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公开(公告)号：US20060187430A1
公开(公告)日：2006-08-24
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.
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公开(公告)号：US07969663B2
公开(公告)日：2011-06-28
申请号：US12819861
申请日：2010-06-21
IPC分类号： G02B9/60
CPC分类号： G03F7/70241 , G02B13/143 , G03F7/70341
摘要： A projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, and has a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.
摘要翻译： 适用于浸没微光刻的投影物镜被设计为具有五个透镜组的单腰系统，并且具有负折光力的第一透镜组，正屈光力的第二透镜组，负折射光焦度的第三透镜组， 正屈光力的第四透镜组和正屈光力的第五透镜组。 第四透镜组具有位于第三透镜组（LG3）和第四透镜组（LG4）之间的边缘光线高度的拐点附近的入射面（E）。 在入射面和系统隔膜（5）之间没有设置具有大量屈光力的负透镜。 本发明的投影物镜的实施例结合大图像场实现非常高的数值孔径NA> 1，并且通过紧凑的设计尺寸来区分。 对于低于200nm的工作波长，当在投影物镜和基底之间使用浸没流体时，可以解决基本上在100nm以下的结构宽度。
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公开(公告)号：US20080043345A1
公开(公告)日：2008-02-21
申请号：US10576754
申请日：2003-10-22
IPC分类号： G02B27/18
CPC分类号： G03F7/70241 , G02B13/143 , G03F7/70341
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups in the case of which a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power are provided. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.
摘要翻译： 适合于浸没微光刻的纯折射投影物镜被设计为具有五个透镜组的单腰系统，在这种情况下，具有负屈光力的第一透镜组，正屈光力的第二透镜组，负折射力的第三透镜组 提供折射光焦度，正屈光力的第四透镜组和正屈光力的第五透镜组。 第四透镜组具有位于第三透镜组（LG 3）和第四透镜组（LG 4）之间的边缘光线高度的拐点附近的入射面（E）。 在入射面和系统隔膜（5）之间没有设置具有大量屈光力的负透镜。 本发明的投影物镜的实施例结合大图像场实现非常高的数值孔径NA> 1，并且通过紧凑的设计尺寸来区分。 对于低于200nm的工作波长，当在投影物镜和基底之间使用浸没流体时，可以解决基本上在100nm以下的结构宽度。
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公开(公告)号：US07965453B2
公开(公告)日：2011-06-21
申请号：US12651829
申请日：2010-01-04
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译： 用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。 光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。 光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。 优选实施例具有相对较小的透镜总数，这允许以相对低的材料消耗制造尺寸相对较小的投影物镜，产生用于干式光刻的高性能，重量轻，紧凑的缩小投影物镜。
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公开(公告)号：US20100323299A1
公开(公告)日：2010-12-23
申请号：US12819861
申请日：2010-06-21
CPC分类号： G03F7/70241 , G02B13/143 , G03F7/70341
摘要： A projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, and has a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.
摘要翻译： 适用于浸没微光刻的投影物镜被设计为具有五个透镜组的单腰系统，并且具有负折光力的第一透镜组，正屈光力的第二透镜组，负折射光焦度的第三透镜组， 正屈光力的第四透镜组和正屈光力的第五透镜组。 第四透镜组具有位于第三透镜组（LG3）和第四透镜组（LG4）之间的边缘光线高度的拐点附近的入射面（E）。 在入射面和系统隔膜（5）之间没有设置具有大量屈光力的负透镜。 本发明的投影物镜的实施例结合大图像场实现非常高的数值孔径NA> 1，并且通过紧凑的设计尺寸来区分。 对于低于200nm的工作波长，当在投影物镜和基底之间使用浸没流体时，可以解决基本上在100nm以下的结构宽度。
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公开(公告)号：US07738188B2
公开(公告)日：2010-06-15
申请号：US11727013
申请日：2007-03-23
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译： 用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。 光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。 光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。
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公开(公告)号：US20070019170A1
公开(公告)日：2007-01-25
申请号：US11460706
申请日：2006-07-28
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A projection objective of a microlithographic projection exposure apparatus has a last optical element on the image side which is plane on the image side and which, together with an image plane of the projection objective, delimits an immersion space in the direction of an optical axis of the projection objective. This immersion space can be filled with an immersion liquid. At least one liquid or solid volume having plane-parallel interfaces can be introduced into the beam path of the projection objective, the optical thickness of the at least one volume being at least substantially equal to the optical thickness of the immersion space. By introducing and removing the volume, it is possible to convert the projection objective from dry operation to immersed operation in a straightforward way, without extensive adjustments to the projection objective or alignment work.
