公开(公告)号：US20090323044A1

公开(公告)日：2009-12-31

申请号：US12533513

申请日：2009-07-31

申请人： Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

发明人： Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

IPC分类号： G03B27/72 ,  G21K5/00

CPC分类号： G03F7/702 ,  G03F7/70075 ,  G03F7/70083

摘要： In general, in one aspect, the invention features a system that includes an illumination system of a microlithography tool, the illumination system including a first component having a plurality of elements. During operation of the system, the elements direct radiation from a source along an optical path to an arc-shaped object field at an object plane of a projection objective, and at least one of the elements has a curved shape that is different from the arc-shape of the object field.

摘要翻译： 通常，在一个方面，本发明的特征在于包括微光刻工具的照明系统的系统，所述照明系统包括具有多个元件的第一部件。 在系统操作期间，元件将来自光源的源的辐射直接引向投影物镜的物平面处的弧形物场，并且至少一个元件具有与弧不同的弯曲形状 对象字段的形状。

公开(公告)号：US20090091731A1

公开(公告)日：2009-04-09

申请号：US12233914

申请日：2008-09-19

申请人： Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

发明人： Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

IPC分类号： G03B27/70 ,  G02B5/09 ,  G03B27/54

CPC分类号： G03F7/70083 ,  G03F7/70075

摘要： The disclosure relates to illumination optical systems for microlithography, such as EUV-microlithography, as well as related systems, components and methods.

摘要翻译： 本公开涉及用于微光刻的照明光学系统，例如EUV-微光刻，以及相关系统，部件和方法。

公开(公告)号：US08629972B2

公开(公告)日：2014-01-14

申请号：US12884670

申请日：2010-09-17

申请人： Johannes Zellner ,  Hans-Juergen Mann ,  Martin Endres

发明人： Johannes Zellner ,  Hans-Juergen Mann ,  Martin Endres

IPC分类号： G02B5/10 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70316 ,  G02B17/0663 ,  G03F7/702 ,  G03F7/70233

摘要： A projection objective for microlithography is used for imaging an object field in an object plane into an image field in an image plane. The projection objective comprises at least six mirrors of which at least one mirror has a freeform reflecting surface. The ratio between an overall length (T) of the projection objective and an object image shift (dOIS) can be smaller than 12. The image plane is the first field plane of the projection objective downstream of the object plane. The projection objective can have a plurality of mirrors, wherein the ratio between an overall length (T) and an object image shift (dOIS) is smaller than 2.

摘要翻译： 用于微光刻的投影物镜用于将物平面中的物体场成像到图像平面中的图像场中。 投影物镜包括至少六个反射镜，其中至少一个反射镜具有自由形反射表面。 投影物镜的总长（T）与物体像偏移（dOIS）之间的比例可以小于12.像平面是物平面下游的投影物镜的第一场平面。 投影物镜可以具有多个反射镜，其中总长度（T）和物体图像偏移（dOIS）之间的比率小于2。

公开(公告)号：US08253925B2

公开(公告)日：2012-08-28

申请号：US12533513

申请日：2009-07-31

申请人： Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

发明人： Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

IPC分类号： G03B27/54

CPC分类号： G03F7/702 ,  G03F7/70075 ,  G03F7/70083

摘要： In general, in one aspect, the invention features a system that includes an illumination system of a microlithography tool, the illumination system including a first component having a plurality of elements. During operation of the system, the elements direct radiation from a source along an optical path to an arc-shaped object field at an object plane of a projection objective, and at least one of the elements has a curved shape that is different from the arc-shape of the object field.

摘要翻译： 通常，在一个方面，本发明的特征在于包括微光刻工具的照明系统的系统，所述照明系统包括具有多个元件的第一部件。 在系统操作期间，元件将来自光源的源的辐射直接引向投影物镜的物平面处的弧形物场，并且至少一个元件具有与弧不同的弯曲形状 对象字段的形状。

公开(公告)号：US20120147347A1

公开(公告)日：2012-06-14

申请号：US13326516

申请日：2011-12-15

申请人： Hans-Juergen Mann ,  Johannes Zellner ,  Aurelian Dodoc ,  Marco Pretorius ,  Christoph Menke ,  Wilhelm Ulrich ,  Martin Endres

发明人： Hans-Juergen Mann ,  Johannes Zellner ,  Aurelian Dodoc ,  Marco Pretorius ,  Christoph Menke ,  Wilhelm Ulrich ,  Martin Endres

IPC分类号： G03B27/54 ,  G02B17/06 ,  B01J19/12 ,  B82Y20/00

CPC分类号： G02B17/0663 ,  G02B27/0905 ,  G03F7/70233

摘要： An imaging optical system has a plurality of mirrors, which image an object field in an object plane into an image field in an image plane. A reflection face of at least one of the mirrors is configured as a free form face which cannot be described by a rotationally symmetrical function. The object field has an aspect ratio greater than 1. A ratio of a minimal and a maximal transverse dimension of the object field can be less than 0.9.

