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62 条记录 (耗时 0.029 秒)

    Optical inspector
    21.
    发明授权
    Optical inspector 有权
    光学检查员

    公开(公告)号：US08830456B2

    公开(公告)日：2014-09-09

    申请号：US13757099

    申请日：2013-02-01

    申请人： Steven W. Meeks ,  Rusmin Kudinar ,  Hung P. Nguyen

    发明人： Steven W. Meeks ,  Rusmin Kudinar ,  Hung P. Nguyen

    IPC分类号： G01N21/00 ,  G01N21/95 ,  G01N21/94

    CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/9505 ,  G01N21/956 ,  G01N21/958

    摘要： An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a separating mirror, and a first and second detector. The radiating source is configured to irradiate a first position on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. The telecentric scan lens directs specular reflection and near specular scattered radiation to the time varying beam reflector. The specular reflection is directed by the separating mirror to the first detector. The near specular scattered radiation is not reflected by the separating mirror and propagates to the second detector. In response, the optical inspector determines the total reflectivity, the surface slope, or the near specular scattered radiation intensity of the sample.

    摘要翻译： 光学检查器包括辐射源，时变光束反射器，远心扫描透镜，分离镜以及第一和第二检测器。 辐射源被配置成用源光束照射时变光束反射器上的第一位置。 时变光束反射器将源光束引导到远心扫描透镜，然后将远光扫描透镜引导到源样品。 远心扫描透镜将镜面反射和近镜面散射辐射引导到时变光束反射器。 镜面反射由分离镜引导到第一检测器。 近镜面散射辐射不会被分离镜反射并传播到第二检测器。 作为响应，光学检查器确定样品的总反射率，表面斜率或近镜面散射辐射强度。

    Wafer edge inspection
    22.
    发明授权
    Wafer edge inspection 有权
    晶圆边缘检查

    公开(公告)号：US07656519B2

    公开(公告)日：2010-02-02

    申请号：US11848234

    申请日：2007-08-30

    申请人： Steven W. Meeks ,  Rusmin Kudinar

    发明人： Steven W. Meeks ,  Rusmin Kudinar

    IPC分类号： G01N21/00

    CPC分类号： G01N21/9501 ,  G01B11/065 ,  G01N21/9503 ,  G01N21/9506

    摘要： In one embodiment, a surface analyzer system comprises a radiation targeting assembly to target radiation onto an edge surface of a wafer, the radiation targeting assembly comprising a first expanded paraboloid or expanded ellipsoid reflector positioned adjacent the edge surface of the wafer, a reflected radiation collecting assembly that collects radiation reflected from the surface, a signal processing module to generate surface parameter data from the reflected radiation, and a defect detection module to analyze the surface parameter data to detect a defect on the surface.

    摘要翻译： 在一个实施例中，表面分析器系统包括辐射瞄准组件以将辐射瞄准晶片的边缘表​​面，所述辐射瞄准组件包括邻近所述晶片的边缘表​​面定位的第一扩展的抛物面或扩展的椭球反射器，反射的辐射收集 收集从表面反射的辐射的组件，用于从反射辐射产生表面参数数据的信号处理模块，以及用于分析表面参数数据以检测表面上的缺陷的缺陷检测模块。

    High speed optical profilometer for measuring surface height variation
    24.
    发明授权
    High speed optical profilometer for measuring surface height variation 有权
    用于测量表面高度变化的高速光学轮廓仪

    公开(公告)号：US06392749B1

    公开(公告)日：2002-05-21

    申请号：US09718054

    申请日：2000-11-20

    申请人： Steven W. Meeks ,  Rusmin Kudinar

    发明人： Steven W. Meeks ,  Rusmin Kudinar

    IPC分类号： G01B1106

    CPC分类号： G01B11/065 ,  G01B11/303 ,  G01N21/211

    摘要： A system and a method for measuring a height of a thin film disk or a silicon wafer having a first and a second electromagnetic signal source for generating a first and a second signal toward a first position on the thin film magnetic disk at two different angles, a first and a second sensitive detector positioned at a right angle from each other to receive a reflected portion of the first and the second signal that reflects off of the object, and to determine a radial portion of the first and the second signals and a circumferential portion of the first and the second signals. The system also includes a processor for determining the height of the first position based upon a difference between the circumferential portion of the second signal and the circumferential portion of the first signal that does not include slope information.

