公开(公告)号：US20220308447A1

公开(公告)日：2022-09-29

申请号：US17839784

申请日：2022-06-14

Applicant: Inpria Corporation

Inventor： Jason K. Stowers ,  Alan J. Telecky ,  Douglas A. Keszler ,  Andrew Grenville

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/32

Abstract: Stabilized precursor solutions can be used to form radiation inorganic coating materials. The precursor solutions generally comprise metal suboxide cations, peroxide-based ligands and polyatomic anions. Design of the precursor solutions can be performed to achieve a high level of stability of the precursor solutions. The resulting coating materials can be designed for patterning with a selected radiation, such as ultraviolet light, x-ray radiation or electron beam radiation. The radiation patterned coating material can have a high contrast with respect to material properties, such that development of a latent image can be successful to form lines with very low line-width roughness and adjacent structures with a very small pitch.

公开(公告)号：US20210011383A1

公开(公告)日：2021-01-14

申请号：US16926125

申请日：2020-07-10

Applicant: Inpria Corporation

Inventor： Brian J. Cardineau ,  Shu-Hao Chang ,  Jason K. Stowers ,  Michael Kocsis ,  Peter de Schepper

IPC: G03F7/11 ,  G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

Abstract: A method is described for stabilizing organometallic coating interfaces through the use of multilayer structures that incorporate an underlayer coating. The underlayer is composed of an organic polymer that has crosslinking and adhesion-promoting functional groups. The underlayer composition may include photoacid generators. Multilayer structures for patterning are described based on organometallic radiation sensitive patterning compositions, such as alkyl tin oxo hydroxo compositions, which are placed over a polymer underlayer.

公开(公告)号：US20180039172A1

公开(公告)日：2018-02-08

申请号：US15784258

申请日：2017-10-16

Applicant: Inpria Corporation

Inventor： Jason K. Stowers ,  Alan J. Telecky ,  Douglas A. Keszler ,  Andrew Grenville

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/0043 ,  G03F7/0042 ,  G03F7/20 ,  G03F7/327 ,  Y10T428/24355

Abstract: Stabilized precursor solutions can be used to form radiation inorganic coating materials. The precursor solutions generally comprise metal suboxide cations, peroxide-based ligands and polyatomic anions. Design of the precursor solutions can be performed to achieve a high level of stability of the precursor solutions. The resulting coating materials can be designed for patterning with a selected radiation, such as ultraviolet light, x-ray radiation or electron beam radiation. The radiation patterned coating material can have a high contrast with respect to material properties, such that development of a latent image can be successful to form lines with very low line-width roughness and adjacent structures with a very small pitch.

公开(公告)号：US20170261850A1

公开(公告)日：2017-09-14

申请号：US15455784

申请日：2017-03-10

Applicant: Inpria Corporation

Inventor： Jason K. Stowers ,  Andrew Grenville

IPC: G03F7/00 ,  G03F7/004 ,  H01L21/311 ,  G03F7/32 ,  H01L21/32 ,  H01L21/027 ,  G03F7/20

CPC classification number: G03F7/0035 ,  G03F7/0043 ,  G03F7/11 ,  G03F7/32 ,  G03F7/325 ,  H01L21/0274 ,  H01L21/0337 ,  H01L21/32

Abstract: High etch contrast materials provide the basis for using pre-patterned template structure with a template hardmask having periodic holes and filler within the holes that provides the basis for rapidly obtaining high resolution patterns guided by the template and high etch contrast resist. Methods are described for performing the radiation lithography, e.g., EUV radiation lithography, using the pre-patterned templates. Also, methods are described for forming the templates. The materials for forming the templates are described.