Method for developing an exposed photographic silver halide material
    21.
    发明授权
    Method for developing an exposed photographic silver halide material 失效
    用于显影曝光的照相卤化银材料的方法

    公开(公告)号:US06379877B1

    公开(公告)日:2002-04-30

    申请号:US08594721

    申请日:1996-01-31

    IPC分类号: G03C530

    CPC分类号: G03C5/383 G03C5/30 G03C8/365

    摘要: According to this invention a developer has been disclosed having a low pH value between 9.6 and 11.0, preferably between 9.6 and 10.3, and comprising hydroquinone in an amount from 0 to less than 30 g per liter, an auxiliary developing agent, and as silver halide complexing agents alkali metal sulphite salts, preferably sodium salts, in an amount from 0 to less than 50 g per liter, more preferably to less than 40 g per liter, and thiocyanate salts in amounts from 0.1 to 3 g, more preferably from 0.5 to 2.5 g per liter, and at least 1 g of a compound corresponding to the formula (I), a precursor thereof, a derivative thereof and/or a metal salt thereof wherein each of A, B and D independently represents an oxygen atom or NR1; X represents an oxygen atom, a sulphur atom, NR2; CR3R4; C═O; C═NR5 or C═S; Y represents an oxygen atom, a sulphur atom, NR′2; CR′3R′4; C═O; C═NR′5 or C═S; Z represents an oxygen atom, a sulphur atom, NR″2; CR″3R″4; C═O; C═NR″5 or C═S; n equals 0, 1 or 2; each of R1 to R5, R′1 to R′5 and R″1 to R″5, independently represents hydrogen, subsituted or unsubstituted alkyl, aralkyl, hydroxyalkyl, carboxyalkyl; substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl or substituted or unsubstituted heterocyclyl; and wherein R3 and R4, R′3 and R′4, R″3 and R″4, may further form together a ring; and wherein in the case that X═CR3R4 and Y═CR′3R′4, R3 and R′3 and/or R4 and R′4 may form a ring and wherein in the case that Y═CR′3R′4 and Z═CR″3R″4 with n=1 or 2, R′3 and R″3 and/or R′4 and R″4 may form a ring.

    摘要翻译: 根据本发明,已经公开了具有9.6至11.0之间的低pH值,优选9.6至10.3的显影剂,并且包含量为0至小于30g /升的氢醌,辅助显影剂和卤化银 络合剂碱金属亚硫酸盐,优选钠盐,其量为0至小于50克/升,更优选至少于40克/升,硫氰酸盐的量为0.1至3克,更优选为0.5至 2.5g /升,和至少1g对应于式(I)的化合物,其前体,其衍生物和/或其金属盐,其中A,B和D的独立地表示氧原子或NR 1; X 表示氧原子,硫原子,NR 2; CR3R4; C = O; C = NR5或C = S; Y表示氧原子,硫原子,NR'2; CR'3R'4; C = O; C = NR'5或C = S; Z表示氧原子,硫原子,NR'2; CR''3R''4; C = O; C = NR''5或C = S; n等于0,1或2; R1至R5,R'1至R'5和R'1至R'5各自独立地表示氢,取代或未取代的 烷基,芳烷基,羟基烷基,羧基烷基; 取代或未取代的烯基,取代或未取代的炔基,取代或未取代的环烷基,取代或未取代的环烯基,取代或未取代的芳基或取代或未取代的杂环基; 并且其中R 3和R 4,R'3和R'4,R“3和R”4可进一步一起形成环; 并且在X = CR 3 R 4和Y = CR 3 R 4的情况下,R 3和R'3和/或R 4和R'4可以形成环,并且其中在Y = CR'3R'4和Z = 具有n = 1或2的CR''3R''4,R'3和R'3和/或R'4和R'4可以形成环。

    Method of Making a Lithographic Printing Plate
    25.
    发明申请
    Method of Making a Lithographic Printing Plate 有权
    制作平版印刷版的方法

