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21.发明申请公开(公告)号：US20070218398A1
公开(公告)日：2007-09-20
申请号：US11705787
申请日：2007-02-14
IPC分类号： G03C5/18
CPC分类号： G03F7/0755 , C07F7/12 , C07F7/1804 , G03F7/022 , G03F7/0751 , G03F7/165
摘要： Provided are a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern through fewer steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent comprising a 1,2-naphthoquinone-2-diazido-5-sulfonyl group or a 1,2-naphthoquinone-2-diazido-4-sulfonyl. group.
摘要翻译： 提供了用于通过较少步骤形成低缺陷微粒图案，点阵列图案或孔阵列图案的感光性硅烷偶联剂，以及使用这种感光性硅烷偶联剂形成图案的方法。 使用的是含有1,2-萘醌-2-二叠氮基-5-磺酰基或1,2-萘醌-2-二叠氮基-4-磺酰基的感光性硅烷偶联剂。 组。
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22.发明申请公开(公告)号：US20060031782A1
公开(公告)日：2006-02-09
申请号：US11005061
申请日：2004-12-07
IPC分类号： G06F3/00
CPC分类号： H04M1/72547 , G06Q10/107 , H04L51/24
摘要： The present invention relates to massage control of a terminal device provided with a messaging function and acts to enhance the display function for new and old events such as reception of plural pieces of mail. The terminal device provided with a messaging function that indicates an event comprises a first display mark (unread-mail icon) indicative of an event; and a second display mark (newly-incoming-mail icon) indicative of a new event generated while the first display mark is being displayed, the second display mark indicating the new event in a different form from that of the first display mark, wherein an old and the new events are respectively indicated by the first and second display marks.
摘要翻译： 本发明涉及具有消息功能的终端设备的按摩控制，并且用于增强诸如接收多个邮件的新旧事件的显示功能。 提供有指示事件的消息传递功能的终端设备包括指示事件的第一显示标记（未读邮件图标） 以及指示在显示第一显示标记时产生的新事件的第二显示标记（新进入邮件图标），指示与第一显示标记不同的形式的新事件的第二显示标记，其中， 新事件分别由第一和第二显示标记指示。
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23.发明申请Resist pattern forming method based on near-field exposure, and substrate processing method and device manufacturing method using the resist pattern forming method 审中-公开基于近场曝光的抗蚀剂图案形成方法，以及使用抗蚀剂图案形成方法的衬底处理方法和器件制造方法公开(公告)号：US20060014108A1
公开(公告)日：2006-01-19
申请号：US11166103
申请日：2005-06-27
申请人： Toshiki Ito , Takako Yamaguchi
发明人： Toshiki Ito , Takako Yamaguchi
IPC分类号： G03F7/00
CPC分类号： G03F7/2014 , G03F7/40
摘要： Disclosed is a resist pattern forming method wherein an exposure mask with a light blocking film having a fine opening not greater than a wavelength of exposure light is placed close to a resist layer provided on a substrate and wherein exposure light is projected to the resist layer through the exposure mask, whereby the resist layer is exposed with near-field light leaking from the fine opening such that a pattern of the exposure mask is transferred to the resist layer. The method includes a resist layer forming step for forming, on the substrate, a negative type resist layer with a thickness not less than a leakage depth of the near-field light, an exposure step for exposing the negative type resist layer with the near-field light, and a development step for developing the exposed negative type resist layer by use of a developing liquid to form a pattern in a region being shallower than the thickness of the negative type resist layer.
