公开(公告)号：US20060141258A1

公开(公告)日：2006-06-29

申请号：US11252800

申请日：2005-10-19

Applicant: Yoshio Terada ,  Hirofumi Fujii ,  Makoto Namikawa ,  Daisuke Uenda ,  Yasuhiro Amano

Inventor： Yoshio Terada ,  Hirofumi Fujii ,  Makoto Namikawa ,  Daisuke Uenda ,  Yasuhiro Amano

IPC: B32B27/00

CPC classification number: B32B27/28 ,  B32B27/06 ,  B32B27/34 ,  B32B27/36 ,  B32B2307/31 ,  B32B2307/54 ,  B32B2432/00 ,  Y10T428/28 ,  Y10T428/2896 ,  Y10T428/31504 ,  Y10T428/31721

Abstract: The present invention provides a cleaning substrate of a substrate processing equipment, which comprises a cleaning layer comprising a heat resistant resin with a storage modulus (1 Hz) at 20° C. up to 150° C. being 5×107 Pa to 1×109 Pa on at least one face of the substrate; and a polyimide resin suitable as the heat resistant resin for the cleaning layer and usable under circumstances possibly involving the generation of serious disadvantages due to silicone contamination, such as for HDD application and some semiconductor applications.

Abstract translation: 本发明提供一种基板处理设备的清洁基板，其包括在20℃至150℃下具有储能模量（1Hz）的耐热树脂的清洁层，为5×10 7 / 在衬底的至少一个面上的SUP> Pa至1×10 9 Pa; 以及适合用作清洁层的耐热树脂的聚酰亚胺树脂，并且可用于可能涉及由于硅氧烷污染而产生严重缺点的环境，例如用于HDD应用和一些半导体应用。

公开(公告)号：US20060105164A1

公开(公告)日：2006-05-18

申请号：US11229586

申请日：2005-09-20

Applicant: Makoto Namikawa ,  Yoshio Terada ,  Jirou Nukaga ,  Eiji Toyoda ,  Hirofumi Fujii ,  Daisuke Uenda ,  Asami Funatsu ,  Nobuaki Maruoka ,  Hitoshi Ishizaka ,  Yasuhiro Amano

Inventor： Makoto Namikawa ,  Yoshio Terada ,  Jirou Nukaga ,  Eiji Toyoda ,  Hirofumi Fujii ,  Daisuke Uenda ,  Asami Funatsu ,  Nobuaki Maruoka ,  Hitoshi Ishizaka ,  Yasuhiro Amano

IPC: C23G1/00 ,  B08B7/00 ,  B32B27/04 ,  B32B7/12

CPC classification number: B08B1/00 ,  B08B7/00 ,  B08B7/0028 ,  C08G73/12 ,  C08G73/16 ,  C08J7/047 ,  C08J2409/00 ,  C08J2479/00 ,  G11B5/41 ,  Y10T428/28 ,  Y10T442/2738

Abstract: A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.

Abstract translation: 提供了一种用于清除离开基板处理设备内部的异物的清洁片。 清洁片包括基本上没有粘性并且根据JIS K7127测定的拉伸模量不低于0.98N / mm 2的清洁层。 或者，清洁片包括维氏硬度不低于10MPa的清洁层。