公开(公告)号：US10256237B2

公开(公告)日：2019-04-09

申请号：US15656377

申请日：2017-07-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jung-han Lee ,  Sun-ghil Lee ,  Myung-il Kang ,  Jeong-yun Lee ,  Seung-hun Lee ,  Hyun-jung Lee ,  Sun-wook Kim

IPC: H01L27/088 ,  H01L27/11 ,  H01L29/06

Abstract: An integrated circuit (IC) device includes a first and a second fin-type active region protruding from a first region and a second region, respectively, of a substrate, a first and a second gate line, and a first and a second source/drain region. The first fin-type active region has a first top surface and a first recess has a first depth from the first top surface. The first source/drain region fills the first recess and has a first width. The second fin-type active region has a second top surface and a second recess has a second depth from the second top surface. The second depth is greater than the first depth. The second source/drain region fills the second recess and has a second width. The second width is greater than the first width.

公开(公告)号：US10196738B2

公开(公告)日：2019-02-05

申请号：US15407129

申请日：2017-01-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chang-yun Lee ,  Ju-hyun Lee ,  Kee-soo Park ,  Kyu-hee Han ,  Seung-hun Lee ,  Byung-chul Jeon

IPC: C23C14/58 ,  C23C16/455 ,  C23C16/56 ,  H01L21/02 ,  H01L21/67 ,  H01L21/78 ,  H01L21/66 ,  C23C16/24 ,  C23C16/44 ,  C23C16/52

Abstract: Provided are a deposition process monitoring system capable of detecting an internal state of a chamber in a deposition process, and a method of controlling the deposition process and a method of fabricating a semiconductor device using the system. The deposition process monitoring system includes a facility cover configured to define a space for a deposition process, a chamber located in the facility cover, covered with a translucent cover dome, and having a support on which a deposition target is placed, a plurality of lamps disposed in the facility cover, the lamps respectively disposed above and below the chamber, the lamps configured to supply radiant heat energy into the chamber during the deposition process, and a laser sensor disposed outside the chamber, the laser sensor configured to irradiate the cover dome with a laser beam and detect an intensity of the laser beam transmitted through the cover dome, wherein a state of by-products with which the cover dome is coated is determined based on the detected intensity of the laser beam.

公开(公告)号：US10184202B2

公开(公告)日：2019-01-22

申请号：US14679416

申请日：2015-04-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sung-mo Lee ,  Seung-hun Lee

IPC: D06F37/40 ,  D06F33/02 ,  D06F23/04

Abstract: A washing machine, a method and computer readable recording medium. The washing machine includes a washing spindle and a spin-drying spindle, a coupling that is movable to be engaged with a rotation preventing unit of the washing machine so that power of the driving motor is transferred to the washing spindle but not to the spin-drying spindle, and is movable to a position in which the coupling is not engaged with the rotation preventing unit so that power of the driving motor is transferred to both the washing spindle and the spin-drying spindle, and a control device configured to, in a washing mode of the washing machine, bring the coupling into contact with the rotation preventing unit, cause the coupling to rotate in first and second directions so that the coupling is engaged with the rotation preventing unit, and determine an engagement state by test-operating the driving motor.