Chemically amplified resist composition and pattern forming process
    21.
    发明授权
    Chemically amplified resist composition and pattern forming process 有权
    化学放大抗蚀剂组成和图案形成工艺

    公开(公告)号:US08288076B2

    公开(公告)日:2012-10-16

    申请号:US12789747

    申请日:2010-05-28

    IPC分类号: G03F7/004 G03F7/30

    摘要: A chemically amplified resist composition comprises a polymer comprising units having polarity to impart adhesion and acid labile units adapted to turn alkali soluble under the action of acid. The polymer comprises recurring units having formula (1) wherein R1 is H, F, CH3 or CF3, Rf is H, F, CF3 or CF2CF3, A is a divalent hydrocarbon group, R2, R3 and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl. Recurring units containing an aromatic ring structure are present in an amount ≧60 mol % and the recurring units having formula (1) are present in an amount

    摘要翻译: 化学放大抗蚀剂组合物包含含有极性赋予粘合性的单元的聚合物和适于在酸的作用下使碱溶性变成酸性不稳定单元。 聚合物包含具有式(1)的重复单元,其中R 1是H,F,CH 3或CF 3,R f是H,F,CF 3或CF 2 CF 3,A是二价烃基,R 2,R 3和R 4是烷基,烯基, 芳基,芳烷基或芳氧基烷基。 含有芳环结构的重复单元的存在量为≥60mol%,并且具有式(1)的重复单元以<5mol%的量存在。

    Deprotection method of protected polymer
    22.
    发明授权
    Deprotection method of protected polymer 有权
    保护聚合物的脱保护方法

    公开(公告)号:US08273830B2

    公开(公告)日:2012-09-25

    申请号:US12901903

    申请日:2010-10-11

    IPC分类号: C08F8/12 C08F120/16

    摘要: Provided is a method of deprotecting a protected polymer, the method being capable of, in the deprotection reaction of a polymer comprising a unit structure having a phenolic hydroxyl group protected with an acyl group, deacylating the polymer in a short period of time while maintaining the other structure, and being capable of taking out the deacylated polymer while highly suppressing contamination of the deacylated polymer with a substance other than the polymer taking part in the reaction. More specifically, provided is a method of deprotecting a protected polymer comprising at least a step of dissolving in an organic solvent the protected polymer comprising at least a unit structure having a phenolic hydroxyl group protected with an acyl group and a deprotecting reagent selected from primary or secondary amine compounds each having a ClogP value of 1.00 or less with the proviso that in the secondary amine compound, neither of the two carbon atoms coupled to the nitrogen atom of the amino group is tertiary. The primary or secondary amine compounds are each represented preferably by HNR12-nR2n (1).

    摘要翻译: 提供了一种使被保护的聚合物脱保护的方法,该方法能够在包含具有用酰基保护的酚羟基的单元结构的聚合物的脱保护反应中,在短时间内对聚合物进行脱酰,同时保持 并且能够取出脱酰基聚合物,同时高度抑制除了参与反应的聚合物以外的物质对脱酰基聚合物的污染。 更具体地说,提供一种使被保护的聚合物脱保护的方法,该方法至少包括在有机溶剂中溶解至少包含具有被酰基保护的酚羟基的单元结构的保护的聚合物和选自伯或仲基的去保护试剂 仲胺化合物各自具有1.00以下的ClogP值,条件是在仲胺化合物中,与氨基的氮原子偶联的两个碳原子都不是三级。 伯胺或仲胺化合物各自优选由HNR 12 -nR 2 n(1)表示。

    Chemically amplified positive resist composition and resist patterning process
    23.
    发明授权
    Chemically amplified positive resist composition and resist patterning process 有权
    化学扩增正性抗蚀剂组合物和抗蚀剂图案化工艺

    公开(公告)号:US08252518B2

    公开(公告)日:2012-08-28

    申请号:US12591540

    申请日:2009-11-23

    摘要: There is disclosed a chemically amplified positive resist composition to form a chemically amplified resist film to be used in a lithography, wherein the chemically amplified positive resist composition comprises at least, (A) a base resin, insoluble or poorly soluble in an alkaline solution, having a repeating unit whose phenolic ydroxyl group is protected by a tertiary alkyl group, while soluble in an alkaline solution when the tertiary alkyl group is removed; (B) an acid generator; (C) a basic component; and (D) an organic solvent, and a solid component concentration is controlled so that the chemically amplified resist film having the film thickness of 10 to 100 nm is obtained by a spin coating method. There can be provided, in a lithography, a chemically amplified positive resist composition giving a high resolution with a suppressed LER deterioration caused by film-thinning at the time of forming a chemically amplified resist film with the film thickness of 10 to 100 nm, and a resist patterning process using the same.

