NON-VOLATILE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
    21.
    发明申请
    NON-VOLATILE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
    非易失性存储器件及其制造方法

    公开(公告)号:US20150194332A1

    公开(公告)日:2015-07-09

    申请号:US14641958

    申请日:2015-03-09

    Abstract: A non-volatile memory device includes a substrate having an active region defined by a device isolation region that has a trench and an air gap, a device isolation pattern positioned at a lower portion of the trench, a memory cell layer including a tunnel insulation layer, a trap insulation layer and a blocking insulation layer that are sequentially stacked on the active region and one of which extends from the active region toward the device isolation region encloses top of the air gap whose bottom is defined by a layer other than that of the top, and a control gate electrode positioned on the cell structure. The one of the insulation layer extending includes a recess at a region corresponding to the center of the air gap.

    Abstract translation: 非易失性存储器件包括具有由具有沟槽和气隙的器件隔离区限定的有源区的衬底,位于沟槽下部的器件隔离图案,包括隧道绝缘层的存储单元层 ,顺序堆叠在有源区上并且其中一个从有源区向器件隔离区延伸的陷阱绝缘层和阻挡绝缘层包围气隙的顶部,其底部由不同于 顶部和位于电池结构上的控制栅电极。 绝缘层延伸的一个包括在对应于气隙的中心的区域处的凹部。

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