摘要:
An erase method for a non-volatile memory device having a defined erase unit divided into first and second inner erase units includes; applying an erase voltage to at least one of the first and second inner erase units in accordance with respective states of corresponding first and second fail flags, after applying the erase voltage to the at least one of the first and second inner erase units, performing an erase verification on the at least one of the first and second inner erase units, and updating the at least one of the first and second fail flags in accordance with erase verification results.
摘要:
A nonvolatile semiconductor memory device has a high read output and is not affected by a noise of adjacent bit lines. The memory device is capable of performing high speed read operations. Each bit of a memory as formed by a plurality of memory cells. The memory cells each have the same structure as the structure of a memory cell of the main memory. During a read operation, the bit line is selected and proximate bit lines proximate to the selected bit line are not selected. The nonvolatile semiconductor memory device is formed together with the main memory on one chip by the same process.
摘要:
First and second memory units store reference values and verification values for generating reference voltages and verification voltages of nonvolatile multilevel memory cells. A reference voltage generator generates the reference voltages and the verification voltages according to the reference values and the verification values stored in the first and second memory units. Since the first and second memory units are rewritable, the reference voltages and the verification voltages can be set after the fabrication of the cell memory in accordance with the characteristics of the memory cells which are dependent on variations of fabrication process. A programming test circuit for obtaining the reference voltages and the verification voltages can also be used to set the reference voltages and the verification voltages after the fabrication of the cell memory. Consequently, it is possible to improve the read margins of data read from the memory cells with an enhancement in fabrication yield.
摘要:
The invention is to provide a novel non-volatile memory capable of recording multi-bit data. The invention is a non-volatile memory which has: first and second source-drain regions SD1, SD2 at the surface of a semiconductor substrate; and a non-conductive trapping gate TG, and a conductive control gate CG, formed on a channel region there between via an insulating film. Further, the non-volatile memory has a first or second state in which, by applying a voltage between the first and second source-drain regions SD1, SD2, hot electrons produced in the vicinity of the first or second source-drain region are locally captured in a first or second trapping gate region TSD1, TSD2 in the vicinity of them; and, a third state in which, by applying a voltage between the control gate and the channel region, electrons (or charge) are (is) injected into the entire trapping gate. According to whether or not the above-mentioned third state is adopted, one-bit information can be recorded, and according to whether or not the first and second states are adopted, two-bit information can be recorded. Consequently, information totaling three bits can be recorded in a single memory cell.
摘要:
A nonvolatile semiconductor memory device has an array of memory cells in columns and rows, and has word lines and bit lines provided in orthogonal directions, the memory cells for each column sharing one of the bit lines, and the memory cells for each row sharing one of the word lines. The memory device includes a plurality of subblocks of N page buffers where N is a given positive integer, the N page buffers for each subblock temporarily storing data bits that are written to or erased from N memory cells at a time in the memory array in response to a selected one of the word lines. A verify/output circuit produces, in response to signals output by the plurality of subblocks of N page buffers, a verify status of each of the respective subblocks that indicates whether the data bits are properly written to or erased from the N memory cells, the verify/output circuit outputting the verify status of at least one of the plurality of subblocks to an external device.
摘要:
Nonvolatile memory devices are provided including a memory cell array having a plurality of stacked memory layers and a rectifier configured to select memory cells constituting each memory layer sharing a word line or a bit line with another adjacent memory layer. The nonvolatile memory devices including a word line driving unit configured to drive a first word line, connected to a first memory cell of a first memory layer to be read, at a first voltage level and drive a second word line, connected to a second memory cell of a second memory layer sharing a first bit line connected to the first memory cell, at a second voltage level. The nonvolatile memory device further includes a bit line biasing unit configured to bias the first bit line at the second voltage level and bias a second bit line, connected to a third memory cell of a third memory layer sharing the first word line, at the first voltage level. Related methods and systems are also provided herein.
摘要:
A nonvolatile semiconductor memory device. The nonvolatile semiconductor memory device includes a memory cell formed in a first well outputs a first voltage in response to a reference voltage necessary for program and erase verify operations. A reference cell formed in a second well generates a second voltage in response to the reference voltage in the program and erase verify operations. A comparator circuit compares the first voltage to the second voltage to detect whether the verify operation for the memory cell has passed, in the verify operation. A bias applying unit applies the same bias voltage to the first and second wells in the verify operation: Although there is an over-erased cell, an erase verify, operation can be correctly performed.
摘要:
The present invention provides a multi-bits non-volatile memory circuit having a cell transistor with non-conductive trap gate which has a cell array capable of reading a plural data simultaneously. The present invention is a non-volatile memory circuit in which a plurality of cell transistors M having a non-conductive trapping gate TG are arranged, comprising: a plurality of source-drain lines SDL, which are connected commonly with the source-drain regions SD1, SD2 of cell transistors adjacent in row direction, wherein these adjacent source-drain lines are set to a floating state F, a read-out voltage application state BL, a reference voltage state OV, a read-out voltage state BL, and a floating state F, and the source-drain lines SDL in the read-out voltage state is caused to function as bit lines, such that a plurality of data are read out simultaneously. The above states are generated by the page buffer P/B connected to the source-drain line. The data read and hold are performed by the page buffer.
摘要:
A non-volatile semiconductor memory device comprises a plurality of memory cell units each of which includes a plurality of non-volatile memory cells capable of having data electrically rewritten; a storage unit; and an access inhibiting circuit. The storage unit stores therein the defect information of the memory cell unit not normally operating. The access inhibiting circuit judges the condition of the memory cell unit within the device according to the defect information stored in the storage unit. Access to the memory cell unit not normally operating is inhibited in accordance with the result of the judgement. Since the device can control the information of the memory cell unit not normally operating by itself, users of the device need not manage the defective memory cell unit. Consequently, the usability of the device is enhanced and the cost of a system mounting the device is curtailed. Particularly, it is effective for the non-volatile semiconductor memory device for file allowing the presence of inoperative memory cells.
摘要:
A series select transistor and a source select transistor are connected in series at the end of a NAND string of floating gate data storage transistors. The floating gates, the series select gate, and the source select gate are all preferably formed of polysilicon. The same tunnel oxide layer is used as gate oxide for the series select transistor and source select transistor as well as for the floating gate data storage transistors. Two layers of polysilicon in the series select gate and the source select gates are tied together. The series select transistor is tied to the last transistor in the NAND string. The source select transistor is tied to the array Vss supply. In order to program inhibit a specific NAND cell during the programming of another NAND cell, the gate of the series select transistor is raised to Vcc, while the gate of the source select transistor is held to ground. The two transistors in series are able to withstand a much higher voltage at the end of the NAND string without causing gated-diode junction or oxide breakdown in either the series or the source select transistor.