公开(公告)号：US20050122491A1

公开(公告)日：2005-06-09

申请号：US10985037

申请日：2004-11-10

申请人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Vladimir Krivtsun

发明人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Vladimir Krivtsun

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.

摘要翻译： 提供光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑件。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于保持基板的基板台，用于将图案化的辐射束投影到基板的目标部分上的投影系统，以及用于将吸气剂颗粒供应到辐射束中的颗粒供应单元，以用作 吸收剂用于辐射束中的污染颗粒。 吸气剂颗粒具有至少约1nm的直径。

公开(公告)号：US20050117139A1

公开(公告)日：2005-06-02

申请号：US11019215

申请日：2004-12-23

申请人： Arno Bleeker ,  Vadim Banine

发明人： Arno Bleeker ,  Vadim Banine

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC分类号： G03F7/70283 ,  G03F7/70291 ,  G21K1/062

摘要： A programmable patterning structure for use with a lithographic projection apparatus according to one embodiment of the invention includes a plurality of reflective elements A, B, C, each reflective element having two distributed Bragg reflectors 51, 52. A separation D1 between the two distributed Bragg reflectors is adjustable between a first relation, at which destructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in substantially zero reflectivity, and a second relation, in which constructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in high reflectivity.

摘要翻译： 与根据本发明的一个实施例的光刻投影设备一起使用的可编程图案化结构包括多个反射元件A，B，C，每个反射元件具有两个分布式布拉格反射器51,52。两个分布式 布拉格反射器可以在第一关系之间调节，在第一关系处，来自第一和第二分布布拉格反射器51,52的反射之间的相消干涉导致基本上为零的反射率，以及第二关系，其中来自第一和第二分布布拉格 反射器51,52导致高反射率。

公开(公告)号：US20070145296A1

公开(公告)日：2007-06-28

申请号：US11314099

申请日：2005-12-22

申请人： Johannes Freriks ,  Vadim Banine ,  Vladimir Ivanov

发明人： Johannes Freriks ,  Vadim Banine ,  Vladimir Ivanov

IPC分类号： G03F7/20

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70166

摘要： A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa).

摘要翻译： 用于光刻设备模块的清洁装置可以设置在收集器中。 清洁装置包括被配置为向至少部分模块提供含氢自由基气体的氢根源，以及构造成将气体泵送通过模块的泵，使得通过至少部分的至少一部分提供含氢自由基气体的流速 该模块至少为1米/秒。 清洁装置还可以包括配置成将含氢自由基气体的流动调制到模块的至少一部分的气闸，与模块连通的至少1m 3的缓冲体积， 以及配置成在0.001mbar（0.1Pa）和1mbar（100Pa）之间的缓冲体积中提供气体压力的泵。

公开(公告)号：US20070140910A1

公开(公告)日：2007-06-21

申请号：US11311623

申请日：2005-12-20

申请人： Vadim Banine ,  Levinus Bakker ,  Ralph Kurt ,  Johannes Moors ,  Lucas Stevens ,  Peter Zalm

发明人： Vadim Banine ,  Levinus Bakker ,  Ralph Kurt ,  Johannes Moors ,  Lucas Stevens ,  Peter Zalm

IPC分类号： G01N33/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US20060268246A1

公开(公告)日：2006-11-30

申请号：US11391731

申请日：2006-03-29

申请人： Johannes Jacobs ,  Vadim Banine ,  Barrie Brewster ,  Vladimir Ivanov ,  Bastiaan Mertens ,  Johannes Moors ,  Robert Livesey ,  Baastiaan Wolschrijn

发明人： Johannes Jacobs ,  Vadim Banine ,  Barrie Brewster ,  Vladimir Ivanov ,  Bastiaan Mertens ,  Johannes Moors ,  Robert Livesey ,  Baastiaan Wolschrijn

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.

摘要翻译： 光刻设备被配置为将图案从图案形成装置投影到基板上。 该装置包括在装置的至少两个不同区域之间延伸的气体净化密封孔，以及构造成为密封孔提供一种或多种选自包括氢，氘，重氢，氘代氢和 氩和氢的混合物。

公开(公告)号：US20060221440A1

公开(公告)日：2006-10-05

申请号：US11091923

申请日：2005-03-29

申请人： Vadim Banine ,  Johannes Moors ,  Leonid Shmaenok ,  Nikolay Salashchenko

发明人： Vadim Banine ,  Johannes Moors ,  Leonid Shmaenok ,  Nikolay Salashchenko

IPC分类号： F21V9/04 ,  G02B1/10

CPC分类号： G03F7/70916 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G03F7/70941

摘要： A multi-layered spectral purity filters improveS the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam and also collect debris emitted from a radiation source.

