公开(公告)号：US06777511B2

公开(公告)日：2004-08-17

申请号：US09956890

申请日：2001-09-21

申请人： Koshiro Ochiai ,  Akira Kamabuchi

发明人： Koshiro Ochiai ,  Akira Kamabuchi

IPC分类号： C08F606

CPC分类号： C08F6/02 ,  C08L33/00

摘要： An industrially excellent process for producing a poly(meth)acrylate having a reduced metal content which comprises contacting a mixture of a poly(meth)acrylate and an organic solvent with an acidic aqueous solution, such as an aqueous solution obtained by dissolving a polyprotic carboxylic acid having about 2 to 12 carbon atoms in water, is provided, and, by this invention, contents of metals such as sodium, potassium, iron and the like can be remarkably reduced.

摘要翻译： 一种工业上优异的具有降低的金属含量的聚（甲基）丙烯酸酯的制备方法，其包括使聚（甲基）丙烯酸酯和有机溶剂的混合物与酸性水溶液接触，所述酸性水溶液例如通过将多元羧酸 提供了在水中具有约2至12个碳原子的酸，并且通过本发明，可以显着降低诸如钠，钾，铁等的金属的含量。

公开(公告)号：US06548220B2

公开(公告)日：2003-04-15

申请号：US09886386

申请日：2001-06-22

申请人： Yasunori Uetani ,  Kenji Oohashi ,  Akira Kamabuchi

发明人： Yasunori Uetani ,  Kenji Oohashi ,  Akira Kamabuchi

IPC分类号： G03F7004

CPC分类号： G03F7/039 ,  C07C381/00 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/115 ,  Y10S430/122

摘要： A chemical amplifying type positive resist composition which provides a resist pattern having an exceedingly improved line edge roughness, and is excellent in various resist performances such as dry etching resistance, sensitivity and resolution; and comprises: (A) an acid generator containing (a) a sulfonium salt represented by the following formula (I):  wherein Q1 and Q2 is alkyl or a cycloalkyl, or Q1 and Q2 form, together with a sulfur atom to which Q1 and Q2 are adjacent, an heteroalicyclic group; Q3 represents a hydrogen atom, Q4 represents alkyl or a cycloalkyl, or Q3 and Q4 form, together with a CHC(O) group to which Q3 and Q4 are adjacent, a 2-oxocycloalkyl group; and Q5SO3− represents an organosulfonate ion, and (b) at least one onium salt selected from a triphenylsulfonium salt represented by the following formula (IIa), and a diphenyliodonium salt represented by the following formula (IIb):  wherein P1 to P5 represent hydrogen, a hydroxyl group, alkyl, or alkoxy; and P6SO3− and P7SO3− each independently represent an organosulfonate ion; and (B) a resin which has a polymerization unit having a group instable against an acid, and is alkali-insoluble or -slightly soluble itself, but is converted to alkali-soluble by the action of an acid.

摘要翻译： 一种化学放大型正光刻胶组合物，其提供具有非常改善的线边缘粗糙度的抗蚀剂图案，并且具有优异的各种抗蚀性能，例如耐干蚀刻性，灵敏度和分辨率; 并且包括：（A）酸产生剂，其含有（a）由下式（I）表示的锍盐：其中Q1和Q2是烷基或环烷基，或Q1和Q2形成， Q2是相邻的杂脂族基; Q3表示氢原子，Q4表示烷基或环烷基，或Q3和Q4形式，以及Q3和Q4相邻的CHC（O）基团，2-氧代环烷基; 和Q 5 SO 3 - 表示有机磺酸根离子，和（b）至少一种选自由下式（IIa）表示的三苯基锍盐的鎓盐和由下式（IIb）表示的二苯基碘鎓盐：其中P1至P5表示氢 ，羟基，烷基或烷氧基; 和P 6 SO 3 - 和P 7 SO 3 - 各自独立地表示有机磺酸根离子; 和（B）具有聚合单元的树脂，其具有对酸不稳定的基团，并且其本身不溶于碱或不溶性，但通过酸的作用转化为碱溶性。

公开(公告)号：US20090286937A1

公开(公告)日：2009-11-19

申请号：US12465987

申请日：2009-05-14

申请人： Akira Kamabuchi ,  Satoshi Yamaguchi

发明人： Akira Kamabuchi ,  Satoshi Yamaguchi

IPC分类号： C08F24/00

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046

摘要： The present invention provides a chemically amplified positive composition comprising a resin which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom etc., R′ and R″ are independently a hydrogen atom etc., k represents an integer of 1 to 12, R is independently a C1-C6 alkyl group etc. and x represents an integer of 0 to 7, and an acid generator represented by the formula (V): wherein Y1 and Y2 each independently represent a fluorine atom etc., R12 represents a C1-C30 linear, branched chain or cyclic hydrocarbon group which may be substituted, and A+ represents an organic counter ion.

