公开(公告)号：US5314509A

公开(公告)日：1994-05-24

申请号：US751951

申请日：1991-08-29

申请人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

发明人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC分类号： B01J3/00 ,  B41J2/36 ,  B41J2/365 ,  C23C14/56 ,  H01L21/00 ,  H01L21/677 ,  B08B3/00 ,  C23C16/00

CPC分类号： H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

摘要翻译： 本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。 当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中， 通过产生等离子体对真空处理室进行干洗通过干式清洗完成后，将虚设基板返回到虚设基板收纳机构。因此，不需要用于清洁目的的特定机构，可以构成装置 简单此外，用于干洗的虚拟基板和待加工基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。

公开(公告)号：USRE39775E1

公开(公告)日：2007-08-21

申请号：US10066747

申请日：2002-09-24

申请人： Shigekazu Kato ,  Kouji Nishihata ,  Tsuenhiko Tsubone ,  Atsushi Itou

发明人： Shigekazu Kato ,  Kouji Nishihata ,  Tsuenhiko Tsubone ,  Atsushi Itou

IPC分类号： F26B5/04

CPC分类号： H01L21/67748 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253

摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

公开(公告)号：US07089680B1

公开(公告)日：2006-08-15

申请号：US09766596

申请日：2001-01-23

申请人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

发明人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC分类号： F26R13/30

CPC分类号： H01L21/67748 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  Y10S134/902 ,  Y10S414/139 ,  Y10S414/14

摘要： A vacuum processing apparatus which includes a means for transferring substrates from a loader, with a transferring device, to a double lock chamber; and, then to a selected vacuum processing chamber. The substrates are returned to a substrate, by the vacuum loader, into their original position in the substrate table. The surfaces of the substrates are maintained in a horizontal position during processing.

摘要翻译： 一种真空处理装置，包括用于将基板从装载器与转印装置传送到双重锁定室的装置; 然后到选定的真空处理室。 基板通过真空装载机返回到基板到基板台中的原始位置。 在处理期间，基板的表面保持在水平位置。

公开(公告)号：US20060032073A1

公开(公告)日：2006-02-16

申请号：US11204171

申请日：2005-08-16

申请人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

发明人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC分类号： F26B13/30 ,  F26B5/04

CPC分类号： H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

公开(公告)号：US06968630B2

公开(公告)日：2005-11-29

申请号：US10796195

申请日：2004-03-10

申请人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

发明人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC分类号： B01J3/00 ,  B41J2/36 ,  B41J2/365 ,  C23C14/56 ,  H01L21/00 ,  H01L21/677 ,  F26B5/04

CPC分类号： H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

公开(公告)号：US06886272B2

公开(公告)日：2005-05-03

申请号：US10683067

申请日：2003-10-14

申请人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

发明人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC分类号： B01J3/00 ,  B41J2/36 ,  B41J2/365 ,  C23C14/56 ,  H01L21/00 ,  H01L21/677 ,  F26B13/30

CPC分类号： H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

摘要翻译： 本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。 当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中， 通过产生等离子体对真空处理室进行干洗。 在完成干洗之后，虚拟衬底返回到虚设衬底存储装置。 因此，仅用于清洁目的的特定机构是不必要的，并且可以使装置的结构简单。 此外，用于干洗的虚拟基板和待加工的基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。

公开(公告)号：US06484415B2

公开(公告)日：2002-11-26

申请号：US09782193

申请日：2001-02-14

申请人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

发明人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC分类号： F26B1330

CPC分类号： H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A wafer conveyor system for used in a vacuum processing apparatus wherein the conveyor structure is provided with a transfer structure and a robot apparatus is arranged on the transfer structure. The robot provides for rotation of the wafer horizontally from a position in a cassette to an opposite postion of the cassette.