    摘要翻译： 一种用于测量具有第一和第二电磁信号源的薄膜盘或硅晶片的高度的系统和方法，用于以两个不同的角度向薄膜磁盘上的第一位置产生第一和第二信号， 第一和第二灵敏检测器，其彼此成直角定位，以接收反射离开物体的第一和第二信号的反射部分，并确定第一和第二信号的径向部分，以及周向 第一和第二信号的一部分。 该系统还包括一个处理器，用于基于第二信号的圆周部分与不包括斜率信息的第一信号的圆周部分之间的差来确定第一位置的高度。

    METHOD AND APPARATUS TO DETECT DEFECTS IN TRANSPARENT SOLIDS
    25.
    发明申请
    METHOD AND APPARATUS TO DETECT DEFECTS IN TRANSPARENT SOLIDS 有权
    检测透明固体缺陷的方法和装置

    公开(公告)号：US20160033421A1

    公开(公告)日：2016-02-04

    申请号：US14449058

    申请日：2014-07-31

    申请人： Steven W. Meeks ,  Ronny Soetarman

    发明人： Steven W. Meeks ,  Ronny Soetarman

    IPC分类号： G01N21/958 ,  G01N21/47

    CPC分类号： G01N21/958 ,  G01N21/47 ,  G01N2021/4711 ,  G01N2021/4735

    摘要： A method and apparatus to measure specular reflection intensity, specular reflection angle, near specular scattered radiation, and large angle scattered radiation and determine the location and type of defect present in a first and a second transparent solid that have abutting surfaces. The types of defects include a top surface particle, an interface particle, a bottom surface particle, an interface bubble, a top surface pit, and a stain. The four measurements are conducted at multiple locations along the surface of the transparent solid and the measured information is stored in a memory device. The difference between an event peak and a local average of measurements for each type of measurement is used to detect changes in the measurements. Information stored in the memory device is processed to generate a work piece defect mapping indicating the type of defect and the defect location of each defect found.

    摘要翻译： 测量镜面反射强度，镜面反射角，近镜面散射辐射和大角度散射辐射的方法和装置，并确定存在于具有邻接表面的第一和第二透明固体中的缺陷的位置和类型。 缺陷的类型包括顶表面颗粒，界面颗粒，底表面颗粒，界面气泡，顶表面凹坑和污渍。 四个测量在透明固体的表面的多个位置处进行，并且将测量的信息存储在存储器件中。 事件峰值和每种测量类型的局部测量平均值之间的差异用于检测测量的变化。 存储在存储器件中的信息被处理以产生指示缺陷类型和找到的每个缺陷的缺陷位置的工件缺陷映射。

    Servo pattern characterization on magnetic disks
    28.
    发明授权
    Servo pattern characterization on magnetic disks 失效
    磁盘上的伺服模式表征

    公开(公告)号：US07397621B2

    公开(公告)日：2008-07-08

    申请号：US11432609

    申请日：2006-05-11

    申请人： Zhen Hou ,  Ronny Soetarman ,  Vamsi Velidandla ,  Steven W. Meeks

    发明人： Zhen Hou ,  Ronny Soetarman ,  Vamsi Velidandla ,  Steven W. Meeks

    IPC分类号： G11B5/02

    CPC分类号： G11B5/59627

    摘要： In one embodiment, a surface analyzer system comprises a radiation targeting assembly to target radiation onto a surface, a reflected radiation collecting assembly that collects radiation reflected from the surface, and a signal processing module. The signal processing module generates an image of magnetic characteristics of the magnetic disk, wherein the image comprises a plurality of servo sector arcs, locates a sample of points on a plurality of the servo sector arcs, fits a circle to the sample of points on each of the plurality of servo sector arcs, and determines at least one pivot-to-gap measurement from the radius of the circles.

    摘要翻译： 在一个实施例中，表面分析器系统包括将辐射瞄准到表面上的辐射瞄准组件，收集从表面反射的辐射的反射辐射收集组件和信号处理模块。 信号处理模块生成磁盘的磁特性的图像，其中图像包括多个伺服扇区弧，定位多个伺服扇区弧上的点样本，将圆适合于每个点上的点样本 并且从圆的半径确定至少一个枢轴对间隙测量。