Method for making a photomask assembly incorporating a porous frame
    21.
    发明申请
    Method for making a photomask assembly incorporating a porous frame 失效
    制造包含多孔框架的光掩模组件的方法

    公开(公告)号:US20060141371A1

    公开(公告)日:2006-06-29

    申请号:US11340384

    申请日:2006-01-25

    IPC分类号: A47G1/12 G03F1/14 G03F1/00

    CPC分类号: G03F1/64 C03B19/12 Y02P40/57

    摘要: A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reasonable processing time period, thereby removing any harmful chemicals that might be present. The frame preferably is made by a method that includes preparing a gel by a sol-gel process, drying the gel, and partially densifying the dry gel. The resulting frame has a gas permeability to oxygen or nitrogen higher than about 10 ml.mm/cm2.min.MPa, an average pore size between 0.001 micrometer and 10 micrometers, and a coefficient of thermal expansion between 0.01 ppm/° C. and 10 ppm/° C.

    摘要翻译: 描述了一种光掩模组件,其具有用于在光掩模基板上方支撑透明防护薄膜的框架,限定覆盖基板的封闭的薄膜空间。 框架由多孔材料形成,其被配置为允许防护薄膜空间在合理的处理时间段内用惰性气体吹扫,从而去除可能存在的任何有害化学物质。 框架优选通过包括通过溶胶 - 凝胶法制备凝胶,干燥凝胶并部分致密化干凝胶的方法制备。 所得到的框架对氧气或氮气的气体渗透性高于约10毫升/厘米3·秒/秒/秒·秒·分钟·MPa,平均孔径在0.001微米至10微米之间,并且热膨胀系数 在0.01ppm /℃和10ppm /℃之间。

    System for mitigating marine bio-fouling of an underwater structure
    25.
    发明授权
    System for mitigating marine bio-fouling of an underwater structure 有权
    减轻水下结构海洋生物污染的系统

    公开(公告)号:US08356959B2

    公开(公告)日:2013-01-22

    申请号:US12572010

    申请日:2009-10-01

    IPC分类号: B63B59/00

    CPC分类号: B63B59/00 Y02T70/121

    摘要: A biomimetic system for mitigating marine bio-fouling is disclosed which is based upon the sacrificial skin mechanism found in the pilot whale species. The anti-bio-fouling system is characterized by the continuous in-situ underwater formation of a conformal protective skin around a submerged object or structure and employs a circulatory system embedded in a diffuser layer conformably fitted and secured to the structure to controllably deliver a sacrificial skin-forming material to the structural surface. The system advantageously utilizes the unique chemical properties of the skin-forming material to alter the material's viscosity in response to contact with sea water such that the material is uniformly distributed over the structure surface by a self-diffusion process, notwithstanding structural configuration or gravitational orientation, thus forming a stabilized waterproof layer or sacrificial skin. The sacrificial skin controllably self-dissolves and is shed in response to continuous contact with sea water, thereby carrying away the marine bio-fouling material.

    摘要翻译: 公开了一种减轻海洋生物污染的仿生系统,其基于在飞行员鲸鱼物种中发现的牺牲皮肤机制。 防生物污染系统的特征在于在水下物体或结构周围连续原位水下形成保形皮肤,并采用嵌入扩散层中的循环系统,该扩散层适配并固定到结构上以可控地传送牺牲物 成皮材料到结构表面。 该系统有利地利用皮肤形成材料的独特化学性质来响应于与海水接触而改变材料的粘度,使得材料通过自扩散方法均匀地分布在结构表面上,尽管结构构型或重力取向 ,从而形成稳定的防水层或牺牲性皮肤。 牺牲皮肤可控地自我溶解并且响应于与海水的持续接触而脱落,从而携带海洋生物污损物质。

    Photomask assembly incorporating a porous frame
    27.
    发明授权
    Photomask assembly incorporating a porous frame 失效
    包含多孔框架的光掩模组合

    公开(公告)号:US07014961B2

    公开(公告)日:2006-03-21

    申请号:US10646356

    申请日:2003-08-22

    IPC分类号: G03F1/14 G03B27/62

    CPC分类号: G03F1/64 C03B19/12 Y02P40/57

    摘要: A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reasonable processing time period, thereby removing any harmful chemicals that might be present. The frame preferably is made by a method that includes preparing a gel by a sol-gel process, drying the gel, and partially densifying the dry gel. The resulting frame has a gas permeability to oxygen or nitrogen higher than about 10 ml.mm/cm2.min.MPa, an average pore size between 0.001 micrometer and 10 micrometers, and a coefficient of thermal expansion between 0.01 ppm/° C. and 10 ppm/° C.

    摘要翻译: 描述了一种光掩模组件,其具有用于在光掩模基板上方支撑透明防护薄膜的框架,限定覆盖基板的封闭的薄膜空间。 框架由多孔材料形成,其被配置为允许防护薄膜空间在合理的处理时间段内用惰性气体吹扫,从而去除可能存在的任何有害化学物质。 框架优选通过包括通过溶胶 - 凝胶法制备凝胶,干燥凝胶并部分致密化干凝胶的方法制备。 所得到的框架对氧气或氮气的气体渗透性高于约10毫升/厘米3·秒/秒/秒·秒·分钟·MPa,平均孔径在0.001微米至10微米之间,并且热膨胀系数 在0.01ppm /℃和10ppm /℃之间。