摘要翻译： 公开了一种抗蚀剂图案形成方法，其中将具有不大于曝光光的波长的微小开口的遮光膜的曝光掩模放置在靠近设置在基板上的抗蚀剂层上，并且其中曝光光通过 曝光掩模，由此抗蚀剂层暴露于从精细开口泄漏的近场光，使得曝光掩模的图案被转印到抗蚀剂层。 该方法包括：抗蚀剂层形成步骤，用于在衬底上形成厚度不小于近场光的泄漏深度的负型抗蚀剂层;曝光步骤，用于使负型抗蚀剂层与近场光束曝光; 以及通过使用显影液显影曝光的负型抗蚀剂层以在比负型抗蚀剂层的厚度浅的区域中形成图案的显影步骤。
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24.发明申请Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method 审中-公开光敏树脂组合物，抗蚀剂图案形成方法，基板处理方法和装置制造方法公开(公告)号：US20050221222A1
公开(公告)日：2005-10-06
申请号：US11084041
申请日：2005-03-21
申请人： Toshiki Ito , Takako Yamaguchi
发明人： Toshiki Ito , Takako Yamaguchi
CPC分类号： G03F7/38 , G03F7/0233 , G03F7/0392
摘要： A photosensitive resin composition is constituted by a polymer, as a component (A), having a monodisperse molecular weight distribution; and a compound, as a component (B), first generating a functional group which is capable of being silylated by radiation irradiation.
摘要翻译： 感光性树脂组合物由具有单分子分子量分布的作为（A）成分的聚合物构成。 和作为组分（B）的化合物，首先产生能够通过辐射照射被甲硅烷基化的官能团。
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公开(公告)号：US20050064301A1
公开(公告)日：2005-03-24
申请号：US10931985
申请日：2004-09-02
申请人： Takako Yamaguchi , Yasuhisa Inao
发明人： Takako Yamaguchi , Yasuhisa Inao
CPC分类号： B82Y10/00 , G03F1/50 , G03F7/7035
摘要： A mask manufacturing method includes a first step of forming, on a workpiece substrate, a fine pattern on the basis of a pattern of a fine opening having a size of not more than a wavelength of exposure light by irradiating the workpiece substrate with the exposure light through a first mask provided with the fine opening and using near-field light leaking from the fine opening; and a second step of forming a second mask by processing the workpiece substrate on the basis of the fine pattern formed in the first step.
摘要翻译： 掩模制造方法包括：第一步骤，通过用曝光光照射工件基板，在工件基板上形成基于具有不大于曝光光的波长的尺寸的微细开口的图案的精细图案 通过设置有微细开口的第一掩模和使用从微细开口泄漏的近场光; 以及通过基于在第一步骤中形成的精细图案处理工件基板来形成第二掩模的第二步骤。
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26.发明授权公开(公告)号：US08744526B2
公开(公告)日：2014-06-03
申请号：US11538668
申请日：2006-10-04
IPC分类号： H04M1/00
CPC分类号： H04M1/00 , H04M1/2745 , H04M1/274508 , H04M1/274558 , H04M1/7258
摘要： A communication terminal having one or more one-touch-dial buttons simplifies operations needed for registration of destination data such as phone numbers or mail addresses. A communication terminal (e.g., a cellular phone) having one or more one-touch-dial buttons includes a destination-data registration unit (e.g., a phone-directory database) that allows destination data such as phone numbers or mail addresses to be registered therein, a one-touch-dial registration unit that allows destination data to be registered therein so as to be associated with the one or more one-touch-dial buttons, and a control unit that, in response to an operation of the one or more one-touch-dial buttons, determines whether destination data has been registered in the one-touch-dial registration unit or the destination-data registration unit, and that outputs a result of the determination and a query message regarding registration of the destination data.
摘要翻译： 具有一个或多个单触拨号按钮的通信终端简化了诸如电话号码或邮件地址的目的地数据的注册所需的操作。 具有一个或多个单触拨号按钮的通信终端（例如，蜂窝电话）包括允许登记诸如电话号码或邮件地址的目的地数据的目的地数据登记单元（例如，电话目录数据库） 其中，允许将目的地数据登记在其中以与所述一个或多个单按钮按钮相关联的单触拨号登记单元，以及控制单元，响应于所述一个或多个 更多的单触拨号按钮，确定目的地数据是否已经登记在单触拨号登记单元或目的地数据登记单元中，并且输出确定结果和关于目的地数据的登记的查询消息 。
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27.发明授权公开(公告)号：US07869581B2
公开(公告)日：2011-01-11
申请号：US10998036
申请日：2004-11-29
摘要： A communication terminal having one or more one-touch-dial buttons simplifies operations needed for registration of destination data such as phone numbers or mail addresses. A communication terminal (e.g., a cellular phone) having one or more one-touch-dial buttons includes a destination-data registration unit (e.g., a phone-directory database) that allows destination data such as phone numbers or mail addresses to be registered therein, a one-touch-dial registration unit that allows destination data to be registered therein so as to be associated with the one or more one-touch-dial buttons, and a control unit that, in response to an operation of the one or more one-touch-dial buttons, determines whether destination data has been registered in the one-touch-dial registration unit or the destination-data registration unit, and that outputs a result of the determination and a query message regarding registration of the destination data.