摘要翻译： 一种用于真空处理设备的晶片传送系统，其中传送结构设置有传送结构，机器人装置设置在传送结构上。 机器人使晶片从盒中的位置水平地旋转到盒的相对位置。

公开(公告)号：US6044576A

公开(公告)日：2000-04-04

申请号：US390684

申请日：1999-09-07

申请人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

发明人： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC分类号： B01J3/00 ,  B41J2/36 ,  B41J2/365 ,  C23C14/56 ,  H01L21/00 ,  H01L21/677 ,  F26B5/04

CPC分类号： H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

摘要翻译： 本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。 当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中， 通过产生等离子体对真空处理室进行干洗。 在完成干洗之后，虚拟衬底返回到虚设衬底存储装置。 因此，仅用于清洁目的的特定机构是不必要的，并且可以使装置的结构简单。 此外，用于干洗的虚拟基板和待加工的基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。

公开(公告)号：US5673750A

公开(公告)日：1997-10-07

申请号：US460600

申请日：1995-06-02

申请人： Tsunehiko Tsubone ,  Naoyuki Tamura ,  Shigekazu Kato ,  Kouji Nishihata ,  Atsushi Itou

发明人： Tsunehiko Tsubone ,  Naoyuki Tamura ,  Shigekazu Kato ,  Kouji Nishihata ,  Atsushi Itou

IPC分类号： C23C14/50 ,  C23C14/54 ,  C23C16/458 ,  C30B33/00 ,  H01L21/00 ,  F28F27/00

CPC分类号： C23C16/466 ,  C23C14/50 ,  C23C14/541 ,  C23C16/4583 ,  C23C16/4586 ,  C30B33/00 ,  H01L21/67103

摘要： This invention relates to a vacuum processing method and apparatus. When a sample is plasma processed under a reduced pressure, a sample bed is cooled by a cooling medium kept at a predetermined temperature lower than an etching temperature, the sample is held on the sample bed, a heat transfer gas is supplied between the back of the sample and the sample installation surface of the sample bed, and the pressure of the heat transfer gas is controlled so as to bring the sample to a predetermined processing temperature. Before the step of holding the sample on the sample bed and supplying the heat transfer gas, heat transfer gas remaining upstream and downstream of the flow rate regulator in the supply line for the heat transfer gas is vacuum exhausted. This is accomplished using a bypass line connected upstream and downstream of the flow rate regulator and an arrangement of appropriate valves.

摘要翻译： 本发明涉及一种真空处理方法和装置。 当样品在减压下进行等离子体处理时，样品床被保持在比蚀刻温度低的预定温度的冷却介质冷却，样品被保持在样品床上，传热气体在 样品床的样品和样品安装表面以及传热气体的压力被控制以使样品达到预定的处理温度。 在将样品保持在样品床上并供给传热气体的步骤之前，用于传热气体的供给管线中的流量调节器的上游和下游的传热气体被真空排空。 这是使用连接在流量调节器的上游和下游的旁路管线和适当的阀的布置来实现的。

公开(公告)号：US4527698A

公开(公告)日：1985-07-09

申请号：US493512

申请日：1983-05-11

申请人： Kouji Nishihata ,  Ichiro Nakazima ,  Mituo Hirata

发明人： Kouji Nishihata ,  Ichiro Nakazima ,  Mituo Hirata

IPC分类号： B66C5/08 ,  B66C11/16 ,  B66C11/18 ,  B66C13/10 ,  B66C15/00 ,  B66C23/82

CPC分类号： B66C23/82

摘要： A crane has an elevation structure foldable at its intermediate portion, a rope extended along the structure and a rope support for supporting the rope. When the structure is folded and elevated, the rope support is moved to and held at a position near the point of folding of the structure. After the completion of straightening of the structure, the rope support is held at a position adjacent to the extreme end of the structure. A rope supporting apparatus for realizing this method includes an arrangement for mounting the rope support for movement along the structure, and a shifting driving mechanism mounted on the rope support and adapted to drive the rope support along the length of the structure.

摘要翻译： 起重机具有在其中间部分可折叠的高度结构，沿结构延伸的绳索和用于支撑绳索的绳索支撑件。 当结构被折叠和升高时，绳索支撑件移动并保持在靠近结构折叠点的位置。 在完成结构的矫直之后，绳索支撑件保持在与结构的最末端相邻的位置。 用于实现该方法的绳索支撑装置包括用于安装用于沿着结构移动的绳索支撑件的装置和安装在绳索支撑件上并适于沿着结构的长度驱动绳索支撑件的换档驱动机构。