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21.发明授权公开(公告)号：US10197389B2
公开(公告)日：2019-02-05
申请号：US15305166
申请日：2016-08-18
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yuri Paskover , Yuval Lubashevsky , Amnon Manassen
Abstract: Metrology measurement methods and tools are provided, which illuminate a stationary diffractive target by a stationary illumination source, measure a signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal, repeat the measuring for a plurality of relations between the zeroth and the first diffraction signals, while maintaining the diffractive target and the illumination source stationary, and derive the first order diffraction signal from the measured sums. Illumination may be coherent and measurements may be in the pupil plane, or illumination may be incoherent and measurements may be in the field plane, in either case, partial overlapping of the zeroth and the first diffraction orders are measured. Illumination may be annular and the diffractive target may be a one cell SCOL target with periodic structures having different pitches to separate the overlap regions.
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22.发明授权公开(公告)号：US10190979B2
公开(公告)日：2019-01-29
申请号：US14928514
申请日：2015-10-30
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Yuri Paskover , Barry Loevsky , Daria Negri
Abstract: Metrology targets, design files, and design and production methods thereof are provided. Metrology targets comprising at least one reflection-symmetric pair of reflection-asymmetric structures are disclosed. The structures may or may not be periodic, may comprise a plurality of unevenly-spaced target elements, which may or may not be segmented. The asymmetry may be with respect to target element segmentation or structural dimensions. Also, target design files and metrology measurements of the various metrology targets are disclosed.
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公开(公告)号：US10101592B2
公开(公告)日：2018-10-16
申请号：US15829111
申请日：2017-12-01
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yuri Paskover , Daniel Kandel
Abstract: Metrology targets and methods are provided, which provide self-Moiré measurements of unresolved target features, i.e., interaction of electromagnetic fields re-scattered off elements within a single target layer provides signals with Moiré pitches that are measurable, although the actual target pitches are unresolved and possibly device-like. Targets comprise cell(s) with interlaced lines of elements having different device-like pitches which are selected to yield resolved Moiré pitch(es). Different target designs are presented for scatterometry and imaging metrology measurements, as well as for critical dimension, dose and focus, and pitch walk measurements—of device-like targets.
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公开(公告)号：US20180081193A1
公开(公告)日：2018-03-22
申请号：US15829111
申请日：2017-12-01
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yuri Paskover , Daniel Kandel
CPC classification number: G02B27/60 , G01B11/02 , G01B11/25 , G03F7/70616
Abstract: Metrology targets and methods are provided, which provide self-Moiré measurements of unresolved target features, i.e., interaction of electromagnetic fields re-scattered off elements within a single target layer provides signals with Moiré pitches that are measurable, although the actual target pitches are unresolved and possibly device-like. Targets comprise cell(s) with interlaced lines of elements having different device-like pitches which are selected to yield resolved Moiré pitch(es). Different target designs are presented for scatterometry and imaging metrology measurements, as well as for critical dimension, dose and focus, and pitch walk measurements—of device-like targets.
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公开(公告)号：US20170146810A1
公开(公告)日：2017-05-25
申请号：US15112819
申请日：2016-05-19
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yuri Paskover , Daniel Kandel
CPC classification number: G02B27/60 , G01B11/02 , G01B11/25 , G03F7/70616
Abstract: Metrology targets and methods are provided, which provide self-Moiré measurements of unresolved target features, i.e., interaction of electromagnetic fields re-scattered off elements within a single target layer provides signals with Moiré pitches that are measurable, although the actual target pitches are unresolved and possibly device-like. Targets comprise cell(s) with interlaced lines of elements having different device-like pitches which are selected to yield resolved Moiré pitch(es). Different target designs are presented for scatterometry and imaging metrology measurements, as well as for critical dimension, dose and focus, and pitch walk measurements—of device-like targets.
