公开(公告)号：US09947872B2

公开(公告)日：2018-04-17

申请号：US15325936

申请日：2015-07-02

申请人： E I DU PONT DE NEMOURS AND COMPANY

发明人： Adam Fennimore ,  Nora Sabina Radu

IPC分类号： H01L51/00 ,  C08G61/12 ,  C07C211/56 ,  H01L51/50

CPC分类号： H01L51/0035 ,  C07C211/54 ,  C07C211/56 ,  C07C2603/94 ,  C07C2603/97 ,  C07F7/081 ,  C08G61/128 ,  C08G2261/124 ,  C08G2261/1412 ,  C08G2261/148 ,  C08G2261/228 ,  C08G2261/314 ,  C08G2261/3162 ,  C08G2261/95 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1014 ,  C09K2211/1416 ,  C09K2211/1433 ,  H01L51/0043 ,  H01L51/5056

摘要： There is disclosed a compound having Formula I In Formula I: Ar1 and Ar3 are the same or different and are aryl groups; Ar2 and Ar4 are the same or different and are aryl groups; L is the same or different at each occurrence and can be H, D, halogen, aryl, arylamino, crosslinkable groups, deuterated aryl, deuterated arylamino, or deuterated crosslinkable groups; R1-R4 are the same or different and can be H, D, alkyl, alkoxy, aryl, aryloxy, silyl, deuterated alkyl, deuterated alkoxy, deuterated aryl, deuterated aryloxy, or deuterated silyl; R5-R8 are the same or different and can be D, F, alkyl, aryl, alkoxy, aryloxy, silyl, crosslinkable groups, deuterated alkyl, deuterated alkoxy, deuterated aryl, deuterated aryloxy, or deuterated silyl, where adjacent R5-R8 groups can be joined together to form an aromatic ring; a and b are the same or different and are an integer from 0-3; c and d are the same or different at each occurrence and are an integer from 0-4; m and q are the same or different and are an integer from 1-6; and n is an integer greater than 0.

公开(公告)号：US20170200893A1

公开(公告)日：2017-07-13

申请号：US15325936

申请日：2015-07-02

申请人： E I DU PONT DE NEMOURS AND COMPANY

发明人： Adam Fennimore ,  Nora Sabina Radu

IPC分类号： H01L51/00 ,  C08G61/12 ,  C07C211/56

CPC分类号： H01L51/0035 ,  C07C211/54 ,  C07C211/56 ,  C07C2603/94 ,  C07C2603/97 ,  C07F7/081 ,  C08G61/128 ,  C08G2261/124 ,  C08G2261/1412 ,  C08G2261/148 ,  C08G2261/228 ,  C08G2261/314 ,  C08G2261/3162 ,  C08G2261/95 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1014 ,  C09K2211/1416 ,  C09K2211/1433 ,  H01L51/0043 ,  H01L51/5056

摘要： There is disclosed a compound having Formula I In Formula I: Ar1 and Ar3 are the same or different and are aryl groups; Ar2 and Ar4 are the same or different and are aryl groups; L is the same or different at each occurrence and can be H, D, halogen, aryl, arylamino, crosslinkable groups, deuterated aryl, deuterated arylamino, or deuterated crosslinkable groups; R1-R4 are the same or different and can be H, D, alkyl, alkoxy, aryl, aryloxy, silyl, deuterated alkyl, deuterated alkoxy, deuterated aryl, deuterated aryloxy, or deuterated silyl; R5-R8 are the same or different and can be D, F, alkyl, aryl, alkoxy, aryloxy, silyl, crosslinkable groups, deuterated alkyl, deuterated alkoxy, deuterated aryl, deuterated aryloxy, or deuterated silyl, where adjacent R5-R8 groups can be joined together to form an aromatic ring; a and b are the same or different and are an integer from 0-3; c and d are the same or different at each occurrence and are an integer from 0-4; m and q are the same or different and are an integer from 1-6; and n is an integer greater than 0.