摘要翻译： 本发明提供一种化学放大阳性组合物，其包含树脂，其包含侧链具有酸不稳定基团的结构单元和由式（I）表示的结构单元：其中R 1表示氢原子等，R' R“独立地为氢原子等，k表示1〜12的整数，R独立地为C1-C6烷基等，x表示0〜7的整数，由式 （V）表示：其中Y1和Y2各自独立地表示氟原子等，R12表示可被取代的C1-C30直链，支链或环状烃基，A +表示有机抗衡离子。

公开(公告)号：US07576223B2

公开(公告)日：2009-08-18

申请号：US12155072

申请日：2008-05-29

申请人： Airi Yamada ,  Yasunori Uetani ,  Akira Kamabuchi

发明人： Airi Yamada ,  Yasunori Uetani ,  Akira Kamabuchi

IPC分类号： C07D333/46 ,  C07D335/02

CPC分类号： G03F7/0045 ,  C07C381/12 ,  C07D333/46 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123

摘要： The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

摘要翻译： 本发明提供式（Ia）的锍盐，其包含式（Ib）的结构单元和化学扩增型正性抗蚀剂组合物的聚合化合物，其包含（A）酸产生剂，其包含至少一种选自以下的化合物 由式（Ia）的锍盐，包含式（Ib）的结构单元的聚合化合物和式（Ic）的锍盐组成。 和（B）树脂，其含有具有酸不稳定基团的结构单元，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液中。

公开(公告)号：US20080269506A1

公开(公告)日：2008-10-30

申请号：US12155072

申请日：2008-05-29

申请人： Airi Yamada ,  Yasunori Uetani ,  Akira Kamabuchi

发明人： Airi Yamada ,  Yasunori Uetani ,  Akira Kamabuchi

IPC分类号： C07C381/12 ,  C07D333/24 ,  C07D335/02

CPC分类号： G03F7/0045 ,  C07C381/12 ,  C07D333/46 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123

摘要： The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and(B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

摘要翻译： 本发明提供式（Ia）的锍盐，其包含式（Ib）的结构单元和化学扩增型正性抗蚀剂组合物的聚合化合物，其包含（A）酸产生剂，其包含至少一种选自以下的化合物 由式（Ia）的锍盐，包含式（Ib）的结构单元的聚合化合物和式（Ic）的锍盐组成。 和（B）树脂，其含有具有酸不稳定基团的结构单元，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液中。

公开(公告)号：US06627381B1

公开(公告)日：2003-09-30

申请号：US09890803

申请日：2001-10-25

申请人： Yasunori Uetani ,  Akira Kamabuchi

发明人： Yasunori Uetani ,  Akira Kamabuchi

IPC分类号： G03F7004

CPC分类号： G03F7/0045 ,  G03F7/039 ,  G03F7/0397

摘要： A chemical amplification type positive resist composition comprising: a resin which has a hydroxystyrene-based polymerization unit, a 3-hydroxy-1-adamantyl methacrylate-based polymerization unit and a polymerization unit having a group unstable toward an acid, and, though insoluble or hardly soluble in an alkali in itself, becomes alkali-soluble after the acid-unstable group has been cleaved by the action of an acid; and an acid generating agent is provided. This resist composition is improved in exposure latitude and resolution. Moreover, such properties as sensitivity, heat resistance, the ratio of residual thickness, coatability, and dry etching resistance are also maintained good. Thus, through the use of this composition, a fine resist pattern can be formed with high precision.

摘要翻译： 一种化学放大型正型抗蚀剂组合物，包括：具有羟基苯乙烯类聚合单元，甲基丙烯酸3-羟基-1-金刚烷基酯聚合单元和具有对酸不稳定的基团的聚合单元的树脂，以及尽管不溶或不溶 本身难溶于碱，在酸不稳定基团通过酸的作用被切割后，变成碱溶性的; 并提供酸生成剂。 该抗蚀剂组合物在曝光宽容度和分辨率方面得到改善。 此外，还保持了诸如灵敏度，耐热性，残留厚度比，涂布性和耐干蚀刻性等特性。 因此，通过使用该组合物，可以高精度地形成精细的抗蚀剂图案。