公开(公告)号：US5447600A

公开(公告)日：1995-09-05

申请号：US216194

申请日：1994-03-21

Applicant: Douglas A. Webb

Inventor： Douglas A. Webb

IPC: B05D5/08 ,  B05D7/00 ,  B81B3/00 ,  G02B26/08 ,  B44C1/22 ,  B29C37/00 ,  C23F1/00

CPC classification number: B81B3/0005 ,  B05D5/083 ,  G02B26/0841 ,  B81C2201/112

Abstract: A method for reducing sticking between contacting elements in a micromechanical device is disclosed. In addition, a micromechanical device is disclosed wherein the elements of the device are less likely to stick. The method for reducing sticking in a micromechanical device (10) comprises forming a protective layer (26) on a first contact element (14) to reduce the likelihood of a first contacting element (14) sticking to another contacting element (20). The protective layer (26) may be formed of a fluoro-polymer such as Teflon-AF.

Abstract translation: 公开了一种用于减少微机械装置中的接触元件之间的粘附的方法。 此外，公开了一种微机械装置，其中装置的元件不太可能粘附。 用于减少在微机械装置（10）中粘附的方法包括在第一接触元件（14）上形成保护层（26）以减少第一接触元件（14）粘附到另一个接触元件（20）的可能性。 保护层（26）可以由氟聚合物如特氟龙-AF形成。

公开(公告)号：US5386962A

公开(公告)日：1995-02-07

申请号：US151738

申请日：1993-11-15

Applicant: Kyle Adriance ,  Charles D. Kimbro ,  Douglas A. Webb

Inventor： Kyle Adriance ,  Charles D. Kimbro ,  Douglas A. Webb

IPC: F16F15/067 ,  F16M13/00

CPC classification number: F16F15/067

Abstract: A mount for a compressor or the like which sits on a base includes a top surface which is securable to the base. The top surface defines a well having a floor. An opening is formed in the bottom of the floor and a shaft extends from beneath the well floor to above the upper surface. The shaft includes a lower flange positioned below the well floor and an upper flange positioned above the top surface. A spring is positioned between said well floor and the top flange to absorb vibrations and any resulting shock produced by the compressor. A pair of upwardly extending generally perpendicular walls are provided on the upper surface to prevent the spring from engaging the upper surface or deflecting excessively. The walls and the upper flange are sized such that when the shaft moves with respect to the well, the upper flange will contact the wall before the spring contacts the upper surface or deflects excessively.

Abstract translation: 位于基座上的用于压缩机等的安装件包括可固定于基座的顶面。 顶部表面限定了具有底板的井。 一个开口形成在地板的底部，一个轴从井底下方延伸到上表面之上。 轴包括位于井底板下方的下凸缘和位于顶表面上方的上凸缘。 弹簧位于所述井底板和顶部凸缘之间以吸收由压缩机产生的振动和所产生的冲击。 一对向上延伸的大致垂直的壁设置在上表面上，以防止弹簧与上表面接合或过度偏转。 壁和上凸缘的尺寸使得当轴相对于井移动时，上凸缘将在弹簧接触上表面或过度偏转之前接触壁。

公开(公告)号：US5002632A

公开(公告)日：1991-03-26

申请号：US441134

申请日：1989-11-22

Applicant: Lee M. Loewenstein ,  Douglas A. Webb

Inventor： Lee M. Loewenstein ,  Douglas A. Webb

IPC: H01L21/302 ,  H01J37/32 ,  H01L21/00 ,  H01L21/3065 ,  H01L21/311

CPC classification number: H01L21/67069 ,  H01J37/32357 ,  H01L21/3065 ,  H01L21/31116

Abstract: An apparatus and method for the etching of semiconductor materials (14) is disclosed. The apparatus (10) includes a process chamber (12) having a remote generator (16) in fluid communication with the process chamber (12) for converting a noble gas (34) to a metastable gas (36). An etchant gas (40) is subsequently brought into the chamber (12) adjacent to the material (14), to mix and react with the metastable gas (36) at activation zone (38). The metastable gas (36) collides with the etchant gas (40) to cause the mixture to selectively etch the material 14.