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公开(公告)号：US20160054498A1
公开(公告)日：2016-02-25
申请号：US14733234
申请日：2015-06-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jaeseung Chung , Dongouk Kim , Joonyong Park , Jihyun Bae , Bongsu Shin , Sunghoon Lee , Sukgyu Hahm , Jong G. Ok , Ilsun Yoon
CPC classification number: G02B5/3058 , B29D11/00644 , B29K2101/10 , G03F7/0002
Abstract: A pattern structure includes a plurality of pattern structure units arranged substantially on a same plane, where each of the pattern structure units has a first surface and a second surface, which are opposite to each other, and a microstructure is defined on the first surface of each of the pattern structure units, and a flattening layer disposed on the second surface of each of the plurality of pattern structure units, where the flattening layer connects the pattern structure units with each other, and a vertical step difference exists between second surfaces of the pattern structure units.
Abstract translation: 图案结构包括基本上在同一平面上布置的多个图案结构单元，其中每个图案结构单元具有彼此相对的第一表面和第二表面，并且在第一表面上限定微结构 每个图案结构单元和布置在多个图案结构单元的每个的第二表面上的平坦化层，其中平坦化层将图案结构单元彼此连接，并且在第二表面之间存在垂直的阶差 图案结构单位。
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公开(公告)号：US10539734B2
公开(公告)日：2020-01-21
申请号：US15418119
申请日：2017-01-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Dongsik Shim , Dongouk Kim , Hyunjoon Kim , Joonyong Park , Jihyun Bae , Bongsu Shin , Sunghoon Lee , Jaeseung Chung
IPC: F21V8/00
Abstract: A directional backlight unit is provided, including a light guide plate, a light source, and a grating that is formed on a light-emitting surface of the light guide plate. The grating is configured such that an intensity of one ray of light, of the light irradiated by the light source and diffracted and emitted by the grating, is greater than a sum of intensities of all other rays of light, of the light irradiated by the light source and diffracted and emitted by the grating.
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23.发明授权公开(公告)号：US10317693B2
公开(公告)日：2019-06-11
申请号：US15434364
申请日：2017-02-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sunghoon Lee , Joonyong Park , Bongsu Shin , Dongouk Kim , Jihyun Bae , Dongsik Shim , Jaeseung Chung
Abstract: A directional backlight unit includes: a light source configured to emit light; a light guide plate including: an incident surface on which light emitted by the light source is incident, an emission surface from which the light incident on the incident surface is emitted, and a reflective surface facing the emission surface; a reflective polarizer provided on the emission surface and configured to transmit a portion of the light as first polarized light having a first polarization direction and reflect another portion of the light as second polarized light having a second polarization direction and being perpendicular to the first polarized light; and a diffractor configured to diffract the first polarized light transmitted through the reflective polarizer toward a plurality of viewing zones.
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24.发明授权公开(公告)号：US10228506B2
公开(公告)日：2019-03-12
申请号：US15171523
申请日：2016-06-02
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaeseung Chung , Sunghoon Lee , Jihyun Bae , Joonyong Park , Hoon Song , Hongseok Lee , Dongouk Kim , Hyunjoon Kim , Bongsu Shin , Dongsik Shim , Seogwoo Hong
Abstract: A directional backlight and a 3D image display apparatus including the directional backlight are provided. The directional backlight includes a light guide plate guiding light emitted from a light source; a diffractive device configured to adjust the direction of light exiting the light guide plate; and an aperture adjusting layer including a plurality of apertures. The aperture adjusting layer may adjust the optical output efficiency of the diffractive device.
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公开(公告)号：US10180530B2
公开(公告)日：2019-01-15
申请号：US15236604
申请日：2016-08-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Bongsu Shin , Joonyong Park , Hyunjoon Kim , Dongouk Kim , Jihyun Bae , Dongsik Shim , Sunghoon Lee , Jaeseung Chung , Seogwoo Hong
IPC: G02B27/22 , F21V8/00 , G02F1/1335
Abstract: A directional backlight unit and a three-dimensional image display apparatus including the directional backlight unit are provided. The directional backlight unit includes a light source, a light guide plate guiding light emitted from the light source, and a diffraction device including a plurality of sections. Each of the sections includes a grating pattern set configured to adjust the direction of light incident from the light guide plate.
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Patent Agency Ranking
26.发明申请公开(公告)号：US20180081190A1
公开(公告)日：2018-03-22
申请号：US15434364
申请日：2017-02-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sunghoon Lee , Joonyong Park , Bongsu Shin , Dongouk Kim , Jihyun Bae , Dongsik Shim , Jaeseung Chung
IPC: G02B27/26 , F21V8/00 , G02F1/1335
CPC classification number: G02B27/26 , G02B5/1819 , G02B5/1842 , G02B5/3058 , G02B6/005 , G02B6/0056 , G02B6/0065 , G02B27/225 , G02F1/133528 , G02F1/133615 , G02F2001/133548 , H04N13/31 , H04N2213/001
Abstract: A directional backlight unit includes: a light source configured to emit light; a light guide plate including: an incident surface on which light emitted by the light source is incident, an emission surface from which the light incident on the incident surface is emitted, and a reflective surface facing the emission surface; a reflective polarizer provided on the emission surface and configured to transmit a portion of the light as first polarized light having a first polarization direction and reflect another portion of the light as second polarized light having a second polarization direction and being perpendicular to the first polarized light; and a diffractor configured to diffract the first polarized light transmitted through the reflective polarizer toward a plurality of viewing zones.