    公开(公告)号:US20080307990A1

    公开(公告)日:2008-12-18

    申请号:US12094291

    申请日:2006-11-23

    IPC分类号: B41N3/00

    摘要: A method of making a lithographic printing plate includes the steps of: a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including an imaging layer, and, optionally, an intermediate layer between the imaging layer and the support, wherein the imaging layer includes a switchable polymer, b) image-wise exposing the coating, whereby the polymer undergoes a chemical reaction induced by the exposing step thereby creating a lithographic image consisting of printing areas and non-printing areas wherein the non-printing areas are removable from the support by a gum solution, and c) developing the precursor by treating the coating of the precursor with the gum solution thereby removing the non-printing areas.

    摘要翻译: 制备平版印刷版的方法包括以下步骤:a)提供平版印刷版前体,其包括(i)具有亲水性表面的或具有亲水层的载体,(ii)载体上的涂层, 成像层和可选地在成像层和支撑体之间的中间层,其中成像层包括可切换聚合物,b)成像地暴露涂层,由此聚合物​​经历由曝光步骤引起的化学反应,从而产生 由打印区域和非打印区域组成的平版印刷图像,其中非打印区域可通过胶溶液从支撑体移除,以及c)通过用胶溶液处理前体的涂层来显影前体, 打印区域。

    Processless lithographic printing plate
    26.
    发明授权
    Processless lithographic printing plate 失效
    无处理平版印刷版

    公开(公告)号:US07198883B2

    公开(公告)日:2007-04-03

    申请号:US11229370

    申请日:2005-09-16

    IPC分类号: G03F7/09

    摘要: A positive-working, heat-sensitive material for making a lithographic printing plate by direct-to-plate recording is disclosed. The material comprises a hydrophobized grained and anodized aluminum support and a layer comprising a compound capable of converting light into heat provided onto said support, said support being obtainable by RF plasma treatment of a grained and anodized aluminum support in the presence of a fluorine containing gas.

    摘要翻译: 公开了一种用于通过直接到板记录制造平版印刷版的正性工作的热敏材料。 该材料包括疏水化的颗粒和阳极氧化的铝载体和包含能够将光转化成所述载体上的热的化合物的层,所述载体可通过在含氟气体存在下的粒状和阳极化的铝载体的RF等离子体处理 。

    Processless lithographic printing plates
    27.
    发明申请
    Processless lithographic printing plates 审中-公开
    无处理平版印刷版

    公开(公告)号:US20060207458A1

    公开(公告)日:2006-09-21

    申请号:US11371860

    申请日:2006-03-08

    IPC分类号: B41N1/00

    摘要: A method of lithographic printing includes the steps of (i) providing a heat-sensitive lithographic printing plate precursor including, on a support having a hydrophilic surface or which is provided with a hydrophilic layer, a coating having a polymer modified with at least two groups which can form four hydrogen bonds, the groups being defined as quadruple hydrogen bonds (QHB groups); (ii) exposing the printing plate precursor to heat and/or infrared light whereby the coating switches from a hydrophilic state into a hydrophobic state or from a hydrophobic state into a hydrophilic state, thereby producing a lithographic printing master without an intermediate wet development step; and (iii) supplying ink and/or fountain solution to the lithographic printing master via a lithographic printing press.

    摘要翻译: 平版印刷的方法包括以下步骤:(i)提供热敏平版印刷版原版,其包含在具有亲水性表面的或具有亲水层的载体上,所述涂层具有用至少两个基团改性的聚合物 其可以形成四个氢键,这些基团被定义为四重氢键(QHB基团); (ii)将印版前体暴露于加热和/或红外光,由此涂层从亲水状态转变为疏水状态或从疏水状态转变为亲水状态,由此产生平版印刷母版而无中间湿显影步骤; 和(iii)通过平版印刷机将油墨和/或润版液供应给平版印刷母版。