摘要翻译： 成像光学系统具有多个反射镜，其将物平面中的对象场成像到图像平面中的图像场。 至少一个反射镜的反射面构成为不能用旋转对称的功能描述的自由表面。 物体场的纵横比大于1.物体场的最小和最大横向尺寸的比可以小于0.9。

公开(公告)号：US08174677B2

公开(公告)日：2012-05-08

申请号：US12233914

申请日：2008-09-19

申请人： Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

发明人： Jens Ossmann ,  Martin Endres ,  Ralf Stuetzle

IPC分类号： G03B27/54 ,  G03B27/70 ,  G02B5/08

CPC分类号： G03F7/70083 ,  G03F7/70075

摘要： The disclosure provides an illumination optical system for microlithography that is designed so that, even with a change of illumination setting (e.g., a change in the given illumination conditions in the object field), variation of illumination parameters over the object field is confined within predetermined tolerances.

摘要翻译： 本公开提供了一种用于微光刻的照明光学系统，其被设计成使得即使随着照明设置的改变（例如，对象场中的给定照明条件的改变），在物场上的照明参数的变化被限制在预定的 公差。

公开(公告)号：US20110096317A1

公开(公告)日：2011-04-28

申请号：US12916882

申请日：2010-11-01

申请人： Ralf Stuetzle ,  Martin Endres ,  Jens Ossmann ,  Michael Layh

发明人： Ralf Stuetzle ,  Martin Endres ,  Jens Ossmann ,  Michael Layh

IPC分类号： G03B27/72 ,  G02B26/02 ,  G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70066 ,  G03F7/70083 ,  G03F7/70558

摘要： A component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus is disclosed. The component includes a plurality of diaphragms which are arranged alongside one another with respect to a direction perpendicular to the scan movement and which differ in their form and the position of which can be altered approximately in the scan direction so that a portion of the illumination energy can be vignetted by at least one diaphragm. The form of the individual diaphragm is specifically adapted to the form of the illumination in a diaphragm plane in which the component is arranged. This has the effect that at least parts of the delimiting edges of two diaphragms always differ in the case of an arbitrary displacement of the diaphragms.

摘要翻译： 公开了一种用于在微光刻投影曝光装置的物平面中设置扫描集成照明能量的部件。 该部件包括多个隔膜，它们相对于垂直于扫描移动的方向彼此并排布置，并且其形状不同，其位置可以在扫描方向上大致改变，使得照射能量的一部分 可以由至少一个隔膜取消。 单个隔膜的形式特别适用于其中布置有该部件的隔膜平面中的照明形式。 这具有以下效果：在隔膜的任意位移的情况下，两个隔膜的至少一部分限界边缘总是不同。

公开(公告)号：US20110001947A1

公开(公告)日：2011-01-06

申请号：US12848603

申请日：2010-08-02

申请人： Udo Dinger ,  Martin Endres ,  Armin Werber ,  Norbert Muehlberger ,  Florian Bach

发明人： Udo Dinger ,  Martin Endres ,  Armin Werber ,  Norbert Muehlberger ,  Florian Bach

IPC分类号： G03F7/20 ,  G02B7/185 ,  G03B27/54 ,  G03B27/70

CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/06 ,  G02B26/0816 ,  G02B26/0833 ,  G02B27/0927 ,  G03F7/70075 ,  G03F7/70116

摘要： A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.

摘要翻译： 在用于微光刻的投影曝光装置中，将使用小平面镜作为束引导光学部件。 小平面镜具有多个独立的反射镜。 对于入射照明光的单独偏转，分离的反射镜在每种情况下都以致动器的方式连接，使得它们可以围绕至少一个倾斜轴线单独倾斜。 连接到致动器的控制装置被配置成使得可以将分离的反射镜的给定分组分组成分离的反射镜组，每个反射镜组在每种情况下包括至少两个分离的反射镜。 其结果是，当安装在投影曝光装置中时，增加了用于设置由投影曝光装置照亮的对象场的各种照明几何形状的可变性的刻面镜。 描述了用于形成小平面反射镜的分立反射镜的各种实施例。