公开(公告)号：US09577199B2

公开(公告)日：2017-02-21

申请号：US14509757

申请日：2014-10-08

申请人： E I DU PONT DE NEMOURS AND COMPANY

发明人： Daniel David Lecloux ,  Adam Fennimore ,  Weiying Gao ,  Nora Sabina Radu ,  Weishi Wu ,  Vsevolod Rostovtsev ,  Michael Henry Howard, Jr. ,  Hong Meng ,  Yulong Shen ,  Jeffrey A Merlo ,  Eric Maurice Smith

IPC分类号： H01L51/50 ,  H01L51/00 ,  C07B59/00 ,  C07C15/28 ,  C07D209/86 ,  C07D307/87 ,  C07D307/91

CPC分类号： H01L51/0058 ,  C07B59/001 ,  C07B2200/05 ,  C07C15/28 ,  C07C2603/24 ,  C07D209/86 ,  C07D307/87 ,  C07D307/91 ,  H01L51/0003 ,  H01L51/0005 ,  H01L51/0052 ,  H01L51/006 ,  H01L51/5024 ,  H01L51/5036

摘要： This invention relates to deuterated aryl-anthracene compounds that are useful in electronic applications. It also relates to electronic devices in which the active layer includes such a deuterated compound.

摘要翻译： 本发明涉及可用于电子应用的氘代芳基蒽化合物。 它还涉及其中活性层包括这种氘代化合物的电子器件。

公开(公告)号：US09525134B1

公开(公告)日：2016-12-20

申请号：US14823310

申请日：2015-08-11

申请人： E I DU PONT DE NEMOURS AND COMPANY

发明人： Nora Sabina Radu ,  Adam Fennimore ,  Tiffany N. Hoerter ,  Gene M Rossi

IPC分类号： H01L51/00 ,  C08G61/12 ,  H01L51/50

CPC分类号： H01L51/0035 ,  C08G2261/1412 ,  C08G2261/148 ,  C08G2261/224 ,  C08G2261/312 ,  C08G2261/3162 ,  C08G2261/512 ,  C08G2261/598 ,  C08G2261/95 ,  H01L51/5056

摘要： There is provided a hole transport compound having Formula I In Formula I: Ar1-Ar3 are selected from the group consisting of aryl groups and deuterated aryl groups; with the proviso that Ar1 is not the same as Ar2, E is the same or different at each occurrence, and n is an integer greater than or equal to 1. There is also a hole transport compound having Formula II In Formula II: Ar4-Ar7 are the same or different and are aryl groups or deuterated aryl groups; E1 is the same or different at each occurrence; R1-R5 are the same or different at each occurrence; a-e are the same or different and are in integer from 0-4; m is an integer from 0-6; o is an integer greater than or equal to 1. There is also provided an organic electronic device.

公开(公告)号：US09496506B2

公开(公告)日：2016-11-15

申请号：US13748883

申请日：2013-01-24

申请人： E I DU PONT DE NEMOURS AND COMPANY

发明人： Daniel David Lecloux ,  Kalindi Dogra ,  Weishi Wu ,  Adam Fennimore ,  Eric Maurice Smith

IPC分类号： H01L51/00 ,  H01L51/05 ,  H01L51/50 ,  C09K11/06 ,  C07D487/04

CPC分类号： H01L51/0072 ,  C07D487/04 ,  C09K11/06 ,  H01L51/0034 ,  H01L51/0067 ,  H01L51/0085 ,  H01L51/0508 ,  H01L51/5016 ,  H01L2251/308

摘要： This invention relates to deuterated indolocarbazole compounds that are useful in electronic applications. It also relates to electronic devices in which the active layer includes such a deuterated compound.

