公开(公告)号：US20060048622A1

公开(公告)日：2006-03-09

申请号：US10517777

申请日：2004-03-30

申请人： Hiroyuki Araki

发明人： Hiroyuki Araki

IPC分类号： B26D1/00

CPC分类号： B65H35/0026 ,  B65H35/0066 ,  B65H35/0086 ,  B65H2403/40 ,  B65H2403/42 ,  B65H2553/22 ,  Y10T83/9447

摘要： The invention provides an improved electric tape cutter in which a pinion gear with an attached magnet that is connected to a drive source is embedded with a member having a weight equal to that of the magnet at a location that is symmetrical to the location at which the magnet is mounted, with respect to a center axis of rotation, imparting balanced rotation that enables eccentric rotation of the pinion gear to be prevented, preventing noise and apparatus malfunction. The electric tape cutter, which feeds a leading edge of adhesive tape wound on a reel from a delivery outlet and cuts it to an appropriate length with an electrically driven blade provided at the delivery outlet, has a configuration wherein, in order to prevent eccentric rotation of a pinion gear that has a magnet affixed thereto and is connected to a drive source, a fitted member of equal weight to the magnet is embedded in the pinion gear at a location that is symmetrical to the position at which the magnet is provided, with the axis of rotation of the pinion gear therebetween.

摘要翻译： 本发明提供了一种改进的电动带切割机，其中具有连接到驱动源的附接磁体的小齿轮嵌入具有与磁体重量相等的重量的构件，该构件在与 相对于中心旋转轴线安装磁体，赋予能够防止小齿轮偏心旋转的平衡旋转，防止噪音和设备故障。 电动带切割机具有如下配置：其中，为了防止偏心旋转，电动带切割器将从卷绕在出纸口上的胶带的前缘进给并将其切割成合适的长度， 具有固定到其上并连接到驱动源的磁体的小齿轮，与磁体相等重量的配合构件被嵌入在与设置磁体的位置对称的位置处的小齿轮中，与 其间的小齿轮的旋转轴线。

公开(公告)号：US4933103A

公开(公告)日：1990-06-12

申请号：US166880

申请日：1988-03-11

申请人： Muneo Aoyagi ,  Kazuhiro Takanashi ,  Hiroyuki Araki ,  Moriyasu Murata ,  Kohshiro Sotoya ,  Nobuyuki Ogura ,  Masaaki Yamamura

发明人： Muneo Aoyagi ,  Kazuhiro Takanashi ,  Hiroyuki Araki ,  Moriyasu Murata ,  Kohshiro Sotoya ,  Nobuyuki Ogura ,  Masaaki Yamamura

IPC分类号： C07C229/12 ,  C07C309/42 ,  C11D1/88 ,  C11D3/39

CPC分类号： C07C229/12 ,  C07C309/42 ,  C11D1/88 ,  C11D3/3927

摘要： A bleaching composition comprises a peroxide and an amphoteric organic per acid precursor. In particular the amphoteric organic per acid precursor is a quaternary ammonium salt has the following formula in which Z is sulfonate or carboxylate and is a new compound. ##STR1##

公开(公告)号：US08768721B2

公开(公告)日：2014-07-01

申请号：US12533878

申请日：2009-07-31

申请人： Hiroyuki Araki ,  Tatsuya Shiobara ,  Chieko Watanabe ,  Nobuaki Matsubara ,  Kazuhiro Akiyama ,  Hidenori Tsuruma ,  Tasuku Ogawa

发明人： Hiroyuki Araki ,  Tatsuya Shiobara ,  Chieko Watanabe ,  Nobuaki Matsubara ,  Kazuhiro Akiyama ,  Hidenori Tsuruma ,  Tasuku Ogawa

IPC分类号： G06Q10/00 ,  G06Q50/00 ,  A61B5/00 ,  G06F19/00

CPC分类号： G06Q50/22 ,  G06F19/00 ,  G06Q10/087 ,  G06Q10/1093 ,  G16H40/20

摘要： The examination schedule memory unit stores an examination schedule including the starting time and the ending time of each examination. A cleaning capacity memory unit stores cleaning-capacity information that specifies the cleaning capacity of cleaning apparatuses that clean a scope used for the examination. A cleaning schedule generation unit generates a cleaning schedule for cleaning a used scope produced at the end of each examination with cleaning apparatuses having a cleaning capacity required by the cleaning-capacity information stored in the cleaning capacity memory unit. The scope shortage determination unit determines whether or not there will be a shortage of scopes to be used for each examination in accordance with both the examination starting time specified by the above examination schedule and the cleaning ending time specified by the cleaning schedule.

