Semiconductor device with spiral inductor and method for fabricating semiconductor integrated circuit device
    21.
    发明授权
    Semiconductor device with spiral inductor and method for fabricating semiconductor integrated circuit device 失效
    具有螺旋电感的半导体器件及半导体集成电路器件的制造方法

    公开(公告)号:US06730983B2

    公开(公告)日:2004-05-04

    申请号:US09960333

    申请日:2001-09-24

    申请人: Yoshihiro Minami

    发明人: Yoshihiro Minami

    IPC分类号: H01L2900

    摘要: A spiral inductor comprising: a substrate; a protruding portion which is formed on the top face of the substrate and the top of which serves as a dummy element for controlling a chemical mechanical polishing process; and a conductive layer which is formed on the substrate so as to have a spiral shape and which serves as an induction element, wherein the protruding portion is formed in a region other than a region directly below the conductive layer.

    摘要翻译: 一种螺旋电感器,包括:基板; 形成在所述基板的上表面上的突出部,其顶部作为用于控制化学机械研磨的哑元件; 以及导电层,其形成在所述基板上以具有螺旋形状并且用作感应元件,其中所述突出部分形成在除了所述导电层正下方的区域之外的区域中。

    Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus
    22.
    发明授权
    Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus 有权
    修整抛光垫的方法,抛光装置以及半导体装置的制造方法

    公开(公告)号:US06716087B2

    公开(公告)日:2004-04-06

    申请号:US09839240

    申请日:2001-04-23

    IPC分类号: B24B100

    CPC分类号: B24B53/017 B24B37/04

    摘要: A dresser is used which makes it possible to simultaneously dress and condition the surface of a polishing pad deteriorated by polishing a semiconductor wafer in the CMP process. The dresser is a dresser comprised of a ceramic such as dressing SiC, SiN, alumina or silica. Use of this dresser enables to shorten the time of dressing/conditioning the deteriorated polishing pad.

    摘要翻译: 使用修整器,其使得可以通过在CMP工艺中抛光半导体晶片来同时修整和调节抛光垫的表面劣化的表面。 修整器是由诸如修整SiC,SiN,氧化铝或二氧化硅的陶瓷组成的修整器。 使用这种修整器可以缩短修整/调理劣化的抛光垫的时间。