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    Amplification type positive resist composition
    3.
    发明授权
    Amplification type positive resist composition 失效
    放大型正光刻胶组合物

    公开(公告)号：US07135268B2

    公开(公告)日：2006-11-14

    申请号：US10440201

    申请日：2003-05-19

    申请人： Akira Kamabuchi ,  Yasunori Uetani ,  Hiroshi Moriuma

    发明人： Akira Kamabuchi ,  Yasunori Uetani ,  Hiroshi Moriuma

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/114 ,  Y10S430/115 ,  Y10S430/12

    摘要： The present invention provides a sulfonate of the formula (I′): wherein Q1, Q2, Q3, Q4 and Q5 each independently represent hydrogen, alkyl having 1 to 16 carbon atoms, alkoxy having 1 to 16 carbon atoms, or electron attractive group, with the proviso that at least one of Q1, Q2, Q3, Q4 and Q5 represents alkyl having 3 to 16 carbon atoms or alkoxy having 3 to 16 carbon atoms, and at least one of Q1, Q2, Q3, Q4 and Q5 is electron attractive group; and A′+ represents a counter ion of the formula (IIa), (IIb), (IIc) or (IId) which are identified in the specification. The present invention also provides a chemical amplification type positive resist composition comprising a sulfonate of the formula (I) wherein A+ represents counter ion, and Q1, Q2, Q3, Q4 and Q5 are as defined above; and resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

    摘要翻译： 本发明提供式（I'）的磺酸盐：其中Q 1，Q 2，Q 3，Q 4， 各自独立地表示氢，具有1至16个碳原子的烷基，具有1至16个碳原子的烷氧基或吸电子基团，条件是Q < Q 1，Q 2，Q 3，Q 4和Q 5代表具有 3至16个碳原子或具有3至16个碳原子的烷氧基，以及Q 1，Q 2，Q 3，Q 3中的至少一个，Q 3 4+和Q 5是吸电子基团; 并且A' + 表示在说明书中确定的式（IIa），（IIb），（IIc）或（IId）的抗衡离子。 本发明还提供了一种化学扩增型正性抗蚀剂组合物，其包含式（I）的磺酸盐，其中A 0+表示抗衡离子，Q 1， 2，Q 3，Q 4和Q 5如上所定义; 以及含有具有酸不稳定基团的结构单元的树脂，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液中。

    Chemical amplification type resist composition
    5.
    发明授权
    Chemical amplification type resist composition 失效
    化学放大型抗蚀剂组合物

    公开(公告)号：US07160669B2

    公开(公告)日：2007-01-09

    申请号：US10682038

    申请日：2003-10-10

    申请人： Airi Yamada ,  Yasunori Uetani ,  Akira Kamabuchi

    发明人： Airi Yamada ,  Yasunori Uetani ,  Akira Kamabuchi

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0045 ,  C07C381/12 ,  C07D333/46 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123

    摘要： The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

    摘要翻译： 本发明提供式（Ia）的锍盐，其包含式（Ib）的结构单元和化学扩增型正性抗蚀剂组合物的聚合化合物，其包含（A）酸产生剂，其包含至少一种选自以下的化合物 由式（Ia）的锍盐，包含式（Ib）的结构单元的聚合化合物和式（Ic）的锍盐组成。 和（B）树脂，其含有具有酸不稳定基团的结构单元，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液中。

    Chemical amplifying type positive resist composition and sulfonium salt
    6.
    发明授权
    Chemical amplifying type positive resist composition and sulfonium salt 失效
    化学放大型正光刻胶组合物和锍盐

    公开(公告)号：US06548220B2

    公开(公告)日：2003-04-15

    申请号：US09886386

    申请日：2001-06-22

    申请人： Yasunori Uetani ,  Kenji Oohashi ,  Akira Kamabuchi

    发明人： Yasunori Uetani ,  Kenji Oohashi ,  Akira Kamabuchi

    IPC分类号： G03F7004

    CPC分类号： G03F7/039 ,  C07C381/00 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/115 ,  Y10S430/122

    摘要： A chemical amplifying type positive resist composition which provides a resist pattern having an exceedingly improved line edge roughness, and is excellent in various resist performances such as dry etching resistance, sensitivity and resolution; and comprises: (A) an acid generator containing (a) a sulfonium salt represented by the following formula (I):  wherein Q1 and Q2 is alkyl or a cycloalkyl, or Q1 and Q2 form, together with a sulfur atom to which Q1 and Q2 are adjacent, an heteroalicyclic group; Q3 represents a hydrogen atom, Q4 represents alkyl or a cycloalkyl, or Q3 and Q4 form, together with a CHC(O) group to which Q3 and Q4 are adjacent, a 2-oxocycloalkyl group; and Q5SO3− represents an organosulfonate ion, and (b) at least one onium salt selected from a triphenylsulfonium salt represented by the following formula (IIa), and a diphenyliodonium salt represented by the following formula (IIb):  wherein P1 to P5 represent hydrogen, a hydroxyl group, alkyl, or alkoxy; and P6SO3− and P7SO3− each independently represent an organosulfonate ion; and (B) a resin which has a polymerization unit having a group instable against an acid, and is alkali-insoluble or -slightly soluble itself, but is converted to alkali-soluble by the action of an acid.