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公开(公告)号：US09855703B2
公开(公告)日：2018-01-02
申请号：US14724898
申请日：2015-05-29
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghoon Lee , Dongouk Kim , Joonyong Park , Jihyun Bae , Bongsu Shin , Jaeseung Chung , Sukgyu Hahm , Jong G. Ok , Ilsun Yoon
CPC classification number: B29C59/16 , B29C59/165 , B29C67/00 , B29C2045/0075 , G03F7/0002
Abstract: A method of forming a pattern by using an imprint process includes: forming an adhesion promoting layer only in a pattern formation region on a substrate; coating a resin to cover the substrate and the adhesion promoting layer; transferring a pattern of a stamp mold to the resin covering the substrate and the adhesion promoting layer, by pressing the stamp mold onto the resin; irradiating ultraviolet light onto the resin covering the substrate and the adhesion promoting layer, to cure the resin and form a pattern of the cured resin to correspond to the pattern of the stamp mold, on the substrate; and detaching the stamp mold from the substrate, to leave a portion of the cured resin pattern only on the adhesion promoting layer on the substrate and to remove a remaining portion of the cured resin pattern from the substrate.
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28.发明授权公开(公告)号：US09658484B2
公开(公告)日：2017-05-23
申请号：US14817496
申请日：2015-08-04
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghoon Lee , Dongouk Kim , Joonyong Park , Jihyun Bae , Bongsu Shin , Jong G. Ok , Ilsun Yoon , Jaeseung Chung , Sukgyu Hahm
IPC: G02F1/1335 , G02B5/30 , G03F7/00 , G02F1/1333
CPC classification number: G02F1/133528 , G02B5/3058 , G02F1/13336 , G02F2001/133548 , G03F7/0002
Abstract: A pattern structure includes a plurality of pattern structure units arranged on a same plane, where each of the plurality of pattern structure units includes a plurality of microstructures defined on a surface thereof and having a width of less than about 1 micrometer (μm); and a connection layer disposed between the plurality of pattern structure units and having a width of less than about 10 μm, where the connection layer connects the plurality of pattern structure units to each other.
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公开(公告)号：US09434093B2
公开(公告)日：2016-09-06
申请号：US14557712
申请日：2014-12-02
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sukgyu Hahm , Dongouk Kim , Joonyong Park , Jihyun Bae , Bongsu Shin , Sunghoon Lee , Hongseok Lee , Jaeseung Chung
IPC: B29C33/38 , G03F7/00 , B29K101/10 , B29L31/00 , B29C33/42
CPC classification number: B29C33/3878 , B29C33/424 , B29C2033/426 , B29K2101/10 , B29L2031/757 , G03F7/00 , G03F7/0002
Abstract: A method of manufacturing a master mold includes forming a plurality of replica resin layers using a mold; forming a replica template by bonding the plurality of replica resin layers on a template; forming a replica mold layer having a pattern corresponding to a pattern of the plurality of replica resin layers using the replica template; forming a flexible stamp having a pattern formed on a surface thereof using the replica mold layer; transferring the pattern formed on the surface of the flexible stamp to a mold resin; and forming a large area master mold by etching a surface of a substrate based on a pattern shape of the mold resin.
Abstract translation: 制造母模的方法包括使用模具形成多个复制树脂层; 通过将多个复制树脂层粘合在模板上来形成复制模板; 使用复制模板形成具有与多个复制树脂层的图案对应的图案的复制模具层; 使用复制模具层形成具有在其表面上形成的图案的柔性印模; 将形成在柔性印模的表面上的图案转印到模制树脂上; 并且通过基于模制树脂的图案形状蚀刻基板的表面来形成大面积的母模。
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30.发明申请PATTERNING METHOD USING IMPRINT MOLD, PATTERN STRUCTURE FABRICATED BY THE METHOD, AND IMPRINTING SYSTEM 有权使用印花模型的方法，通过方法制作的图案结构和印刷系统公开(公告)号：US20150321415A1
公开(公告)日：2015-11-12
申请号：US14633272
申请日：2015-02-27
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghoon Lee , Dongouk Kim , Joonyong Park , Jihyun Bae , Bongsu Shin , Hongseok Lee , Jaeseung Chung , Sukgyu Hahm
CPC classification number: B29C59/026 , B29K2025/06 , B29K2033/12 , G02B1/12 , G02B5/3058 , G02B5/3066 , G02B2207/101 , G03F7/0002 , Y10T428/2457
Abstract: A patterning method using an imprint mold, to form an imprinted pattern structure, includes providing a resist layer from which the pattern structure will be formed, performing a first imprint process on a first area of the resist layer by using the imprint mold to form a first pattern of the pattern structure through deformation of the resist layer in the first area, and performing a second imprint process on a second area of the resist layer by using the imprint mold to form a second pattern of the pattern structure through deformation of the resist layer in the second area. The first and second areas are overlapped with each other in a third area of the resist layer, and the performing the second imprint process deforms a first portion of the first pattern in the third area to form the second pattern
Abstract translation: 使用压印模具形成压印图案结构的图案化方法包括提供抗蚀剂层，从其形成图案结构，通过使用压印模具在抗蚀剂层的第一区域上进行第一压印处理，以形成 通过使第一区域中的抗蚀剂层变形而形成图案结构的第一图案，并且通过使用压印模具在抗蚀剂层的第二区域上进行第二压印处理，以通过抗蚀剂的变形形成图案结构的第二图案 在第二个区域。 第一和第二区域在抗蚀剂层的第三区域中彼此重叠，并且执行第二压印处理使第三区域中的第一图案的第一部分变形以形成第二图案
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