Abstract:
Devices that include a near field transducer (NFT), the NFT having at least one external surface; and at least one adhesion layer positioned on at least a portion of the at least one external surface, the adhesion layer including oxides of yttrium, oxides of scandium, oxides of lanthanoids, oxides of actionoids, oxides of zinc, or combinations thereof.
Abstract:
Devices that include a near field transducer (NFT); an amorphous gas barrier layer positioned on at least a portion of the NFT; and a wear resistance layer positioned on at least a portion of the gas barrier layer.
Abstract:
Devices that include a near field transducer (NFT) including a crystalline plasmonic material having crystal grains and grain boundaries; and nanoparticles disposed in the crystal grains, on the grain boundaries, or some combination thereof, wherein the nanoparticles are oxides of, lanthanum (La), barium (Ba), strontium (Sr), erbium (Er), hafnium (Hf), germanium (Ge), or combinations thereof; nitrides of zirconium (Zr), niobium (Nb), or combinations thereof; or carbides of silicon (Si), aluminum (Al), boron (B), zirconium (Zr), tungsten (W), titanium (Ti), niobium (Nb), or combinations thereof.
Abstract:
A device that includes a near field transducer (NFT); at least one cladding layer adjacent the NFT; and a carbon interlayer positioned between the NFT and the at least one cladding layer.
Abstract:
Devices that include a near field transducer (NFT), the NFT having at least one external surface; and at least one adhesion layer positioned on at least a portion of the at least one external surface, the adhesion layer including arsenic (As), antimony (Sb), selenium (Se), tellurium (Te), polonium (Po), bismuth (Bi), sulfur (S), or combinations thereof.
Abstract:
Devices that include a near field transducer (NFT), the NFT having at least one external surface; and at least one adhesion layer positioned on at least a portion of the at least one external surface, the adhesion layer including arsenic (As), antimony (Sb), selenium (Se), tellurium (Te), polonium (Po), bismuth (Bi), sulfur (S), or combinations thereof.
Abstract:
Devices that include a near field transducer (NFT), the NFT having at least one external surface; and at least one adhesion layer positioned on at least a portion of the at least one external surface, the adhesion layer including oxides of yttrium, oxides of scandium, oxides of lanthanoids, oxides of actionoids, oxides of zinc, or combinations thereof.
Abstract:
A magnetic device including a magnetic writer; and an overcoat positioned over at least the magnetic writer, the overcoat including oxides of yttrium, oxides of scandium, oxides of lanthanoids, oxides of actionoids, oxides of zinc, or combinations thereof
Abstract:
In accordance with one implementation, a photodiode may be integrated by thin film processing within a slider. In accordance with another implementation, an apparatus can be configured to include a slider, a first layer of a metal disposed within the slider, a layer of amorphous silicon disposed adjacent the first layer of metal, a second layer of metal disposed adjacent the layer of amorphous silicon, and wherein the first layer of metal, the layer of amorphous silicon, and the second layer of metal are operable as a photodiode.
Abstract:
Waveguides that include a top cladding layer made of a material having an index of refraction n4; a core bilayer structure, the core bilayer structure including a lower index core layer having an index of refraction n3; and a higher index core layer having an index of refraction n1, wherein the higher index core layer includes TiO2 and one or more than one of Nb2O5, CeO2, Ta2O5, ZrO2, HfO2, Y2O3, Sc2O3, MgO, Al2O3 and SiO2, wherein the lower index core layer is adjacent the higher index core layer; a bottom cladding layer made of a material having an index of refraction n2, wherein the waveguide is configured with the higher index core layer of the core bilayer structure adjacent the top cladding layer and the lower index core layer of the core bilayer structure adjacent the bottom cladding layer, and wherein n4 is less than n3 and n1, and n2 is less than n3 and n1.
Abstract translation:包括由具有折射率n4的材料制成的顶部覆层的波导; 核心双层结构,核心双层结构包括具有折射率n3的较低折射率核心层; 以及具有折射率n1的高折射率芯层,其中所述较高折射率芯层包括TiO 2和Nb 2 O 5,CeO 2,Ta 2 O 5,ZrO 2,HfO 2,Y 2 O 3,Sc 2 O 3,MgO,Al 2 O 3和SiO 2中的一种或多种,其中 较低指数核心层与较高指数核心层相邻; 由具有折射率n2的材料制成的底部包层,其中,所述波导配置有与所述顶部包覆层相邻的所述芯层双层结构的较高折射率的核心层和与所述核心双层结构相邻的底部的下部折射率核心层 包层,其中n4小于n3和n1,n2小于n3和n1。