    摘要翻译： 一种化学放大型正光刻胶组合物，其提供具有非常改善的线边缘粗糙度的抗蚀剂图案，并且具有优异的各种抗蚀性能，例如耐干蚀刻性，灵敏度和分辨率; 并且包括：（A）酸产生剂，其含有（a）由下式（I）表示的锍盐：其中Q1和Q2是烷基或环烷基，或Q1和Q2形成， Q2是相邻的杂脂族基; Q3表示氢原子，Q4表示烷基或环烷基，或Q3和Q4形式，以及Q3和Q4相邻的CHC（O）基团，2-氧代环烷基; 和Q 5 SO 3 - 表示有机磺酸根离子，和（b）至少一种选自由下式（IIa）表示的三苯基锍盐的鎓盐和由下式（IIb）表示的二苯基碘鎓盐：其中P1至P5表示氢 ，羟基，烷基或烷氧基; 和P 6 SO 3 - 和P 7 SO 3 - 各自独立地表示有机磺酸根离子; 和（B）具有聚合单元的树脂，其具有对酸不稳定的基团，并且其本身不溶于碱或不溶性，但通过酸的作用转化为碱溶性。

    Chemical amplification type resist composition
    7.
    发明授权
    Chemical amplification type resist composition 失效
    化学放大型抗蚀剂组合物

    公开(公告)号：US07576223B2

    公开(公告)日：2009-08-18

    申请号：US12155072

    申请日：2008-05-29

    申请人： Airi Yamada ,  Yasunori Uetani ,  Akira Kamabuchi

    发明人： Airi Yamada ,  Yasunori Uetani ,  Akira Kamabuchi

    IPC分类号： C07D333/46 ,  C07D335/02

    CPC分类号： G03F7/0045 ,  C07C381/12 ,  C07D333/46 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123

    摘要： The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

    摘要翻译： 本发明提供式（Ia）的锍盐，其包含式（Ib）的结构单元和化学扩增型正性抗蚀剂组合物的聚合化合物，其包含（A）酸产生剂，其包含至少一种选自以下的化合物 由式（Ia）的锍盐，包含式（Ib）的结构单元的聚合化合物和式（Ic）的锍盐组成。 和（B）树脂，其含有具有酸不稳定基团的结构单元，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液中。

    Chemical amplification type resist composition
    8.
    发明申请
    Chemical amplification type resist composition 失效
    化学放大型抗蚀剂组合物

    公开(公告)号：US20080269506A1

    公开(公告)日：2008-10-30

    申请号：US12155072

    申请日：2008-05-29

    申请人： Airi Yamada ,  Yasunori Uetani ,  Akira Kamabuchi

    发明人： Airi Yamada ,  Yasunori Uetani ,  Akira Kamabuchi

    IPC分类号： C07C381/12 ,  C07D333/24 ,  C07D335/02

    CPC分类号： G03F7/0045 ,  C07C381/12 ,  C07D333/46 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123

    摘要： The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and(B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

    摘要翻译： 本发明提供式（Ia）的锍盐，其包含式（Ib）的结构单元和化学扩增型正性抗蚀剂组合物的聚合化合物，其包含（A）酸产生剂，其包含至少一种选自以下的化合物 由式（Ia）的锍盐，包含式（Ib）的结构单元的聚合化合物和式（Ic）的锍盐组成。 和（B）树脂，其含有具有酸不稳定基团的结构单元，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液中。

    Chemical amplification type positive resist composition
    9.
    发明授权
    Chemical amplification type positive resist composition 有权
    化学放大型正光刻胶组合物

    公开(公告)号：US06627381B1

    公开(公告)日：2003-09-30

    申请号：US09890803

    申请日：2001-10-25

    申请人： Yasunori Uetani ,  Akira Kamabuchi

    发明人： Yasunori Uetani ,  Akira Kamabuchi

    IPC分类号： G03F7004

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  G03F7/0397

    摘要： A chemical amplification type positive resist composition comprising: a resin which has a hydroxystyrene-based polymerization unit, a 3-hydroxy-1-adamantyl methacrylate-based polymerization unit and a polymerization unit having a group unstable toward an acid, and, though insoluble or hardly soluble in an alkali in itself, becomes alkali-soluble after the acid-unstable group has been cleaved by the action of an acid; and an acid generating agent is provided. This resist composition is improved in exposure latitude and resolution. Moreover, such properties as sensitivity, heat resistance, the ratio of residual thickness, coatability, and dry etching resistance are also maintained good. Thus, through the use of this composition, a fine resist pattern can be formed with high precision.

    摘要翻译： 一种化学放大型正型抗蚀剂组合物，包括：具有羟基苯乙烯类聚合单元，甲基丙烯酸3-羟基-1-金刚烷基酯聚合单元和具有对酸不稳定的基团的聚合单元的树脂，以及尽管不溶或不溶 本身难溶于碱，在酸不稳定基团通过酸的作用被切割后，变成碱溶性的; 并提供酸生成剂。 该抗蚀剂组合物在曝光宽容度和分辨率方面得到改善。 此外，还保持了诸如灵敏度，耐热性，残留厚度比，涂布性和耐干蚀刻性等特性。 因此，通过使用该组合物，可以高精度地形成精细的抗蚀剂图案。