摘要翻译： 多层光谱纯度滤光片提高极紫外（EUV）辐射束的光谱纯度，并且还收集从辐射源发射的碎片。

公开(公告)号：US20060127811A1

公开(公告)日：2006-06-15

申请号：US11007579

申请日：2004-12-09

申请人： Johannes Josephina Moors ,  Robertus Jacobus Van Ballegoij ,  Vadim Banine ,  Gert-Jan Heerens ,  Frederik Elisabeth Heuts ,  Johannes Wilhelmus Jacobs ,  Paulus Liebregts ,  Hendrik Johannes Neerhof

发明人： Johannes Josephina Moors ,  Robertus Jacobus Van Ballegoij ,  Vadim Banine ,  Gert-Jan Heerens ,  Frederik Elisabeth Heuts ,  Johannes Wilhelmus Jacobs ,  Paulus Liebregts ,  Hendrik Johannes Neerhof

IPC分类号： G03F7/00

CPC分类号： G03F7/70916 ,  G03F7/70883 ,  G03F7/70908

摘要： A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.

摘要翻译： 一种器件制造方法包括将图案化的辐射束投射通过光学隔室和通道，其在光学隔室和衬底隔室之间提供开放的连接到衬底上，保持电离冲洗气体在通道中的压力高于在 衬底隔室和在光电隔室中，在用电离冲洗气体从衬底发射的颗粒中突出，截留颗粒时，使用耦合到与至少一个 隔室，并且在通道的壁与出口和/或泵的转子之间建立电势差，使得泵的出口和/或转子吸引来自于冲洗气体的带正电荷的离子 渠道。

公开(公告)号：US20060072084A1

公开(公告)日：2006-04-06

申请号：US10956344

申请日：2004-10-04

申请人： Maarten Marinus Johannes Van Herpen ,  Vadim Banine ,  Johannes Hubertus Moors ,  Carolus Ida Spee ,  Derk Jan Klunder

发明人： Maarten Marinus Johannes Van Herpen ,  Vadim Banine ,  Johannes Hubertus Moors ,  Carolus Ida Spee ,  Derk Jan Klunder

IPC分类号： G03B27/52

CPC分类号： B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

摘要翻译： 在包括光学元件的设备的光学元件上去除沉积的方法包括在至少部分设备中提供含H 2的气体，包括从H 2 来自含H 2气体; 并使具有沉积的光学元件与至少部分氢自由基接触并除去至少部分沉积物。 此外，用于保护包括光学元件的设备的光学元件的方法包括通过沉积工艺向光学元件提供盖层; 并且在使用所述装置期间或之后，如上所述在去除过程中从所述光学元件中去除所述盖层的至少一部分。 该方法可以应用在光刻设备中。

公开(公告)号：US20050274897A1

公开(公告)日：2005-12-15

申请号：US11091238

申请日：2005-03-28

申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Markus Weiss ,  Vadim Banine ,  Marcel Dierichs ,  Roel Moors ,  Karl Schuster ,  Axel Scholz ,  Philipp Bosselmann ,  Bernd Warm

发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Markus Weiss ,  Vadim Banine ,  Marcel Dierichs ,  Roel Moors ,  Karl Schuster ,  Axel Scholz ,  Philipp Bosselmann ,  Bernd Warm

IPC分类号： G03F7/20 ,  G01J1/42

CPC分类号： G03F7/7085 ,  G03F7/70141 ,  G03F7/70558

摘要： There is provided an illumination system that includes (a) a light source that emits light having a wavelength ≦193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

摘要翻译： 提供了一种照明系统，其包括（a）发射波长<= 193nm的光的光源，其中所述光在远离光源的平面中提供预定照明并且在平面中限定使用区域，以及 （b）位于或靠近平面的传感器，用于检测使用区域外的光。

公开(公告)号：US20050243297A1

公开(公告)日：2005-11-03

申请号：US10836613

申请日：2004-05-03

申请人： Vadim Banine ,  Levinus Bakker ,  Jeroen Jonkers ,  Erik Loopstra

发明人： Vadim Banine ,  Levinus Bakker ,  Jeroen Jonkers ,  Erik Loopstra

IPC分类号： G02B5/08 ,  G03B27/54 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70008 ,  G03F7/7005

摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and distribution means which are arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distribution means in a first direction by a mirror surface. The distribution means further comprise a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

摘要翻译： 光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。 此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和被布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配装置。 中间的辐射束通过镜面从第一方向从分布装置引导。 分配装置还包括旋转驱动的反射镜装置，旋转轴线不平行于镜面。