Aqueous developing solutions for reduced developer residue
    22.
    发明授权
    Aqueous developing solutions for reduced developer residue 失效
    用于还原显影剂残留物的水性显影液

    公开(公告)号:US5922522A

    公开(公告)日:1999-07-13

    申请号:US69518

    申请日:1998-04-29

    IPC分类号: G03F7/32

    CPC分类号: G03F7/322

    摘要: An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent, an ethoxylated surfactant having the general formula:R--�O--(AO).sub.n !.sub.m --X (I)where AO are alkylene oxide units selected from ethylene oxide units (CH.sub.2 --CH.sub.2 --O) and propylene oxide units (CH(CH.sub.3)--CH.sub.2 --O) or (CH.sub.2 --CH(CH.sub.3)--O), where R is a hydrophobic group, X is H or an anionic group, m is from 1 to 3, and n is at least about 8, and the molar ratio of total ethylene oxide units to total propylene oxide units is between about 1:4 and about 4:1, preferably between about 2:3 and about 3:2.

    摘要翻译: 用于显影光致抗蚀剂等的碱性水性显影液含有具有以下通式的乙氧基化表面活性剂作为抗浮渣剂:R- [O-(AO)n] mX(I),其中AO是选自 环氧乙烷单元(CH 2 -CH 2 -O)和环氧丙烷单元(CH(CH 3)-CH 2 -O)或(CH 2 -CH(CH 3)-O),其中R是疏水基团,X是H或阴离子基团 ,m为1至3,n为至少约8,并且总环氧乙烷单元与总环氧丙烷单元的摩尔比为约1:4至约4:1,优选约2:3至约 3:2。