公开(公告)号：US20050239984A1

公开(公告)日：2005-10-27

申请号：US10523492

申请日：2003-08-08

申请人： Andrew Feiring ,  Frank Schadt ,  Viacheslav Petrov ,  Bruce Smart ,  William Farnham

发明人： Andrew Feiring ,  Frank Schadt ,  Viacheslav Petrov ,  Bruce Smart ,  William Farnham

IPC分类号： C08F8/00 ,  C08F12/20 ,  C08F214/18 ,  C08F214/26 ,  C08F232/00 ,  C08F232/08 ,  G03F7/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC分类号： C08F214/26 ,  C08F214/18 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0395

摘要： The invention provides a polymer having (a) at least one repeat unit derived from an ethylenically unsaturated compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one repeat unit derived from an ethylenically unsaturated cyclic compound of structure: (I) wherein n is 0, 1, or 2; and R2 to R4 are independently H; C1-C10 alkyl or alkoxy, optionally substituted by halogen or ether oxygens; or C6-C20 aryl. These polymers can be used in making photoresist compositions and coated substrates.

摘要翻译： 本发明提供了一种聚合物，其具有（a）至少一种衍生自具有至少一个与烯属不饱和碳原子共价连接的氟原子的烯属不饱和化合物的重复单元; 和（b）衍生自以下结构的烯属不饱和环状化合物的至少一个重复单元：（I）其中n为0,1或2; R 2和R 4独立地是H; C 1 -C 10烷基或烷氧基，任选被卤素或醚氧取代; 或C 6 -C 20芳基。 这些聚合物可用于制备光致抗蚀剂组合物和涂覆的基材。

公开(公告)号：US20050037233A1

公开(公告)日：2005-02-17

申请号：US10774286

申请日：2004-02-06

申请人： Kerwin Dobbs ,  Norman Herron ,  Viacheslav Petrov

发明人： Kerwin Dobbs ,  Norman Herron ,  Viacheslav Petrov

IPC分类号： C07D213/68 ,  C07F15/00 ,  C09K11/06 ,  H01L51/00 ,  H01L51/30 ,  H01L51/50 ,  H05B33/14

CPC分类号： C09K11/06 ,  C09K2211/1029 ,  C09K2211/185 ,  H01L51/0085 ,  H01L51/5016 ,  Y10S428/917

摘要： The present invention is generally directed to electroluminescent Ir(III) compounds, the substituted 2-phenylpyridines that are used to make the Ir(III) compounds, and devices that are made with the Ir(III) compounds.

摘要翻译： 本发明一般涉及电致发光Ir（III）化合物，用于制备Ir（III）化合物的取代的2-苯基吡啶，以及用Ir（III）化合物制成的装置。

公开(公告)号：US20080027250A1

公开(公告)日：2008-01-31

申请号：US11880150

申请日：2007-07-20

申请人： Xuehui Sun ,  Mario Nappa ,  Velliyur Rao ,  Viacheslav Petrov ,  Ekaterina Swearingen ,  Nina Delyagina ,  Victor Cherstkov

发明人： Xuehui Sun ,  Mario Nappa ,  Velliyur Rao ,  Viacheslav Petrov ,  Ekaterina Swearingen ,  Nina Delyagina ,  Victor Cherstkov

IPC分类号： C07C17/007

CPC分类号： C07C17/278 ,  C07C19/08

摘要： A process is disclosed for making hydrohalopropanes or hydrofluorobutanes. The process involves reacting a hydrofluoromethane with a fluoroolefin in the presence of an aluminum catalyst to produce a hydrohalopropane or a hydrofluorobutane. The hydrofluoromethane is CH2F2 or CH3F. The fluoroolefin is CF2═CF2, ClFC═CF2, or CF3CF═CF2.

摘要翻译： 公开了制备氢卤丙烷或氢氟丁烷的方法。 该方法包括在铝催化剂存在下使氢氟甲烷与氟烯烃反应以产生氢卤丙烷或氢氟代丁烷。 氢氟甲烷是CH 2 2 F 2或CH 3 F。 氟烯烃是CF 2 -CF 2，ClFC-CF 2或CF 3 CF-CF _{2 。}

公开(公告)号：US20070167640A1

公开(公告)日：2007-07-19

申请号：US11726449

申请日：2007-03-22

申请人： Victor Cherstkov ,  Nina Delyagina ,  Viacheslav Petrov ,  Weiming Qiu ,  Paul Resnick

发明人： Victor Cherstkov ,  Nina Delyagina ,  Viacheslav Petrov ,  Weiming Qiu ,  Paul Resnick

IPC分类号： C07C331/00

CPC分类号： C07C303/22 ,  C07C17/093 ,  C07C21/18 ,  C07C43/17 ,  C07C253/16 ,  C07C255/10 ,  C07C305/26 ,  C08F14/28 ,  C08F214/18 ,  C07C309/82

摘要： Hexafluoroisobutylene and its higher homologs are easily reacted with SO3 to give fluorosulfates of the formula CH2═C(R)CF2OSO2F, wherein R is a linear branched or cyclic fluoroalkyl group comprised of 1 to 10 carbon atoms and may contain ether oxygen. These compounds react under mild conditions with many nucleophiles to give CH2═C(R)CF2X, where X is derived from the nucleophile. This reaction provides a route to many substituted hexafluoroisobutylenes, which copolymerize easily with other fluoro- and hydrocarbon monomers such as vinylidene fluoride and ethylene.

