公开(公告)号：US20150253663A1

公开(公告)日：2015-09-10

申请号：US14638521

申请日：2015-03-04

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Shinya MINEGISHI ,  Yuji NAMIE ,  Tomoki NAGAI

IPC: G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0397 ,  G03F7/0002

Abstract: A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers, and an acid generator. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes an acid-labile group in a side chain thereof. The acid generator generates an acid upon application of energy. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure.

Abstract translation: 用于图案形成的组合物包括聚合物或包含多种聚合物的聚合物组和酸产生剂。 聚合物或聚合物组能够通过定向自组装形成相分离结构。 聚合物组中的聚合物或至少一种聚合物包括侧链中的酸不稳定基团。 酸发生器在施加能量时产生酸。 图案形成方法包括使用该组合物在衬底上提供定向的自组装膜。 定向自组装膜包括相分离结构。

公开(公告)号：US20130344249A1

公开(公告)日：2013-12-26

申请号：US13923176

申请日：2013-06-20

Applicant: JSR CORPORATION

Inventor： Shinya MINEGISHI ,  Yuji NAMIE ,  Tomoki NAGAI

IPC: C08L25/06 ,  C08L33/14 ,  C08L33/16 ,  B05D5/00

CPC classification number: C08L25/06 ,  B05D5/00 ,  C08L33/14 ,  C08L33/16 ,  C09D133/066 ,  C09D133/08 ,  C09D133/16 ,  G03F7/0002 ,  C08L33/06

Abstract: A directed self-assembly composition for pattern formation, includes two or more kinds of polymers. The two or more kinds of polymers each do not have a silicon atom in a main chain thereof. At least one of the two or more kinds of polymers has a group binding to the polymerizing end of the main chain and having a hetero atom.

Abstract translation: 用于图案形成的定向自组装组合物包括两种或更多种聚合物。 两种或更多种聚合物在其主链中不具有硅原子。 两种或更多种聚合物中的至少一种具有与主链的聚合端结合且具有杂原子的基团。

公开(公告)号：US20130095428A1

公开(公告)日：2013-04-18

申请号：US13653468

申请日：2012-10-17

Applicant: JSR Corporation

Inventor： Kazuki KASAHARA ,  Kazuo NAKAHARA ,  Hiromu MIYATA ,  Tomoki NAGAI

IPC: G03F7/027

CPC classification number: G03F7/0397 ,  C08F220/18 ,  C08K5/42 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325 ,  C08L33/14 ,  C08F2220/1841 ,  C08F2220/283 ,  C08F2220/382 ,  C08F220/42 ,  C08F220/22 ,  C08F2220/1875 ,  C08L33/16

Abstract: A radiation-sensitive resin composition includes a compound represented by a following formula (1) and a base polymer. In the formula (1), R1 represents a monovalent cyclic organic group having a cyclic ester structure or a cyclic ketone structure; R2 represents a single bond or —CH2—; X is —O—*, —COO—*, —O—CO—O—* or —SO2-O—*, wherein * denotes a binding site to R3; R3 represents a bivalent chain hydrocarbon group having 1 to 5 carbon atoms; and M+ is a monovalent cation. The base polymer has a structural unit derived from (meth)acrylate that includes a lactone skeleton, a structural unit derived from (meth)acrylate that includes a cyclic carbonate skeleton, a structural unit derived from (meth)acrylate that includes a sultone skeleton, a structural unit derived from (meth)acrylate that includes a polar group, or a combination thereof. R1—R2—X—R3—CHF—CF2—SO3−M+  (1)

Abstract translation: 辐射敏感性树脂组合物包含由下式（1）表示的化合物和基础聚合物。 式（1）中，R 1表示具有环状酯结构或环状酮结构的1价的环状有机基团， R 2表示单键或-CH 2 - ; X是-O-，-COO- *，-O-CO-O- *或-SO2-O- *，其中*表示与R3的结合位点; R3表示碳原子数为1〜5的二价链烃基; M +是一价阳离子。 基础聚合物具有衍生自包含内酯骨架的（甲基）丙烯酸酯的结构单元，衍生自包含环状碳酸酯骨架的（甲基）丙烯酸酯的结构单元，衍生自包含磺内酯骨架的（甲基）丙烯酸酯的结构单元， 衍生自包括极性基团的（甲基）丙烯酸酯的结构单元或其组合。 R1-R2-X-R3-CHF-CF2-SO3-M +（1）