Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head
    21.
    发明授权
    Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head 有权
    电介质膜结构,使用电介质膜结构的压电致动器和喷墨头

    公开(公告)号:US07938515B2

    公开(公告)日:2011-05-10

    申请号:US12389710

    申请日:2009-02-20

    IPC分类号: B41J2/045

    摘要: The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2: u=(Cc/Ca)×(Wa/Wc)  (1) where, Cc is a count number of a peak of a (001′) face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, 1′ is a natural number selected so that Cc becomes maximum); Ca is a count number of a peak of a (h′00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h′ is a natural number selected so that Cc becomes maximum); Wc is a half-value width of a peak of the (001′) face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and Wa is a half-value width of a peak of the (h′00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.

    摘要翻译: 本发明提供了一种电介质膜结构,其具有设置在基板上的基板和电介质膜,并且其中电介质膜相对于基板具有(001)面取向,并且其中以下等式(1)中的值u, 关于电介质膜是大于2的实数:u =(Cc / Ca)×(Wa / Wc)(1)其中,Cc是介电膜的(001')面的峰的计数 平面外X射线衍射测量(这里,1'是选择为Cc变为最大的自然数); Ca是In平面X射线衍射测定中的电介质膜的(h'00)面的峰值的计数数(这里,h'是选择为Cc变为最大的自然数); Wc是外平面摇摆曲线X射线衍射测定中的电介质膜的(001')面的峰值的半值宽度; Wa是In平面摇摆曲线X射线衍射测定中的电介质膜的(h'00)面的峰值的半值宽度。

    Piezoelectric actuator and liquid discharge head using the same
    23.
    发明授权
    Piezoelectric actuator and liquid discharge head using the same 有权
    压电致动器和排液头使用相同

    公开(公告)号:US07999441B2

    公开(公告)日:2011-08-16

    申请号:US12237933

    申请日:2008-09-25

    IPC分类号: H01L41/04

    摘要: The piezoelectric actuator includes a piezoelectric film between two electrode layers and a diaphragm. Assuming that: each elastic coefficient of all materials is isotropic and a distortion amount of the piezoelectric film by an electric field is isotropic in all in-plane directions; a point located on a diaphragm surface and having a maximum displacement when a predetermined electric field is applied to distort the piezoelectric film, is expressed by PδMAX; and a point located on a circumference of a reference-circle having PδMAX as a center and having a minimum difference in displacement from PδMAX is expressed by PδA, the diaphragm has a shape capable of determining an axis A1 set in a straight-line joining PδMAX and PδA, the diaphragm comprises a single-crystalline-material in which a plane orthogonal to A1 and perpendicular to an axis A2 on the diaphragm surface, is a {110}-plane, and the piezoelectric film is a {100}-single-orientation film.

    摘要翻译: 压电致动器包括在两个电极层和隔膜之间的压电膜。 假设:所有材料的每个弹性系数是各向同性的,并且通过电场的压电膜的失真量在所有面内方向都是各向同性的; 当施加预定电场以使压电膜失真时,位于膜片表面上并具有最大位移的点由PδMAX表示; 以PδMAX为中心并且具有与PδMAX的位移的最小差异的基准圆的圆周上的点由PδA表示,所述隔膜具有能够确定在直线接合PδMAX中设定的轴A1的形状 和PδA,所述隔膜包括其中与A1正交并垂直于所述膜表面上的轴线A2的平面为{110}面的单晶材料,并且所述压电膜为{100} - 单晶材料, 定向电影。

    PIEZOELECTRIC ACTUATOR AND LIQUID DISCHARGE HEAD USING THE SAME
    24.
    发明申请
    PIEZOELECTRIC ACTUATOR AND LIQUID DISCHARGE HEAD USING THE SAME 有权
    压电致动器和使用其的液体排出头

    公开(公告)号:US20090091215A1

    公开(公告)日:2009-04-09

    申请号:US12237933

    申请日:2008-09-25

    IPC分类号: H01L41/00

    摘要: The piezoelectric actuator includes a piezoelectric film between two electrode layers and a diaphragm. Assuming that: each elastic coefficient of all materials is isotropic and a distortion amount of the piezoelectric film by an electric field is isotropic in all in-plane directions; a point located on a diaphragm surface and having a maximum displacement when a predetermined electric field is applied to distort the piezoelectric film, is expressed by PδMAX; and a point located on a circumference of a reference-circle having PδMAX as a center and having a minimum difference in displacement from PδMAX is expressed by PδA, the diaphragm has a shape capable of determining an axis A1 set in a straight-line joining PδMAX and PδA, the diaphragm comprises a single-crystalline-material in which a plane orthogonal to A1 and perpendicular to an axis A2 on the diaphragm surface, is a {110}-plane, and the piezoelectric film is a {100}-single-orientation film.

