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    ROBOT CLEANER AND CONTROL METHOD THEREOF
    21.
    发明申请
    ROBOT CLEANER AND CONTROL METHOD THEREOF 审中-公开
    机器清洁器及其控制方法

    公开(公告)号：US20140209122A1

    公开(公告)日：2014-07-31

    申请号：US14166166

    申请日：2014-01-28

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Jae Young Jung ,  Sahng Jin Lee ,  Hyun Soo Jung ,  Dong Won Kim ,  Dong Hoon Lee

    IPC: A47L11/24

    CPC classification number: A47L11/24 ,  A47L11/4002 ,  A47L11/4011 ,  A47L11/4041 ,  A47L11/4088 ,  A47L2201/00

    Abstract: A robot cleaner may include a main body; a traveling assembly moving the main body; a cleaning tool assembly installed in the lower part of the main body, and contacting a floor to clean the floor; a water-feeding unit supplying water to the cleaning tool assembly; and a capacitance measurer contacting the cleaning tool assembly, and measuring capacitance of the cleaning tool assembly in order to calculate an amount of water of the cleaning tool assembly. Accordingly, by measuring an amount of water of a cleaning tool installed in a robot cleaner based on capacitance, it is possible to accurately measure an amount of water absorbed in a cleaning tool.

    Abstract translation: 机器人清洁器可以包括主体; 移动主体的旅行组件; 安装在主体的下部的清洁工具组件，并且接触地板以清洁地板; 给清洁工具组件供水的给水单元; 以及接触清洁工具组件的电容测量器，以及测量清洁工具组件的电容，以便计算清洁工具组件的水量。 因此，通过基于电容来测量安装在机器人清洁器中的清洁工具的水量，可以精确地测量清洁工具中吸收的水量。

    OBSTACLE SENSING MODULE AND CLEANING ROBOT INCLUDING THE SAME CROSS-REFERENCE TO RELATED APPLICATION
    22.
    发明申请
    OBSTACLE SENSING MODULE AND CLEANING ROBOT INCLUDING THE SAME CROSS-REFERENCE TO RELATED APPLICATION 有权
    异常感测模块及其清洁机器人相关申请的交叉引用

    公开(公告)号：US20130331990A1

    公开(公告)日：2013-12-12

    申请号：US13911525

    申请日：2013-06-06

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Yeon Kyu Jeong ,  Dong Won Kim ,  Jea Yun So ,  Sang Sik Yoon ,  Gwang Jin Jung ,  Joon Hyung Kwon

    IPC: G05D1/02 ,  G02B5/02

    CPC classification number: G05D1/0231 ,  A47L11/4061 ,  A47L2201/04 ,  G01S7/4802 ,  G01S7/4811 ,  G01S17/46 ,  G01S17/936 ,  G02B5/02 ,  G02B9/04 ,  G05D1/0238 ,  G05D2201/0203

    Abstract: Disclosed herein are an obstacle sensing module and a cleaning robot including the same. The cleaning robot includes a body, a driver to drive the body, an obstacle sensing module to sense an obstacle present around the body, and a control unit to control the driver, based on sensed results of the obstacle sensing module. The obstacle sensing module includes at least one light emitter including a light source, and a wide-angle lens to refract or reflect light from the light source so as to diffuse the incident light in the form of planar light, and a light receiver including a reflection mirror to again reflect reflection light reflected by the obstacle so as to generate reflection light, an optical lens spaced from the reflection mirror by a predetermined distance, to allow the reflection light to pass through the optical lens, and an image sensor, and an image processing circuit.

    Abstract translation: 这里公开了一种障碍物检测模块和包括该障碍物的清洁机器人。 清洁机器人包括主体，用于驱动身体的驾驶员，用于感测身体周围的障碍物的障碍物感测模块，以及基于障碍物感测模块的感测结果来控制驾驶员的控制单元。 障碍物检测模块包括至少一个包括光源的光发射器和用于折射或反射来自光源的光以便将入射光以平面光的形式扩散的广角镜头，以及包括 反射镜，以再次反射由障碍物反射的反射光，以产生反射光，与反射镜间隔预定距离的光学透镜，以允许反射光通过光学透镜，以及图像传感器，以及 图像处理电路。

    Semiconductor devices
    23.
    发明授权
    Semiconductor devices 有权

    公开(公告)号：US11769813B2

    公开(公告)日：2023-09-26

    申请号：US18046518

    申请日：2022-10-14

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Myung Gil Kang ,  Dong Won Kim ,  Woo Seok Park ,  Keun Hwi Cho ,  Sung Gi Hur

    IPC: H01L29/423 ,  H01L27/092 ,  H01L29/06 ,  H01L29/786

    CPC classification number: H01L29/42392 ,  H01L27/092 ,  H01L29/0665 ,  H01L29/4236 ,  H01L29/78696

    Abstract: Semiconductor devices include a first active pattern including a first lower pattern extending in a first direction and a first sheet pattern spaced apart from the first lower pattern; and a first gate electrode on the first lower pattern, the first gate electrode extending in a second direction different from the first direction and surrounding the first sheet pattern, wherein the first lower pattern includes a first sidewall and a second sidewall opposite to each other, each of the first sidewall of the first lower pattern and the second sidewall of the first lower pattern extends in the first direction, the first gate electrode overlaps the first sidewall of the first lower pattern in the second direction by a first depth, the first gate electrode overlaps the second sidewall of the first lower pattern in the second direction by a second depth, and the first depth is different from the second depth.