公开(公告)号：US20100253926A1

公开(公告)日：2010-10-07

申请号：US12789772

申请日：2010-05-28

申请人： Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann

发明人： Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann

IPC分类号： G03B27/54 ,  G03B27/32

CPC分类号： G03F7/702 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70191

摘要： An illumination optics for microlithography includes an optical assembly for guiding illumination light to an object field to be illuminated in an object plane. The illumination optics can divide an illumination light radiation bundle into a plurality of radiation sub-bundles which are assigned to different illumination angles of the object field illumination. The illumination optics is configured so that at least some of the radiation sub-bundles are superimposed in a superposition plane which is spaced from the object plane and which is not imaged into the object plane in which superposition takes place. This superposition is such that edges of the superimposed radiation sub-bundles coincide at least partially. In some embodiments, a field intensity setting device includes a plurality of adjacent individual diaphragms which at least attenuate illumination light when exposed thereon. These individual diaphragms are insertable into an illumination light radiation bundle in a direction parallel to an object displacement direction. All individual diaphragms of the field intensity setting device are insertable into the illumination light radiation bundle from one and the same side.

摘要翻译： 用于微光刻的照明光学器件包括用于将照明光引导到在物平面中被照明的物场的光学组件。 照明光学器件可以将照明光辐射束划分成被分配给物场照明的不同照明角度的多个辐射子束。 照明光学器件被配置为使得至少一些辐射子束被叠加在与物平面间隔开并且不被成像到发生叠加的物平面中的叠加平面中。 这种叠加使得叠加的辐射子束的边缘至少部分地重合。 在一些实施例中，场强度设置装置包括多个相邻的单独膜片，其在暴露于其上时至少衰减照明光。 这些单独的隔膜可以在与物体位移方向平行的方向上插入到照明光辐射束中。 场强设定装置的各个隔膜均可从同一侧插入照明光辐射束。

公开(公告)号：US20090316130A1

公开(公告)日：2009-12-24

申请号：US12535249

申请日：2009-08-04

申请人： Martin Endres ,  Jens Ossmann

发明人： Martin Endres ,  Jens Ossmann

IPC分类号： G03B27/54

CPC分类号： G02B17/0892 ,  G02B17/0804 ,  G02B17/082 ,  G02B17/0836 ,  G03F7/702

摘要： An illumination system is used to illuminate a specified illumination field of an object surface with EUV radiation. The illumination system has an EUV source and a collector to concentrate the EUV radiation in the direction of an optical axis. A first optical element is provided to generate secondary light sources, and a second optical element is provided at the location of these secondary light sources, the second optical element being part of an optical device which includes further optical elements, and which images the first optical element into an image plane into the illumination field. Between the collector and the illumination field, a maximum of five reflecting optical elements are arranged. These optical elements reflect the main beam either grazingly or steeply. The optical axis, projected onto an illumination main plane, is deflected by more than 30° between a source axis portion and a field axis portion. In a first variant of the illumination system, at least an axis portion between at least two of the reflecting optical elements is inclined relative to the illumination main plane. In a second variant of the illumination system, the optical device, in addition to the second optical element includes precisely three further optical elements, i.e. a third optical element, a fourth optical element and a fifth optical element. In this second variant, the optical axis meets the third, fourth and fifth optical elements at an angle of incidence which is greater than 70°. This construction variants make possible either an increase of the EUV throughput of the illumination system for a given size, or a reduction of the size of the illumination system and thus of the associated projection exposure system for a given EUV throughput.

摘要翻译： 照明系统用于用EUV辐射照射物体表面的指定照明场。 照明系统具有EUV源和收集器以将EUV辐射集中在光轴的方向上。 提供第一光学元件以产生二次光源，并且在这些次级光源的位置处提供第二光学元件，第二光学元件是包括另外的光学元件的光学器件的一部分，并且其将第一光学元件 元素进入图像平面进入照明场。 在收集器和照明场之间，最多设置五个反射光学元件。 这些光学元件既可以粗略地或者陡峭地反射主光束。 投射到照明主平面上的光轴在源轴部分和场轴部分之间偏转大于30°。 在照明系统的第一变型中，至少两个反射光学元件之间的至少一个轴部分相对于照明主平面倾斜。 在照明系统的第二变型中，除了第二光学元件之外，光学器件精确地包括三个另外的光学元件，即第三光学元件，第四光学元件和第五光学元件。 在该第二变型中，光轴以大于70°的入射角与第三，第四和第五光学元件相遇。 这种构造变型使给定尺寸的照明系统的EUV吞吐量增加，或者对于给定的EUV吞吐量，照明系统的大小以及相关联的投影曝光系统的减小成为可能。