摘要翻译： 本发明涉及可用于电子应用的氘代吲哚并咔唑化合物。 它还涉及其中活性层包括这种氘代化合物的电子器件。

公开(公告)号：US20160308141A1

公开(公告)日：2016-10-20

申请号：US15101133

申请日：2014-12-09

申请人： E. I. DU PONT DE NEMOURS AND COMPANY

发明人： Nora Sabina Radu ,  Adam Fennimore

IPC分类号： H01L51/00 ,  C07D327/06 ,  C08G61/10 ,  C08G73/02

CPC分类号： H01L51/0071 ,  C07D327/06 ,  C07D333/72 ,  C08G61/10 ,  C08G61/12 ,  C08G73/026 ,  C08G2261/12 ,  C08G2261/1412 ,  C08G2261/145 ,  C08G2261/148 ,  C08G2261/149 ,  C08G2261/1644 ,  C08G2261/312 ,  C08G2261/3162 ,  C08G2261/412 ,  C08G2261/512 ,  C08G2261/95 ,  H01L51/0003 ,  H01L51/0035 ,  H01L51/0043 ,  H01L51/5056 ,  H01L51/5064 ,  H01L51/56

摘要： There is provided a hole transport material having Formula I, Formula Ia, or Formula II: In the formulae: A is an aromatic moiety including at least one triarylamino group; B′ is an aromatic moiety; E is an end group which is H, D, alkyl, aryl, halide, deuterated alkyl, or deuterated aryl; G is G1, G2, or a deuterated analog thereof where the asterisk represents the point of attachment; n is an integer greater than 0; and m1 and m2 represent non-zero mole fractions, such that m1+m2=1.

摘要翻译： 提供了具有式I，式Ia或式II的空穴传输材料：在下式中：A是包含至少一个三芳基氨基的芳族部分; B'是芳族部分; E是H，D，烷基，芳基，卤化物，氘代烷基或氘化芳基的端基; G是G1，G2或其氘代类似物，其中星号表示连接点; n是大于0的整数; m1和m2表示非零摩尔分数，使得m1 + m2 = 1。

公开(公告)号：US09293739B2

公开(公告)日：2016-03-22

申请号：US14367426

申请日：2012-12-20

申请人： E I DU PONT DE NEMOURS AND COMPANY

发明人： Adam Fennimore ,  Steven R. Mackara

IPC分类号： H01L21/00 ,  H01L51/56 ,  H01L51/00 ,  G03F7/20 ,  H01L51/50

CPC分类号： H01L51/56 ,  G03F7/2022 ,  H01L51/0003 ,  H01L51/0012 ,  H01L51/0015 ,  H01L51/0018 ,  H01L51/0035 ,  H01L51/5088 ,  H01L2251/5369

摘要： There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer including a fluorinated material and having a first surface energy; treating the first layer with a priming layer; exposing the priming layer patternwise with radiation having a wavelength greater than 300 nm, resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a patterned priming layer, wherein the patterned priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid deposition on the patterned priming layer on the first layer. The priming layer includes an aromatic amine compound and a photoinitiator.

摘要翻译： 提供了一种用于在第一层上形成包含的第二层的方法，包括以下步骤：形成包含氟化材料并具有第一表面能的第一层; 用起始层处理第一层; 用波长大于300nm的辐射以图案方式曝光引发层，导致曝光区域和未曝光区域; 开发底漆层以有效地从未曝光区域去除底漆层，导致具有图案化底漆层的第一层，其中图案化底漆层具有高于第一表面能的第二表面能; 以及通过液体沉积在第一层上的图案化底漆层上形成第二层。 引发层包括芳族胺化合物和光引发剂。

公开(公告)号：US09159927B2

公开(公告)日：2015-10-13

申请号：US13797076

申请日：2013-03-12

申请人： E I DU PONT DE NEMOURS AND COMPANY

发明人： Gary A Johansson ,  Eric Maurice Smith ,  Reid John Chesterfield ,  Michael Henry Howard, Jr. ,  Kyung-Ho Park ,  Nora Sabina Radu ,  Gene M Rossi ,  Frederick P Gentry ,  Troy C Gehret ,  Daniel David Lecloux ,  Adam Fennimore

IPC分类号： H01L51/50 ,  H01L51/00 ,  C07C211/54 ,  C07C211/58 ,  C07C217/92 ,  C08G73/02 ,  C08L79/02 ,  C09K11/06 ,  C09B69/10