    Semiconductor devices
    24.
    发明授权
    Semiconductor devices 有权

    公开(公告)号：US11482606B2

    公开(公告)日：2022-10-25

    申请号：US17209290

    申请日：2021-03-23

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Myung Gil Kang ,  Dong Won Kim ,  Woo Seok Park ,  Keun Hwi Cho ,  Sung Gi Hur

    IPC: H01L29/423 ,  H01L27/092 ,  H01L29/786 ,  H01L29/06

    Abstract: Semiconductor devices include a first active pattern including a first lower pattern extending in a first direction and a first sheet pattern spaced apart from the first lower pattern; and a first gate electrode on the first lower pattern, the first gate electrode extending in a second direction different from the first direction and surrounding the first sheet pattern, wherein the first lower pattern includes a first sidewall and a second sidewall opposite to each other, each of the first sidewall of the first lower pattern and the second sidewall of the first lower pattern extends in the first direction, the first gate electrode overlaps the first sidewall of the first lower pattern in the second direction by a first depth, the first gate electrode overlaps the second sidewall of the first lower pattern in the second direction by a second depth, and the first depth is different from the second depth.

    Robot cleaner and control method thereof
    25.
    发明授权
    Robot cleaner and control method thereof 有权

    公开(公告)号：US10945578B2

    公开(公告)日：2021-03-16

    申请号：US14305565

    申请日：2014-06-16

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Jae Young Jung ,  Byoung In Lee ,  Sang Hwa Choi ,  Dong Won Kim ,  Sang Sik Yoon ,  Sahng Jin Lee

    IPC: A47L11/40 ,  A47L11/282

    Abstract: A robot cleaner and a control method thereof may judge whether or not water is received in the robot cleaner performing wet cleaning. The robot cleaner includes a main body, moving units, a cleaning unit mounted on the main body and contacting a floor surface to perform cleaning, a water supply unit supplying water to the cleaning unit, and a sensing unit provided on at least a portion of the water supply unit to sense whether or not there is water within the water supply unit. The sensing unit includes a housing, a transmission part radiating electromagnetic waves, a reception part receiving the electromagnetic waves radiated by the transmission part, and a stepped part provided on at least a portion of the housing along a moving path of the electromagnetic waves radiated by the transmission part and received by the reception part.

    Semiconductor device including a multigate transistor formed with fin structure
    26.
    发明授权
    Semiconductor device including a multigate transistor formed with fin structure 有权

    公开(公告)号：US10923472B2

    公开(公告)日：2021-02-16

    申请号：US16574887

    申请日：2019-09-18

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Sung Min Kim ,  Dong Won Kim ,  Geum Jong Bae

    IPC: H01L27/088 ,  H01L27/02 ,  H01L21/8234 ,  H01L21/308 ,  H01L21/02 ,  H01L29/66

    Abstract: A semiconductor device is provided. The semiconductor device includes a substrate, a plurality of fins comprising a first fin, a second fin, a third fin, a fourth fin and a fifth fin, each of the plurality of protruding from the substrate in a first direction, and spaced apart from one another in a second direction that intersects the first direction and a plurality of trenches comprising a first trench, a second trench, a third trench and a fourth trench, each of the plurality of trenches being formed between adjacent fins of the plurality of fins, wherein variation of a first width of the first trench and a third width of the third trench is smaller than a first variation, wherein variation of a second width of the second trench and a fourth width of the fourth trench is smaller than a second variation, and wherein the second variation is greater than the first variation.

    Method of manufacturing semiconductor device and semiconductor device by the same
    27.
    发明授权
    Method of manufacturing semiconductor device and semiconductor device by the same 有权

    公开(公告)号：US10522364B2

    公开(公告)日：2019-12-31

    申请号：US16051683

    申请日：2018-08-01

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Sung Min Kim ,  Dong Won Kim

    IPC: H01L21/308 ,  H01L21/8234 ,  H01L29/66 ,  H01L29/78 ,  H01L27/088

    Abstract: A method including forming hard mask patterns on a substrate; forming etch stop patterns surrounding the hard mask patterns; forming spacer patterns covering sidewalls of the etch stop patterns; removing the etch stop patterns; etching the substrate to form active and dummy fins; forming a block mask pattern layer surrounding the active and dummy fins and forming mask etch patterns on a top surface of the block mask pattern layer; etching the block mask pattern layer to form block mask patterns surrounding the active fins; etching the dummy fins; removing the block mask patterns surrounding the active fins; and depositing a device isolation film on the substrate such that the device isolation film is not in contact with the upper portions of the active fins, wherein a spacing distance between the active fin and the dummy fin is greater than an active fin spacing distance between the active fins.

    WASHING MACHINE
    28.
    发明申请
    WASHING MACHINE 审中-公开

    公开(公告)号：US20180044837A1

    公开(公告)日：2018-02-15

    申请号：US15118471

    申请日：2015-02-11

    Applicant: Samsung Electronics Co., Ltd

    Inventor： Dong Won Kim ,  Jin Doo Kim ,  Yeong Man Kim ,  Seung Youp Lee

    IPC: D06F37/26 ,  D06F23/02

    CPC classification number: D06F37/26 ,  D06F23/02 ,  D06F39/12

    Abstract: Provided is a washing machine including: a cabinet including a plurality of side frames, a back frame, a top frame and a bottom frame; a front frame that is disposed in front of the cabinet and includes an internal laundry port through which laundry is put into a rotating tub, and a front cover that is disposed in front of the front frame, extends from the top frame to the bottom frame, includes an external laundry port corresponding to the internal laundry port and is integrally formed. Thus, no line is formed in a front side of the washing machine so that the exterior of the washing machine can be enhanced.

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