LATENT IMAGE CARRIER UNIT AND IMAGE FORMING APPARATUS
    21.
    发明申请
    LATENT IMAGE CARRIER UNIT AND IMAGE FORMING APPARATUS 有权
    专利图像传输单元和图像形成装置

    公开(公告)号:US20080219698A1

    公开(公告)日:2008-09-11

    申请号:US12042850

    申请日:2008-03-05

    IPC分类号: G03G15/02

    摘要: There is disclosed an image forming apparatus including: a latent image carrier; a latent image writing unit; a development unit; a latent image carrier unit having the latent image carrier; a first positioning protrusion disposed on the latent image carrier unit, the first positioning protrusion being engaged with a groove or a slit of an image forming apparatus body; an abutted portion disposed on the groove or the slit, the abutted portion abutting the first positioning protrusion in order to position the latent image carrier unit in an installation and removal direction; and a second positioning protrusion shifted in the installation and removal direction and disposed on the latent image carrier unit, the second positioning protrusion positioning the latent image carrier unit at a position different from a position of the first positioning protrusion in order to engage the groove or the slit.

    摘要翻译: 公开了一种图像形成装置,包括:潜像载体; 潜像书写单元; 开发单位 具有潜像载体的潜像载体单元; 设置在所述潜像载体单元上的第一定位突起,所述第一定位突起与图像形成装置主体的槽或狭缝接合; 所述抵接部分设置在所述槽或狭槽上,所述抵接部分抵靠所述第一定位突起以便将所述潜像承载单元定位在安装和移除方向上; 以及第二定位突起,其沿安装和移除方向移动并且设置在潜像载体单元上,所述第二定位突起将所述潜像载体单元定位在与所述第一定位突起的位置不同的位置,以便接合所述凹槽或 狭缝。

    Wide-angle lens system
    24.
    发明授权
    Wide-angle lens system 有权
    广角镜头系统

    公开(公告)号:US07411746B2

    公开(公告)日:2008-08-12

    申请号:US11677713

    申请日:2007-02-22

    IPC分类号: G02B15/14

    CPC分类号: G02B15/177 G02B9/04 G02B13/06

    摘要: A wide-angle lens system includes a negative front lens group and a positive rear lens group, in this order from the object.The negative front lens group includes a negative first sub-lens group and a positive second sub-lens group, in this order from the object.The positive rear lens group includes cemented lens elements having a positive lens element, a negative lens element and a positive lens element.The wide-angle lens system satisfies the following conditions: −0.8

    摘要翻译: 广角镜头系统从该物体起依次包括负前透镜组和正后透镜组。 负的前透镜组包括负的第一子透镜组和正的第二子透镜组,从该物体开始。 正后透镜组包括具有正透镜元件,负透镜元件和正透镜元件的胶合透镜元件。 广角镜头系统满足以下条件:<?in-line-formula description =“In-line formula”end =“lead”?> -0.8 <?in-line-formula description =“In-line Formulas”end =“lead”?> 0.7 其中fla表示负第一子透镜组的焦距; flb表示正的第二子透镜组的焦距; f表示整个广角镜头系统的焦距; fR表示正后透镜组的焦距。

    Arrangement of bending optical systems in a picture taking lens unit and an optical finder unit of a camera
    25.
    发明授权
    Arrangement of bending optical systems in a picture taking lens unit and an optical finder unit of a camera 有权
    摄影镜头单元中的弯曲光学系统和相机的光学取景器单元的布置

    公开(公告)号:US07391460B2

    公开(公告)日:2008-06-24

    申请号:US10292915

    申请日:2002-11-12

    IPC分类号: H04N5/225 H04N5/222 G03B13/08

    CPC分类号: H04N5/23293

    摘要: A camera according to the present invention includes a picture-taking lens unit including a picture-taking optical system having a bending optical system which optically bends incident light and an optical finder unit including a finder optical system having a bending optical system which optically bends incident light. A pre-bending optical system and a post-bending optical system in the bending optical system of the optical finder unit are arranged adjacent to a pre-bending optical system and a post-bending optical system in the bending optical system of the picture-taking lens unit, respectively. The body of the camera is therefore decreased in size.

