公开(公告)号：US09613801B2

公开(公告)日：2017-04-04

申请号：US14858568

申请日：2015-09-18

Applicant: Tokyo Electron Limited

Inventor： Michael A. Carcasi ,  Mark H. Somervell ,  Benjamen M. Rathsack

IPC: H01L21/00 ,  H01L21/02 ,  H01L21/027 ,  B81C1/00 ,  G03F7/00 ,  H01L21/268 ,  H01L21/28 ,  H01L21/66

CPC classification number: H01L21/02345 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0002 ,  H01L21/02118 ,  H01L21/0271 ,  H01L21/268 ,  H01L21/28123 ,  H01L22/12 ,  H01L22/20

Abstract: A method of patterning a layered substrate is provided that includes forming a layer of a block copolymer on a substrate, annealing the layer of the block copolymer to affect microphase segregation such that self-assembled domains are formed, and annealing the layer of the block copolymer a second time to refine or modify the microphase segregation, where one of the annealing steps uses an absorption based heating method.

公开(公告)号：US20160013052A1

公开(公告)日：2016-01-14

申请号：US14858568

申请日：2015-09-18

Applicant: Tokyo Electron Limited

Inventor： Michael A. Carcasi ,  Mark H. Somervell ,  Benjamen M. Rathsack

IPC: H01L21/02 ,  H01L21/66 ,  H01L21/268

CPC classification number: H01L21/02345 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0002 ,  H01L21/02118 ,  H01L21/0271 ,  H01L21/268 ,  H01L21/28123 ,  H01L22/12 ,  H01L22/20

Abstract: A method of patterning a layered substrate is provided that includes forming a layer of a block copolymer on a substrate, annealing the layer of the block copolymer to affect microphase segregation such that self-assembled domains are formed, and annealing the layer of the block copolymer a second time to refine or modify the microphase segregation, where one of the annealing steps uses an absorption based heating method.

Abstract translation: 提供一种图案化层叠基板的方法，其包括在基板上形成嵌段共聚物层，使嵌段共聚物层退火以影响形成自组装畴的微相分离，并使嵌段共聚物层退火 第二次细化或改变微相分离，其中一个退火步骤使用基于吸收的加热方法。

公开(公告)号：US20140272723A1

公开(公告)日：2014-09-18

申请号：US13830859

申请日：2013-03-14

Applicant: TOKYO ELECTRON LIMITED

Inventor： Mark H. Somervell ,  Michael A. Carcasi

IPC: G03F7/20

CPC classification number: G03F7/11 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0035 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/168 ,  G03F7/322 ,  G03F7/325 ,  G03F7/40

Abstract: A method of forming a layered substrate comprising a self-assembled material is provided. The method includes forming a first layer of material on a substrate, forming a layer of a radiation sensitive material on the first layer of material, imaging the layer of the radiation sensitive material with patterned light, heating the layer of the radiation sensitive material to a temperature at or above the cross-linking reaction temperature, developing the imaged layer, and forming the block copolymer pattern. The radiation sensitive material comprises at least one photo-sensitive component selected from (a) a photo-decomposable cross-linking agent, (b) a photo-base generator, or (c) a photo-decomposable base; and a cross-linkable polymer, wherein imaging by the patterned light provides a pattern defined by a first region having substantial portions of a decomposed photo-sensitive component surrounded by regions having substantial portions of intact photo-sensitive component.

Abstract translation: 提供了一种形成包括自组装材料的层状衬底的方法。 该方法包括在衬底上形成第一材料层，在第一材料层上形成辐射敏感材料层，用图案化光成像辐射敏感材料层，将辐射敏感材料层加热到 温度等于或高于交联反应温度，显影成像层，形成嵌段共聚物图案。 辐射敏感材料包含至少一种选自（a）可光分解交联剂，（b）光碱发生剂或（c）可光分解基质的光敏组分; 和可交联聚合物，其中通过图案化光的成像提供了由具有由具有完整光敏组分的实质部分的区域包围的分解的光敏部件的实质部分的第一区域限定的图案。

公开(公告)号：US20130107237A1

公开(公告)日：2013-05-02

申请号：US13722548

申请日：2012-12-20

Applicant: Tokyo Electron Limited

Inventor： Michael A. Carcasi ,  Benjamen M. Rathsack ,  Mark H. Somervell

IPC: G03F7/26

CPC classification number: G03F7/26 ,  G03F7/2024 ,  G03F7/40 ,  H01L21/67207

Abstract: A method and system for patterning a substrate using a radiation-sensitive material is described. The method and system include forming a layer of radiation-sensitive material on a substrate, exposing the layer of radiation-sensitive material to a pattern of radiation, and then performing a post-exposure bake following the exposing. The imaged layer of radiation-sensitive material is then positive-tone developed to remove a region having high radiation exposure to form radiation-sensitive material lines. An exposure gradient within the radiation-sensitive material lines is then removed, followed by slimming the radiation-sensitive material lines.

Abstract translation: 描述了使用辐射敏感材料构图衬底的方法和系统。 该方法和系统包括在衬底上形成辐射敏感材料层，将辐射敏感材料层暴露于辐射图案，然后在曝光之后进行曝光后烘烤。 然后对成像的辐射敏感材料层进行正音发展，以去除具有高辐射曝光的区域以形成辐射敏感材料线。 然后去除辐射敏感材料线内的曝光梯度，然后减少辐射敏感材料线。