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21.发明授权Lithographic device, device manufacturing method and device manufactured thereby 有权平版印刷装置，装置制造方法和由此制造的装置公开(公告)号：US07684012B2
公开(公告)日：2010-03-23
申请号：US11391731
申请日：2006-03-29
申请人： Johannes Henricus Wilhelmus Jacobs , Vadim Yevgenyevich Banine , Barrie Dudley Brewster , Vladimir Vitalevitch Ivanov , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Robert Gordon Livesey , Bastiaan Theodoor Wolschrijn
发明人： Johannes Henricus Wilhelmus Jacobs , Vadim Yevgenyevich Banine , Barrie Dudley Brewster , Vladimir Vitalevitch Ivanov , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Robert Gordon Livesey , Bastiaan Theodoor Wolschrijn
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.
摘要翻译： 光刻设备被配置为将图案从图案形成装置投影到基板上。 该装置包括在装置的至少两个不同区域之间延伸的气体净化密封孔，以及构造成为密封孔提供一种或多种选自包括氢，氘，重氢，氘代氢和 氩和氢的混合物。
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公开(公告)号：US07629594B2
公开(公告)日：2009-12-08
申请号：US11544930
申请日：2006-10-10
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Peterus Henricus De Kuster , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Bastiaan Theodoor Wolschrijn , Yurii Victorovitch Sidelnikov , Marc Hubertus Lorenz Van Der Velden , Wouter Anthon Soer , Thomas Stein , Kurt Gielissen
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Peterus Henricus De Kuster , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Bastiaan Theodoor Wolschrijn , Yurii Victorovitch Sidelnikov , Marc Hubertus Lorenz Van Der Velden , Wouter Anthon Soer , Thomas Stein , Kurt Gielissen
IPC分类号： G21K5/00
CPC分类号： G03F7/70925 , G03F7/7085 , G03F7/70908 , G03F7/70916
摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
摘要翻译： 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。
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公开(公告)号：US20080083885A1
公开(公告)日：2008-04-10
申请号：US11544930
申请日：2006-10-10
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Peterus Henricus De Kuster , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Bastiaan Theodoor Wolschrijn , Yurii Victorovitch Sidelnikov , Marc Hubertus Lorenz Van Der Velden , Wouter Anton Soer , Thomas Stein , Kurt Gielissen
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Peterus Henricus De Kuster , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Bastiaan Theodoor Wolschrijn , Yurii Victorovitch Sidelnikov , Marc Hubertus Lorenz Van Der Velden , Wouter Anton Soer , Thomas Stein , Kurt Gielissen
CPC分类号： G03F7/70925 , G03F7/7085 , G03F7/70908 , G03F7/70916
摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
摘要翻译： 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。
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24.发明授权Optical element with at least one electrically conductive region, and illumination system with the optical element 有权具有至少一个导电区域的光学元件和具有光学元件的照明系统公开(公告)号：US08553200B2
公开(公告)日：2013-10-08
申请号：US12751849
申请日：2010-03-31
IPC分类号： G03B27/42
CPC分类号： G03F7/7085 , G03F7/70141 , G03F7/70258
摘要： An optical element includes first regions which reflect or transmit the light falling on the optical element. The optical element also includes second regions which are in each instance separated by a distance from a first region and which at least partially surround a first region. The second regions are designed to be at least in part electrically conductive and are electrically insulated from the first regions. The optical element includes a carrier element and at least two first regions in the form of mirror facets which are arranged on the carrier element. The second regions are arranged with a separation from the mirror facets on the carrier element and are electrically insulated against the carrier element as well as against the mirror facet. At least one mirror facet is surrounded by an electrically conductive second region.
摘要翻译： 光学元件包括反射或透射落在光学元件上的光的第一区域。 光学元件还包括第二区域，其在每个实例中被隔开与第一区域的距离并且至少部分地围绕第一区域。 第二区域被设计为至少部分导电并且与第一区域电绝缘。 光学元件包括载体元件和布置在载体元件上的镜面形式的至少两个第一区域。 第二区域布置成与载体元件上的镜面分开并且与载体元件以及镜面相电绝缘。 至少一个镜面由导电的第二区域包围。
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25.发明申请OPTICAL ELEMENT WITH AT LEAST ONE ELECTRICALLY CONDUCTIVE REGION, AND ILLUMINATION SYSTEM WITH THE OPTICAL ELEMENT 有权具有至少一个导电区域的光学元件和具有光学元件的照明系统公开(公告)号：US20100231877A1
公开(公告)日：2010-09-16
申请号：US12751849
申请日：2010-03-31
CPC分类号： G03F7/7085 , G03F7/70141 , G03F7/70258
摘要： An optical element includes first regions which reflect or transmit the light falling on the optical element. The optical element also includes second regions which are in each instance separated by a distance from a first region and which at least partially surround a first region. The second regions are designed to be at least in part electrically conductive and are electrically insulated from the first regions. The optical element includes a carrier element and at least two first regions in the form of mirror facets which are arranged on the carrier element. The second regions are arranged with a separation from the mirror facets on the carrier element and are electrically insulated against the carrier element as well as against the mirror facet. At least one mirror facet is surrounded by an electrically conductive second region.
摘要翻译： 光学元件包括反射或透射落在光学元件上的光的第一区域。 光学元件还包括第二区域，其在每个实例中被隔开与第一区域的距离并且至少部分地围绕第一区域。 第二区域被设计为至少部分导电并且与第一区域电绝缘。 光学元件包括载体元件和布置在载体元件上的镜面形式的至少两个第一区域。 第二区域布置成与载体元件上的镜面分开并且与载体元件以及镜面相电绝缘。 至少一个镜面由导电的第二区域包围。
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