摘要翻译： 微光刻投影曝光装置的投影物镜在图像侧具有平面于图像侧的最后一个光学元件，并且与投影物镜的像面一起在光轴的方向上限定浸没空间 投影目标。 该浸渍空间可以用浸没液体填充。 具有平面 - 平行界面的至少一个液体或固体体积可以被引入到投影物镜的光束路径中，至少一个体积的光学厚度至少基本上等于浸没空间的光学厚度。 通过引入和移除音量，可以以直接的方式将投影物镜从干燥操作转换为浸入式操作，而无需对投影物镜或对准工作进行广泛的调整。
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28.发明授权Imaging optics and projection exposure installation for microlithography with an imaging optics 有权用于具有成像光学元件的微光刻的成像光学和投影曝光安装公开(公告)号：US09057964B2
公开(公告)日：2015-06-16
申请号：US13236873
申请日：2011-09-20
申请人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
CPC分类号： G03F7/70233 , G02B17/0663 , G02B17/0888
摘要： Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.
摘要翻译： 成像光学器件包括在物场之后的成像光束路径中的第一反射镜，在图像场之前的成像光束路径中的最后一个反射镜，以及在图像场之前的成像光束路径中的第四个至最后一个镜像。 在物平面和图像平面之间的展开成像光束路径中，多个反射镜中的每一个的使用区域上的主光线的冲击点具有与图像平面相反的反射镜间隔。 第一个镜子的镜子间距大于最后一个镜子的反射镜间距。 第四到最后一个镜子的镜子间距大于第一个镜子的镜子间距。 从与物体间隔开的物体点发出的主光线具有相互发散的光束路线，给入射光瞳的负后焦距。
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29.发明申请IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS 有权成像光学和投影曝光安装用于成像光学的微观算法公开(公告)号：US20120069315A1
公开(公告)日：2012-03-22
申请号：US13236873
申请日：2011-09-20
申请人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
CPC分类号： G03F7/70233 , G02B17/0663 , G02B17/0888
摘要： Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.
摘要翻译： 成像光学器件包括在物场之后的成像光束路径中的第一反射镜，在图像场之前的成像光束路径中的最后一个反射镜，以及在图像场之前的成像光束路径中的第四个至最后一个镜像。 在物平面和图像平面之间的展开成像光束路径中，多个反射镜中的每一个的使用区域上的主光线的冲击点具有与图像平面相反的反射镜间隔。 第一个镜子的镜子间距大于最后一个镜子的反射镜间距。 第四到最后一个镜子的镜子间距大于第一个镜子的镜子间距。 从与物体间隔开的物体点发出的主光线具有相互发散的光束路线，给入射光瞳的负后焦距。
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公开(公告)号：US20080037112A1
公开(公告)日：2008-02-14
申请号：US11727013
申请日：2007-03-23
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译： 用于投影光刻的减少投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物体场以降低放大倍率|β来布置在投影物镜的图像表面中的有效图像场中 | <1。 光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。 光学元件包括具有最大透镜直径D max max的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 对于COMP = D最大 /（Y'。（NA / n'） 2），条件COMP <15.8成立。 优选实施例具有相对较小的透镜总数，这允许以相对低的材料消耗制造尺寸相对较小的投影物镜，产生用于干式光刻的高性能，重量轻，紧凑的缩小投影物镜。
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