass transition temperature, and C is present in an amount of 10 to 50 mol % and R3 and R5 are selected such that the homopolymer of C is water-soluble and that unit A is different from unit C. Furthermore, the invention describes printing plates produced therefrom.

Abstract translation: 辐射敏感性组合物包含至少一种酚醛清漆，至少一种萘醌二叠氮化物衍生物和共聚物; 由单元A中的单元A，B和C组成的共聚物的存在量为5至最大50mol％，并且选择R 1和R 4以使得A的均聚物是碱溶性的，B以一定量存在 为20〜70摩尔％，R2，R6和R7的选择使得B的均聚物具有高玻璃化转变温度，C以10〜50摩尔％的量存在，并且选择R3和R5，使得均聚物 的C是水溶性的，并且单元A不同于单元C.此外，本发明描述了由其制备的印刷版。

公开(公告)号：US5926938A

公开(公告)日：1999-07-27

申请号：US858986

申请日：1997-05-20

Applicant: Mathias Jarek ,  Wolfgang Pott ,  Hans Kragl

Inventor： Mathias Jarek ,  Wolfgang Pott ,  Hans Kragl

IPC: B24B1/00 ,  B24B41/06 ,  B23P13/04

CPC classification number: B24B1/00 ,  B24B41/06 ,  Y10T29/49982 ,  Y10T29/49995 ,  Y10T29/53083

Abstract: To planarize an electroformed, magnetic metal sheet having micropatterns, the metal sheet is clamped on a magnet and is mechanically processed on the back side of the metal in such a way that it assumes a plane-parallel shape. Metal sheets can be used which are not stress-free and are obtained in a fast electroplating process. Multiple copying is possible.

Abstract translation: 为了使具有微图案的电铸金属片平坦化，将金属片夹在磁体上，并在金属的背面进行机械加工，使其呈平面平行的形状。 可以使用不耐压的金属片，并且可以在快速电镀工艺中获得。 可以进行多重复制。

公开(公告)号：US08507181B2

公开(公告)日：2013-08-13

申请号：US12438160

申请日：2007-09-18

Applicant: Christopher D. Simpson ,  Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Mathias Jarek

Inventor： Christopher D. Simpson ,  Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Mathias Jarek

IPC: G03F7/00 ,  G03F1/00 ,  G03C1/00

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/322

Abstract: A method is described for producing an imaged lithographic printing plate, wherein the developer comprises a hydrophilic polymer comprising (m1) structural units derived from at least one compound comprising both a polyalkylene oxide chain and a free radical polymerizable group, and (m2) structural units derived from at least one compound copolymerizable with the free radical polymerizable group of (i) and comprising at least one functional group with pKs

Abstract translation: 描述了一种用于生产成像平版印刷版的方法，其中显影剂包括亲水性聚合物，其包含（m1）衍生自至少一种包含聚环氧烷链和自由基可聚合基团的化合物的结构单元，和（m2）结构单元 衍生自可与（i）的自由基可聚合基团共聚的至少一种化合物，并且包含至少一个pK <5的官能团。