公开(公告)号：US20180364566A1

公开(公告)日：2018-12-20

申请号：US16112003

申请日：2018-08-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Kazuhiro MARUMO

IPC: G03F7/00 ,  H01L21/308 ,  H01L21/027

Abstract: Provided are a method for producing a pattern laminate, the pattern laminate having a first layer having a pattern on an object to be processed and a second layer, which has a small waviness after etching (ΔLWR), in which the method includes a step of forming a first layer having a pattern on an object to be processed and a step of forming a second layer on the first layer, and the glass transition temperature of the first layer is 90° C. or higher; a method for producing a reversal pattern; and a pattern laminate.

公开(公告)号：US20180002561A1

公开(公告)日：2018-01-04

申请号：US15702065

申请日：2017-09-12

Applicant: FUJIFILM Corporation

Inventor： Tadashi OOMATSU ,  Hirotaka KITAGAWA ,  Yuichiro GOTO

IPC: C09D133/14 ,  B29C59/02 ,  C08F8/00 ,  G03F7/00 ,  C09D7/12 ,  B29K105/00

CPC classification number: C09D133/14 ,  B29C59/022 ,  B29K2105/0014 ,  C08F8/00 ,  C08K5/19 ,  C08K5/34 ,  C08K5/50 ,  C09D5/002 ,  C09D7/40 ,  C09D7/63 ,  C09D201/00 ,  G03F7/0002 ,  G11B5/855 ,  H01L21/027

Abstract: Disclosed herein are a resin composition for underlayer film formation which is capable of forming an underlayer film having good adhesiveness to a base material and good surface state, an imprint forming kit, a laminate, a pattern forming method, and a method for producing a device. Provided is a resin composition for underlayer film formation, including a resin, a nucleophilic catalyst, and a solvent, in which the content of the nucleophilic catalyst is 0.01 to 0.3 mass % with respect to the solid content of the resin composition for underlayer film formation.

公开(公告)号：US20170190820A1

公开(公告)日：2017-07-06

申请号：US15465080

申请日：2017-03-21

Applicant: FUJIFILM Corporation

Inventor： Hirotaka KITAGAWA ,  Yuichiro GOTO

IPC: C08F222/10 ,  H01L21/027 ,  B29C59/00 ,  G03F7/00 ,  B41J2/01 ,  B29C59/02

CPC classification number: C08F222/10 ,  B29C59/005 ,  B29C59/02 ,  B29K2033/08 ,  B29K2105/0002 ,  B41J2/01 ,  C08F2/48 ,  C08F2222/1013 ,  C08F2222/102 ,  G03F7/0002 ,  G03F7/027 ,  H01L21/0271 ,  C08F220/18

Abstract: Provided are a curable composition having excellent releasability and ink jet discharge accuracy, a pattern forming method, a pattern, and a method for manufacturing a device.The curable composition includes a polymerizable compound and a photopolymerization initiator, in which neopentyl glycol diacrylate accounts for 10% by mass or more of the polymerizable compound, and the total content of a compound represented by the following Formula (I) and a compound represented by the following Formula (II) is 5% by mass or less with respect to the content of neopentyl glycol diacrylate.

公开(公告)号：US20170146907A1

公开(公告)日：2017-05-25

申请号：US15423734

申请日：2017-02-03

Applicant: FUJIFILM Corporation

Inventor： Tadashi OOMATSU ,  Hirotaka KITAGAWA ,  Yuichiro GOTO

IPC: G03F7/11 ,  B29C59/02 ,  G03F7/004 ,  G03F7/00 ,  C09D133/14 ,  C09D133/08 ,  B29C59/00 ,  B29C35/08

CPC classification number: G03F7/11 ,  B29C35/0805 ,  B29C59/005 ,  B29C59/022 ,  B32B27/00 ,  C09D5/002 ,  C09D7/40 ,  C09D133/08 ,  C09D133/14 ,  C09D201/02 ,  C09D201/06 ,  G03F7/0002 ,  G03F7/0045 ,  H01L21/027

Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device.A resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and at least one group selected from a group represented by General Formula (B), an oxiranyl group and an oxetanyl group, a nonionic surfactant and a solvent. Ra1 represents a hydrogen atom or a methyl group, Rb1 and Rb2 each independently represent a group selected from an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, Rb3 represents a group selected from an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rb2 and Rb3 may be bonded to each other to form a ring.