    摘要翻译: 公开了一种化学放大的正性抗蚀剂组合物,以形成用于光刻的化学放大的抗蚀剂膜,其中化学放大的正性抗蚀剂组合物至少包含(A)不溶于或难溶于碱性溶液的基础树脂, 具有酚羟基被叔烷基保护的重复单元,当叔烷基被除去时可溶于碱性溶液; (B)酸发生剂; (C)基本组成部分; 和(D)有机溶剂,并且通过旋涂法获得固体成分浓度,从而得到膜厚为10〜100nm的化学放大型抗蚀剂膜。 在平版印刷法中,可以提供化学放大的正性抗蚀剂组合物,其在形成具有10至100nm的膜厚度的化学放大型抗蚀剂膜时产生具有抑制的由薄膜变薄引起的LER劣化的高分辨率,以及 使用其的抗蚀剂图案化工艺。

    Rowing shoe
    24.
    发明授权
    Rowing shoe 失效
    赛艇鞋

    公开(公告)号:US08141274B2

    公开(公告)日:2012-03-27

    申请号:US12471549

    申请日:2009-05-26

    IPC分类号: A43B5/00

    摘要: A rowing shoe includes a shoe sole and a shoe upper portion. The shoe sole has a cleat mounting portion configured so that a cleat structure is mountable thereto for releasably attaching to a binding structure of a rowing boat. The shoe upper portion includes at least one fixing strap configured to secure the shoe upper portion to a wearer's foot. The fixing strap has a proximal end fixed to the shoe upper portion and a free end having at least one aperture configured so that a pull rope can extend therethrough.

    摘要翻译: 划船鞋包括鞋底和鞋上部。 鞋底具有防滑板安装部分,其构造成使得防滑板结构可安装到其上以可释放地附接到划船的装订结构。 鞋上部包括至少一个固定带,其构造成将鞋上部固定到穿着者的脚上。 固定带具有固定到鞋上部的近端和具有至少一个孔的自由端,使得拉绳能够延伸穿过其中。

    Temperature compensated spectroscope and optical apparatus
    25.
    发明授权
    Temperature compensated spectroscope and optical apparatus 有权
    温度补偿光谱仪和光学仪器

    公开(公告)号:US08125639B2

    公开(公告)日:2012-02-28

    申请号:US12592743

    申请日:2009-12-01

    IPC分类号: G01J3/28

    摘要: A spectroscope includes an emitting portion from where light is output, a dispersive element which is disposed on a side of the light emitting portion, to which the light is output, an incidence portion on which, light dispersed by the dispersive element is incident, and a temperature-compensating element which is disposed between the emitting portion and the incidence portion, and which is such that, an angle of incidence of the light dispersed on the incidence portion becomes almost constant with respect to a change in temperature in an operating temperature range. Moreover, the optical apparatus has such spectroscope in which temperature is compensated.

    摘要翻译: 分光器包括从其输出光的发射部分,布置在光发射部分的一侧的色散元件,光输出到该散射元件,由分散元件分散的光入射到该入射部分;以及 布置在发射部分和入射部分之间的温度补偿元件,并且使得散射在入射部分上的光的入射角相对于工作温度范围内的温度变化几乎恒定 。 此外,光学装置具有补偿温度的分光镜。

    IMAGE INFORMATION TRANSMISSION DEVICE, IMAGE INFORMATION TRANSMISSION METHOD AND COMPUTER READABLE MEDIUM
    27.
    发明申请
    IMAGE INFORMATION TRANSMISSION DEVICE, IMAGE INFORMATION TRANSMISSION METHOD AND COMPUTER READABLE MEDIUM 有权
    图像信息传输设备,图像信息传输方法和计算机可读介质

    公开(公告)号:US20110102831A1

    公开(公告)日:2011-05-05

    申请号:US12787733

    申请日:2010-05-26

    IPC分类号: G06F15/00

    摘要: An image information transmission device includes a registration unit, a storage unit, a determination unit, and an image information transmission unit. The registration unit registers an image information transmission instruction describing a destination number specifying a destination of image information and an abbreviated number corresponding to the destination number. The storage unit stores the destination number and transmission setting information used for transmitting the image information to the destination specified by the destination number. The determination unit determines whether or not the destination number described in the image information transmission instruction is contained in the destination number. The image information transmission unit transmits the image information.

    摘要翻译: 图像信息传输装置包括注册单元,存储单元,确定单元和图像信息传输单元。 注册单元注册描述指定图像信息的目的地的目的地号码和对应于目的地号码的缩写号码的图像信息传输指令。 存储单元将用于将图像信息发送到由目的地号码指定的目的地的目的地号码和发送设置信息存储。 确定单元确定图像信息发送指令中描述的目的地号码是否包含在目的地号码中。 图像信息发送单元发送图像信息。