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28.发明授权公开(公告)号：US07704672B2
公开(公告)日：2010-04-27
申请号：US11705787
申请日：2007-02-14
CPC分类号： G03F7/0755 , C07F7/12 , C07F7/1804 , G03F7/022 , G03F7/0751 , G03F7/165
摘要： Provided are a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern through fewer steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent comprising a 1,2-naphthoquinone-2-diazido-5-sulfonyl group or a 1,2-naphthoquinone-2-diazido-4-sulfonyl group.
摘要翻译： 提供了用于通过较少步骤形成低缺陷微粒图案，点阵列图案或孔阵列图案的感光性硅烷偶联剂，以及使用这种感光性硅烷偶联剂形成图案的方法。 使用的是含有1,2-萘醌-2-二叠氮基-5-磺酰基或1,2-萘醌-2-二叠氮基-4-磺酰基的感光性硅烷偶联剂。
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29.发明授权Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method 失效近场曝光掩模，制造该掩模的方法，具有该掩模的近场曝光装置和抗蚀剂图案形成方法公开(公告)号：US07659039B2
公开(公告)日：2010-02-09
申请号：US10585644
申请日：2006-06-07
IPC分类号： G03F1/00
CPC分类号： G03F1/50 , B82Y10/00 , G03F7/70325 , G03F7/7035
摘要： Disclosed is a near-field exposure mask having a light blocking layer formed on a substrate, the light blocking layer having an opening with an opening width narrower than a wavelength of an exposure light source, wherein exposure of an object to be exposed is carried out by use of near-field light to be produced at the opening while the exposure mask and the object to be exposed are placed in contact with each other, an important feature residing in that the light blocking layer is provided by a film that contains silicon in a range from 50% to 100% in terms of mole fraction.
摘要翻译： 公开了一种具有在基板上形成的遮光层的近场曝光掩模，该遮光层具有开口宽度比曝光光源的波长窄的开口，其中进行曝光对象的曝光 通过使曝光掩模和被曝光物体在开口处产生的近场光彼此接触，其特征在于阻光层由含有硅的膜提供， 以摩尔分数计为50％至100％的范围。
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30.发明申请Near-Field Exposure Mask, Method of Producing that Mask, Near-Field Exposure Apparatus Having that Mask, and Resist Pattern Forming Method 失效近场曝光掩模，产生该掩模的方法，具有该掩模的近场曝光装置和抗蚀剂图案形成方法公开(公告)号：US20090208850A1
公开(公告)日：2009-08-20
申请号：US10585644
申请日：2006-06-07
CPC分类号： G03F1/50 , B82Y10/00 , G03F7/70325 , G03F7/7035
摘要： Disclosed is a near-field exposure mask having a light blocking layer formed on a substrate, the light blocking layer having an opening with an opening width narrower than a wavelength of an exposure light source, wherein exposure of an object to be exposed is carried out by use of near-field light to be produced at the opening while the exposure mask and the object to be exposed are placed in contact with each other, an important feature residing in that the light blocking layer is provided by a film that contains silicon in a range from 50% to 100% in terms of mole fraction.
摘要翻译： 公开了一种具有在基板上形成的遮光层的近场曝光掩模，该遮光层具有开口宽度比曝光光源的波长窄的开口，其中进行曝光对象的曝光 通过使曝光掩模和被曝光物体在开口处产生的近场光彼此接触，其特征在于阻光层由含有硅的膜提供， 以摩尔分数计为50％至100％的范围。
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