    摘要翻译: 根据本发明的照相机包括摄影镜头单元,其包括具有光学弯曲入射光的弯曲光学系统的摄像光学系统和包括具有弯曲光学系统的取景器光学系统的光学取景器单元,所述弯曲光学系统光学弯曲入射 光。 在光学取景器单元的弯曲光学系统中的预弯曲光学系统和后弯曲光学系统被布置在与图像的弯曲光学系统中的预弯曲光学系统和后弯曲光学系统相邻 镜头单元。 因此,相机的主体尺寸减小。

    Silicon wafer for IGBT and method for producing same
    26.
    发明授权
    Silicon wafer for IGBT and method for producing same 有权
    IGBT硅晶片及其制造方法

    公开(公告)号:US07344689B2

    公开(公告)日:2008-03-18

    申请号:US11449498

    申请日:2006-06-07

    IPC分类号: C01B33/26 C30B15/20

    摘要: A silicon wafer for an IGBT is produced by forming an ingot having an interstitial oxygen concentration [Oi] of not more than 7.0×1017 atoms/cm3 by the Czochralski method; doping phosphorus in the ingot by neutron beam irradiation to the ingot; slicing a wafer from the ingot; performing annealing of the wafer in an oxidizing atmosphere containing at least oxygen at a temperature satisfying a predetermined formula; and forming a polysilicon layer or a strained layer on one side of the wafer.

    摘要翻译: 用Czochralski法通过形成具有不大于7.0×10 17原子/ cm 3的间隙氧浓度∞的晶锭来制造用于IGBT的硅晶片; 通过中子束照射锭来在锭中掺杂磷; 从锭切片晶片; 在满足预定公式的温度下,在至少含有氧的氧化气氛中进行晶片退火; 以及在晶片的一侧上形成多晶硅层或应变层。

    Driving assisting apparatus for vehicles
    29.
    发明授权
    Driving assisting apparatus for vehicles 失效
    车辆驾驶辅助装置

    公开(公告)号:US07126461B2

    公开(公告)日:2006-10-24

    申请号:US10972476

    申请日:2004-10-26

    IPC分类号: B60Q1/00

    摘要: A pair of distance measurement sensors provided at different heights measures distances to an obstruction. When the measured distances are shorter than a threshold distance, the height of the vehicle is found based on the measured distances. When the height of the vehicle is found greater than a threshold height, the existence of the obstruction is reported to the driver. When the height of the vehicle is found smaller than the threshold height, on the other hand, a change in obstruction height is found and compared with a threshold. When the change in obstruction height is greater than the threshold, the existence of the obstruction is reported to the driver since the height is determined to be an unreliable result of computation.

    摘要翻译: 在不同高度处提供的一对距离测量传感器测量到障碍物的距离。 当测量的距离小于阈值距离时,基于所测量的距离找到车辆的高度。 当发现车辆的高度大于阈值高度时,向驾驶员报告障碍物的存在。 另一方面,当发现车辆的高度小于阈值高度时,发现障碍物高度的变化并与阈值进行比较。 当阻塞高度的变化大于阈值时,障碍物的存在被报告给驾驶员,因为高度被确定为不可靠的计算结果。

    Method of manufacturing a semiconductor integrated circuit device which prevents foreign particles from being drawn into a semiconductor container containing semiconductor wafers
    30.
    发明授权
    Method of manufacturing a semiconductor integrated circuit device which prevents foreign particles from being drawn into a semiconductor container containing semiconductor wafers 有权
    制造半导体集成电路装置的方法,该装置防止外来颗粒被吸入含有半导体晶片的半导体容器中

    公开(公告)号:US07048493B2

    公开(公告)日:2006-05-23

    申请号:US10974819

    申请日:2004-10-28

    IPC分类号: H01L21/69

    摘要: When a conventional semiconductor container opening/closing apparatus opens a lid of a semiconductor container, foreign particles enter into the container from outside through a gap between the container and a wall surface of the container opening/closing apparatus and adhere to a wafer in the container. A method is provided to reduce the number of foreign particles adhering to the wafer by preventing foreign particles from entering into the container at the time of opening the container by the opening/closing apparatus. To achieve this, a velocity-differential pressure ratio obtained by dividing the maximum velocity at the time of opening the lid of the container in a vertical direction to an opening of the container, by the differential pressure between the inside pressure and the outside pressure of said semiconductor manufacturing apparatus, is set to be 0.06 ((m/s) Pa) or less.

    摘要翻译: 当传统的半导体容器打开/关闭装置打开半导体容器的盖子时,异物通过容器和容器打开/关闭装置的壁表面之间的间隙从外部进入容器,并且粘附到容器中的晶片 。 提供了一种方法,用于通过打开/关闭装置打开容器时防止异物进入容器,从而减少附着在晶片上的异物的数量。 为了实现这一点,通过将容器的盖子在垂直方向上打开容器的最大速度与容器的开口之间的内压和外部压力之间的压差相除来获得的速度差压比 所述半导体制造装置设定为0.06((m / s)Pa)以下。