公开(公告)号：US20050191579A1

公开(公告)日：2005-09-01

申请号：US11113695

申请日：2005-04-25

申请人： Andrew Feiring ,  Viacheslav Petrov ,  Frank Schadt,

发明人： Andrew Feiring ,  Viacheslav Petrov ,  Frank Schadt,

IPC分类号： C08F216/16 ,  C08F224/00 ,  C08F232/04 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  G03C1/492

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395

摘要： The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an alkylene oxide, such as an oxetane group, substituted with one or more fluorinated alkyl groups. A specific example of a cyclic ester is a lactone which may be substituted with methyl groups. The photoresist composition further includes a photoactive component. The photoresist composition of this invention has a high transparency to ultraviolet radiation, particularly at short wavelengths such as 193 nm and 157 nm.

摘要翻译： 本发明涉及一种具有保护基和掺入环状化学结构的保护材料的光致抗蚀剂组合物。 在本发明中，保护材料具有环状醚基或环状酯基作为保护基。 环醚基的具体实例是被一个或多个氟化烷基取代的环氧烷，例如氧杂环丁烷基。 环酯的具体实例是可被甲基取代的内酯。 光致抗蚀剂组合物还包括光活性组分。 本发明的光致抗蚀剂组合物对紫外线辐射具有高透明度，特别是在短波长如193nm和157nm处。

公开(公告)号：US20050062021A1

公开(公告)日：2005-03-24

申请号：US10669403

申请日：2003-09-24

申请人： Viacheslav Petrov ,  Daniel Lecloux

发明人： Viacheslav Petrov ,  Daniel Lecloux

IPC分类号： B32B9/04 ,  C09K11/06 ,  C11D1/00 ,  C11D10/00 ,  H01B1/00 ,  H01L51/00 ,  H01L51/40

CPC分类号： H01L51/0007 ,  H01L51/0078 ,  H01L51/0081

摘要： The invention provides methods for the application of active materials onto active surfaces useful in organic electronic devices. The methods of the invention include selecting a liquid composition including an active material and a suitable liquid medium whereby when the liquid composition is deposited on the desired active surface it has no greater than about a 40° contact angle; treating the active surface to raise its surface tension before the deposition of a liquid composition containing the desired active material is deposited thereon; and combination thereof. The invention also provides organic electronic devices having at least two active layers, wherein at least one active layer comprises an active material that was deposited using at least one practice of the method of the invention.

公开(公告)号：US20050058932A1

公开(公告)日：2005-03-17

申请号：US10664303

申请日：2003-09-16

申请人： Andrew Feiring ,  Viacheslav Petrov ,  Frank Schadt

发明人： Andrew Feiring ,  Viacheslav Petrov ,  Frank Schadt

IPC分类号： C07C33/44 ,  C08F214/18 ,  C08F232/02 ,  G03C1/492 ,  G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0046 ,  C07C33/44 ,  C08F232/02 ,  G03F7/0395

摘要： There is disclosed a composition comprising a mixture of endo- and exo-2-(bicyclo[2.2.1]hept-5-en-2-yl)-2,2-fluoroalkyl-ethan-2-ol which is rich in the exo isomer, preferably the endo/exo concentration ratio is no greater than 5/95. The composition is useful for forming a repeat unit of a polymer which polymer may further comprise additional repeat units derived from tert-butyl acrylate, hydroxyadamantyl acrylate, protected or unprotected fluorinated olefins, 2-methyl-2-adamantyl acrylate, 2-propenoic acid, 2-hydroxy-1,1,2-trimethylpropyl ester. Polymers of this invention are useful as the binder component of a photoresist composition for microlithography.