    摘要翻译: 压电致动器包括在两个电极层和隔膜之间的压电膜。 假设:所有材料的每个弹性系数是各向同性的,并且通过电场的压电膜的失真量在所有面内方向都是各向同性的; 位于膜片表面上并且当施加预定电场以使压电膜失真时具有最大位移的点由PdeltaMAX表示; 并且位于具有PdeltaMAX作为中心并且具有与PdeltaMAX的位移的最小差异的参考圆的圆周上的点由PdeltaA表示,所述隔膜具有能够确定在连接PdeltaMAX的直线中设置的轴A1的形状 和PdeltaA,隔膜包括其中与A1正交并垂直于膜片表面上的轴线A2的平面为{110}面的单晶材料,并且压电膜为{100} - 单晶材料, 定向电影。

    Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head
    26.
    发明授权
    Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head 有权
    电介质膜结构,使用电介质膜结构的压电致动器和喷墨头

    公开(公告)号:US07513608B2

    公开(公告)日:2009-04-07

    申请号:US11338774

    申请日:2006-01-25

    IPC分类号: B41J2/045

    摘要: The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2: u=(Cc/Ca)×(Wa/Wc)  (1) where, Cc is a count number of a peak of a (001′)face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, l′ is a natural number selected so that Cc becomes maximum); Ca is a count number of a peak of a (h′00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h′ is a natural number selected so that Cc becomes maximum); Wc is a half-value width of a peak of the (001′) face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and Wa is a half-value width of a peak of the (h′00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.

    摘要翻译: 本发明提供了一种电介质膜结构,其具有设置在基板上的基板和电介质膜,并且其中电介质膜相对于基板具有(001)面取向,并且其中以下等式(1)中的值u, u =(Cc / Ca)×(Wa / Wc)(1)中的绝对值大于2的实数:<?in-line-formula description =“In-line formula”end =“lead” <?in-line-formula description =“In-line formula”end =“tail”?>其中,Cc是平面外的电介质膜的(001')面的峰值的计数数 X射线衍射测量(这里,l'是选择的自然数,使得Cc变为最大); Ca是In平面X射线衍射测定中的电介质膜的(h'00)面的峰值的计数数(这里,h'是选择为Cc变为最大的自然数); Wc是外平面摇摆曲线X射线衍射测定中的电介质膜的(001')面的峰值的半值宽度; Wa是In平面摇摆曲线X射线衍射测定中的电介质膜的(h'00)面的峰值的半值宽度。

    Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head
    27.
    发明申请
    Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head 有权
    电介质膜结构,使用电介质膜结构的压电致动器和喷墨头

    公开(公告)号:US20060176342A1

    公开(公告)日:2006-08-10

    申请号:US11338774

    申请日:2006-01-25

    IPC分类号: B41J2/045

    摘要: The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2: u=(Cc/Ca)×(Wa/Wc)  (1) where, Cc is a count number of a peak of a (001′) face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, l′ is a natural number selected so that Cc becomes maximum); Ca is a count number of a peak of a (h′00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h′ is a natural number selected so that Cc becomes maximum); WC is a half-value width of a peak of the (001′) face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and Wa is a half-value width of a peak of the (h′00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.

    摘要翻译: 本发明提供了一种电介质膜结构,其具有设置在基板上的基板和电介质膜,并且其中电介质膜相对于基板具有(001)面取向,并且其中以下等式(1)中的值u, 关于电介质膜是大于2的实数:<?in-line-formula description =“In-line Formulas”end =“lead”?> u =(C C 其中C是在平面外X射线衍射测量中电介质膜的(001')面的峰的计数(这里,l'是 选择的自然数使得C 变得最大); 在平面X射线衍射测量中,电介质膜的(h'00)面的峰值的计数数(这里,h'是选择的自然数,使得C 变为最大); WC是在平面外的摇摆曲线X射线衍射测定中的电介质膜的(001')面的峰值的半值宽度; 并且W a a是在平面内的摇摆曲线X射线衍射测量中电介质膜的(h'00)面的峰值的半值宽度。

    Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head
    28.
    发明授权
    Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head 失效
    电介质膜结构,使用电介质膜结构的压电致动器和喷墨头

    公开(公告)号:US07059711B2

    公开(公告)日:2006-06-13

    申请号:US10769765

    申请日:2004-02-03

    IPC分类号: B41J2/045

    摘要: The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2: u=(Cc/Ca)×(Wa/Wc)  (1) where, Cc is a count number of a peak of a (00l′) face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, l′ is a natural number selected so that Cc becomes maximum); Ca is a count number of a peak of a (h′00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h′ is a natural number selected so that Cc becomes maximum); Wc is a half-value width of a peak of the (00l′) face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and Wa is a half-value width of a peak of the (h′00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.

    摘要翻译: 本发明提供了一种电介质膜结构,其具有设置在基板上的基板和电介质膜,并且其中电介质膜相对于基板具有(001)面取向,并且其中以下等式(1)中的值u, 关于电介质膜是大于2的实数:<?in-line-formula description =“In-line Formulas”end =“lead”?> u =(C C 其中,C是在平面外X射线衍射测量中电介质膜的(001)面的峰值的计数(这里,l'是 选择的自然数使得C 变得最大); 在平面X射线衍射测量中,电介质膜的(h'00)面的峰值的计数数(这里,h'是选择的自然数,使得C 变为最大); 在平面外的摇摆曲线X射线衍射测量中,电介质薄膜的(001')面的峰值的半值宽度是半值宽度; 并且W a a是在平面内的摇摆曲线X射线衍射测量中电介质膜的(h'00)面的峰值的半值宽度。