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Patent Agency Ranking
公开(公告)号：US10677588B2
公开(公告)日：2020-06-09
申请号：US15948941
申请日：2018-04-09
Applicant: KLA-Tencor Corporation
Inventor： Andrew V. Hill , Ohad Bachar , Avi Abramov , Yuri Paskover , Dor Perry
Abstract: An overlay metrology tool providing site-by-site alignment includes a controller coupled to a telecentric imaging system. The controller may receive two or more alignment images of an overlay target on a sample captured at two or more focal positions by the imaging system, generate alignment data indicative of an alignment of the overlay target within the imaging system based on the alignment images, set the alignment images as measurement images when the alignment of the overlay target is within selected alignment tolerances, direct the imaging system to adjust the alignment of the overlay target in the imaging system and further receive one or more measurement images from the imaging system when the alignment of the overlay target is outside the selected alignment tolerances, and determine overlay between two or more layers of the sample based on at least one of the measurement images.
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公开(公告)号：US10565697B2
公开(公告)日：2020-02-18
申请号：US15739381
申请日：2017-10-22
Applicant: KLA-Tencor Corporation
Inventor： Tzahi Grunzweig , Nadav Gutman , David Gready , Mark Ghinovker , Vladimir Levinski , Claire E. Staniunas , Nimrod Shuall , Yuri Paskover
Abstract: Systems and methods are provided, which calculate overlay misregistration error estimations from analyzed measurements of each ROI (region of interest) in at least one metrology imaging target, and incorporate the calculated overlay misregistration error estimations in a corresponding estimation of overlay misregistration. Disclosed embodiments provide a graduated and weighted analysis of target quality which may be integrated in a continuous manner into the metrology measurement processes, and moreover evaluates target quality in terms of overlay misregistration, which forms a common basis for evaluation of errors from different sources, such as characteristics of production steps, measurement parameters and target characteristics. Such common basis then enables any of combining various error sources to give a single number associated with measurement fidelity, analyzing various errors at wafer, lot and process levels, and/or to trade-off the resulting accuracy for throughput by reducing the number of measurements, in a controlled manner.
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公开(公告)号：US10139528B1
公开(公告)日：2018-11-27
申请号：US15408351
申请日：2017-01-17
Applicant: KLA-Tencor Corporation
Inventor： Joel Seligson , Vladimir Levinski , Yuri Paskover , Amnon Manassen , Daniel Kandel , Andrew V. Hill
Abstract: Objective lenses and corresponding optical systems and metrology tools, as well as methods are provided. Objective lenses comprise a central region conforming to specified imaging requirements and a peripheral region conforming to specified scatterometry requirements. The optical systems may comprise common-path optical elements configured to handle both imaging and scatterometry signals received through the objective lens. Using a single objective lens simplifies the design of the optical system while maintaining, simultaneously, the performance requirements for imaging as well as for scatterometry.
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公开(公告)号：US20180335346A1
公开(公告)日：2018-11-22
申请号：US16052044
申请日：2018-08-01
Applicant: KLA-Tencor Corporation
Inventor： Andrew V. Hill , Amnon Manassen , Yuri Paskover , Yuval Lubashevsky
CPC classification number: G01J4/04 , G01B11/272 , G03F7/70633
Abstract: Metrology methods and systems are provided, in which the detected image is split at a field plane of the collection path of the metrology system's optical system into at least two pupil plane images. Optical elements such as prisms may be used to split the field plane images, and multiple targets or target cells may be measured simultaneously by spatially splitting the field plane and/or the illumination sources and/or by using two polarization types. The simultaneous capturing of multiple targets or target cells increases the throughput of the disclosed metrology systems.
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公开(公告)号：US20180292326A1
公开(公告)日：2018-10-11
申请号：US15608766
申请日：2017-05-30
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Daria Negri , Andrew V. Hill , Ohad Bachar , Vladimir Levinski , Yuri Paskover
IPC: G01N21/88 , G01B11/27 , G01N21/33 , G01N21/3563 , G01N21/95
CPC classification number: G01N21/8806 , G01B11/0633 , G01B11/272 , G01B2210/56 , G01N21/33 , G01N21/3563 , G01N21/8422 , G01N21/9505 , G01N21/956 , G01N2021/8438 , G01N2021/8845 , G01N2201/06113 , G03F7/70633
Abstract: A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumination device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers.
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