    Process for preparing nano-porous metal oxide semiconductor layers
    28.
    发明授权
    Process for preparing nano-porous metal oxide semiconductor layers 失效
    制备纳米多孔金属氧化物半导体层的方法

    公开(公告)号:US06929970B2

    公开(公告)日:2005-08-16

    申请号:US10659982

    申请日:2003-09-11

    IPC分类号: H01G9/20 H01L21/00 H01L25/00

    摘要: A process for preparing a layer of a nano-porous metal oxide semiconductor comprising the steps of: (i) providing metal oxide semiconductor nano-particles prepared by a wet precipitation process, (ii) heating said nano-particles at a temperature in the range of 250 to 600° C., (iii) preparing a dispersion of said heat-treated nano-particles from step (ii), (iv) applying said dispersion prepared in step (iii) to a support to produce a coating; and (v) subjecting said coating to a pressure in the range of 100 to 1000 bar at a temperature below 250° C.; a layer of a nano-porous metal oxide semiconductor obtained by this process; and a photovoltaic device comprising a layer of a nano-porous metal oxide semiconductor obtained by this process.

    摘要翻译: 一种制备纳米多孔金属氧化物半导体层的方法,包括以下步骤:(i)提供通过湿沉淀法制备的金属氧化物半导体纳米颗粒,(ii)在该范围内的温度下加热所述纳米颗粒 (iii)制备来自步骤(ii)的所述经热处理的纳米颗粒的分散体,(iv)将步骤(iii)中制备的所述分散体施加到载体上以产生涂层; 和(v)在低于250℃的温度下对所述涂层进行100-1000巴范围内的压力; 通过该方法获得的纳米多孔金属氧化物半导体层; 以及包括通过该方法获得的纳米多孔金属氧化物半导体层的光伏器件。

    Heat-sensitive lithographic printing plate precursor
    29.
    发明申请
    Heat-sensitive lithographic printing plate precursor 有权
    热敏平版印刷版前体

    公开(公告)号:US20050106501A1

    公开(公告)日:2005-05-19

    申请号:US10987928

    申请日:2004-11-12

    IPC分类号: B41C1/10 G03C1/492

    摘要: A heat sensitive lithographic printing plate precursor is disclosed comprising on a support having a hydrophilic surface or which is provided with a hydrophilic layer, a coating comprising an infrared light absorbing agent and a copolymer which comprises a plurality of recurring units X having a hydrophilic polymeric pendant group and a plurality of recurring units Y having a hydrophobic polymeric pendant group. Said coating is capable of switching from a hydrophilic state into a hydrophobic state after exposure to heat and/or infrared light.

    摘要翻译: 公开了一种热敏平版印刷版原版,其包含在具有亲水性表面的支持体上,或者设置有亲水层,包含红外光吸收剂的涂层和包含多个具有亲水性聚合物侧基的重复单元X的共聚物 基团和多个具有疏水性聚合物侧基的重复单元Y。 所述涂层能够在暴露于热和/或红外光之后从亲水状态转变成疏水状态。

    Process for preparing nano-porous metal oxide semiconductor layers

    公开(公告)号:US20050016577A1

    公开(公告)日:2005-01-27

    申请号:US10659982

    申请日:2003-09-11

    IPC分类号: H01G9/20 H01L21/00 H01L25/00

    摘要: A process for preparing a layer of a nano-porous metal oxide semiconductor comprising the steps of: (i) providing metal oxide semiconductor nano-particles prepared by a wet precipitation process, (ii) heating said nano-particles at a temperature in the range of 250 to 600° C., (iii) preparing a dispersion of said heat-treated nano-particles from step (ii), (iv) applying said dispersion prepared in step (iii) to a support to produce a coating; and (v) subjecting said coating to a pressure in the range of 100 to 1000 bar at a temperature below 250° C.; a layer of a nano-porous metal oxide semiconductor obtained by this process; and a photovoltaic device comprising a layer of a nano-porous metal oxide semiconductor obtained by this process.