CPC分类号： H01L51/0035 ,  C07C211/54 ,  C07C211/58 ,  C07C217/92 ,  C08G73/026 ,  C08L79/02 ,  C09B69/109 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1011 ,  C09K2211/1416 ,  C09K2211/1425 ,  H01L51/0058 ,  H01L51/0059 ,  H01L51/006 ,  H01L51/0077 ,  H01L51/0081 ,  H01L51/5012 ,  H01L51/5048 ,  H01L2251/308

摘要： A compound having Formula I, Formula II, or Formula III: Ar1 may independently be phenylene, substituted phenylene, naphthylene, or substituted naphthylene. Ar2 is the same or different at each occurrence and is an aryl group. M is the same or different at each occurrence and is a conjugated moiety. T1 and T2 are independently the same or different at each occurrence and are conjugated moieties which are connected in a non-planar configuration; a and e are the same or different at each occurrence and are an integer from 1 to 6; b, c, and d are mole fractions such that b+c+d=1.0, with the proviso that c is not zero, and at least one of b and d is not zero, and when b is zero, M has at least two triarylamine units; and n is an integer greater than 1.

摘要翻译： 具有式I，式II或式III的化合物：Ar 1可以独立地是亚苯基，取代的亚苯基，亚萘基或取代的亚乙基。 Ar2在每次出现时相同或不同，为芳基。 M在每次出现时相同或不同，为共轭部分。 T1和T2在每次出现时独立地相同或不同，并且是以非平面构型连接的共轭部分; a和e在每次出现时相同或不同，为1〜6的整数; b，c和d是摩尔分数，使得b + c + d = 1.0，条件是c不为零，b和d中的至少一个不为零，当b为零时，M至少为 两个三芳基胺单元; 并且n是大于1的整数。

公开(公告)号：US20140349431A1

公开(公告)日：2014-11-27

申请号：US14367426

申请日：2012-12-20

申请人： E I DU PONT DE NEMOURS AND COMPANY

发明人： Adam Fennimore ,  Steven R. MacKara

IPC分类号： H01L51/56 ,  H01L51/00

CPC分类号： H01L51/56 ,  G03F7/2022 ,  H01L51/0003 ,  H01L51/0012 ,  H01L51/0015 ,  H01L51/0018 ,  H01L51/0035 ,  H01L51/5088 ,  H01L2251/5369

摘要： There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer including a fluorinated material and having a first surface energy; treating the first layer with a priming layer; exposing the priming layer patternwise with radiation having a wavelength greater than 300 nm, resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a patterned priming layer, wherein the patterned priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid deposition on the patterned priming layer on the first layer. The priming layer includes an aromatic amine compound and a photoinitiator.

摘要翻译： 提供了一种用于在第一层上形成包含的第二层的方法，包括以下步骤：形成包含氟化材料并具有第一表面能的第一层; 用起始层处理第一层; 用波长大于300nm的辐射以图案方式曝光引发层，导致曝光区域和未曝光区域; 开发底漆层以有效地从未曝光区域去除底漆层，导致具有图案化底漆层的第一层，其中图案化底漆层具有高于第一表面能的第二表面能; 以及通过液体沉积在第一层上的图案化底漆层上形成第二层。 引发层包括芳族胺化合物和光引发剂。

公开(公告)号：US20130140544A1

公开(公告)日：2013-06-06

申请号：US13748883

申请日：2013-01-24

申请人： E I DU PONT DE NEMOURS AND COMPANY

发明人： Daniel David Lecloux ,  Kalindi Dogra ,  Weishi Wu ,  Adam Fennimore ,  Eric Maurice Smith

IPC分类号： H01L51/00 ,  H01L51/05

CPC分类号： H01L51/0072 ,  C07D487/04 ,  C09K11/06 ,  H01L51/0034 ,  H01L51/0067 ,  H01L51/0085 ,  H01L51/0508 ,  H01L51/5016 ,  H01L2251/308

摘要： This invention relates to deuterated indolocarbazole compounds that are useful in electronic applications. It also relates to electronic devices in which the active layer includes such a deuterated compound.

摘要翻译： 本发明涉及可用于电子应用的氘代吲哚并咔唑化合物。 它还涉及其中活性层包括这种氘代化合物的电子器件。