摘要翻译： 公开了一种组合物，其包含内 - 和外-2-（二环[2.2.1]庚-5-烯-2-基）-2,2-氟烷基 - 乙-2-醇的混合物，其富含 外异构体，优选内/外浓度比不大于5/95。 该组合物可用于形成聚合物的重复单元，该聚合物可以进一步包含衍生自丙烯酸叔丁酯，丙烯酸羟基金刚烷基酯，被保护或未保护的氟化烯烃，丙烯酸2-甲基-2-金刚烷基酯，2-丙烯酸， 2-羟基-1,1,2-三甲基丙基酯。 本发明的聚合物可用作微光刻用光致抗蚀剂组合物的粘合剂组分。

公开(公告)号：US20070292713A9

公开(公告)日：2007-12-20

申请号：US10774286

申请日：2004-02-06

申请人： Kerwin Dobbs ,  Norman Herron ,  Viacheslav Petrov

发明人： Kerwin Dobbs ,  Norman Herron ,  Viacheslav Petrov

IPC分类号： H05B33/14 ,  C09K11/06

CPC分类号： C09K11/06 ,  C09K2211/1029 ,  C09K2211/185 ,  H01L51/0085 ,  H01L51/5016 ,  Y10S428/917

摘要： The present invention is generally directed to electroluminescent Ir(III) compounds, the substituted 2-phenylpyridines that are used to make the Ir(III) compounds, and devices that are made with the Ir(III) compounds.

摘要翻译： 本发明一般涉及电致发光Ir（III）化合物，用于制备Ir（III）化合物的取代的2-苯基吡啶，以及用Ir（III）化合物制成的装置。

公开(公告)号：US20070069185A1

公开(公告)日：2007-03-29

申请号：US11475715

申请日：2006-06-27

申请人： Che-Hsiung Hsu ,  Christopher Junk ,  Frank Uckert ,  Mark Teasley ,  Andrew Feiring ,  Charles Dubois ,  Zhen-Yu Yang ,  Viacheslav Petrov ,  Natalie Daoud ,  Amy Han

发明人： Che-Hsiung Hsu ,  Christopher Junk ,  Frank Uckert ,  Mark Teasley ,  Andrew Feiring ,  Charles Dubois ,  Zhen-Yu Yang ,  Viacheslav Petrov ,  Natalie Daoud ,  Amy Han

IPC分类号： H01B1/12

CPC分类号： H01B1/127 ,  C08L23/26 ,  C08L65/00 ,  C08L73/02 ,  C09D165/00 ,  C09D179/02 ,  H01B1/128 ,  C08L2666/04 ,  C08L27/00

摘要： There are provided electrically conducting polymer compositions comprising an electrically conductive polymer or copolymer and an organic solvent wettable fluorinated acid polymer. Electrically conductive polymer materials are derived from thiophene, pyrrole, aniline and polycyclic heteroaromatic precursor monomers. Non-conductive polymers derived from alkenyl, alkynyl, arylene, and heteroarylene precursor monomers. The organic-solvent wettable fluorinated acid polymer is fluorinated or highly fluorinated and may be colloid-forming. Acidic groups include carboxylic acid groups, sulfonic acid groups, sulfonimide groups, phosphoric acid groups, phosphonic acid groups, and combinations thereof. The compositions can be used in organic electronic devices.

摘要翻译： 提供了包含导电聚合物或共聚物和有机溶剂可湿性氟化酸聚合物的导电聚合物组合物。 导电聚合物材料衍生自噻吩，吡咯，苯胺和多环杂芳族前体单体。 衍生自烯基，炔基，亚芳基和亚杂芳基前体单体的非导电聚合物。 有机溶剂可湿性氟化酸聚合物是氟化的或高度氟化的，可以是胶体形成。 酸性基团包括羧酸基团，磺酸基团，磺酰亚胺基团，磷酸基团，膦酸基团及其组合。 组合物可用于有机电子器件。

公开(公告)号：US20060167284A1

公开(公告)日：2006-07-27

申请号：US10523489

申请日：2003-08-08

申请人： Andrew Feiring ,  Frank Schadt III ,  Viacheslav Petrov ,  Bruce Smart ,  William Farnham

发明人： Andrew Feiring ,  Frank Schadt III ,  Viacheslav Petrov ,  Bruce Smart ,  William Farnham

IPC分类号： C07D311/74 ,  C07D205/12

CPC分类号： G03F7/0046 ,  C07D205/12 ,  C07D305/14 ,  C07D493/10 ,  C08F232/08 ,  G03F7/0382 ,  G03F7/0395

摘要： The present invention provides novel fluorine-containing copolymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered heterocyclic ring and, optionally, other components. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The copolymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

摘要翻译： 本发明提供新的含氟共聚物，其包含至少一种氟化烯烃，至少一种具有稠合的4-元杂环的多环烯属不饱和单体和任选的其它组分。 共聚物可用于光成像组合物，特别是用于制造半导体器件的成像的光致抗蚀剂组合物（正性和/或负性）。 该共聚物特别可用于具有高UV透明度（特别是短波长，例如157nm）的光致抗蚀剂组合物，其可用作抗蚀剂中的潜在的许多其它应用中的基础树脂。