摘要翻译： 检查时间表存储单元存储包括每次检查的开始时间和结束时间的检查时间表。 清洁能力存储单元存储清洁用于检查的清洁范围的清洁装置的清洁能力的清洁能力信息。 清洁进度生成单元生成用于清洁每次检查结束时产生的使用范围的清洁进度，其具有清洁能力存储单元中存储的清洁能力信息所需的清洁能力的清洁装置。 范围不足判定单元根据上述检查时间表规定的检查开始时间和由清洗进度指定的清洁结束时间两者，确定是否将缺少要用于每次检查的范围。

公开(公告)号：US08524009B2

公开(公告)日：2013-09-03

申请号：US13590694

申请日：2012-08-21

申请人： Hiroyuki Araki ,  Kentaro Tokuri

发明人： Hiroyuki Araki ,  Kentaro Tokuri

IPC分类号： B08B3/00

CPC分类号： B08B3/10 ,  H01L21/67028 ,  H01L21/67051

摘要： A substrate processing method comprising: holding a substrate substantially horizontally by a rotatable substrate holding mechanism; supplying a rinsing liquid onto the top of the substrate held by the substrate holding mechanism at the substrate holding step; after the rinsing liquid supply step, spraying a gas onto the top of the substrate held by the substrate holding mechanism, by a gas knife mechanism, to form a gas spraying zone on the substrate top, and unidirectionally scanning the substrate top in its entirety by this gas spraying zone, without rotating the substrate; replenishing the rinsing liquid by supplying, in parallel to the gas knife spraying step, a rinsing liquid onto the substrate top at its area downstream in the gas-spraying-zone scanning direction rather than the gas spraying zone formed by the gas knife mechanism; and drying the substrate surface after the gas knife spraying step and the rinsing liquid replenishing step.

摘要翻译： 一种基板处理方法，包括：通过可旋转的基板保持机构基本水平地保持基板; 在所述基板保持步骤中将冲洗液体供给到由所述基板保持机构保持的所述基板的顶部; 在冲洗液体供给步骤之后，通过气刀机构将气体喷射到由基板保持机构保持的基板的顶部上，以在基板顶部上形成气体喷射区域，并将其整体上的基板顶部单向扫描 该气体喷涂区域，不旋转基板; 通过在喷气区域扫描方向的下游区域的气体喷射区域的喷涂区域的气体喷射区域的气体喷射区域扫描方向上的基板顶部供给冲洗液体来补充冲洗液体; 以及在气刀喷涂步骤和冲洗液补充步骤之后干燥基板表面。

公开(公告)号：US08417548B2

公开(公告)日：2013-04-09

申请号：US13091833

申请日：2011-04-21

申请人： Hiroyuki Araki ,  Takashi Hosaka ,  Masakazu Omura ,  Yusuke Kato ,  Emiko Ouchi ,  Ryoichi Hosoya

发明人： Hiroyuki Araki ,  Takashi Hosaka ,  Masakazu Omura ,  Yusuke Kato ,  Emiko Ouchi ,  Ryoichi Hosoya

IPC分类号： G06Q50/00

CPC分类号： G06Q50/24 ,  G06F19/00 ,  G06F19/325 ,  G06Q50/22 ,  G16H50/70

摘要： A recording unit holds a plurality of examination data including the examination date of a performed examination. A search unit extracts examination data matching a set condition, of the plurality of examination data held in the recording unit. An output unit outputs a search result by the search unit. A first narrowing unit extracts examination data in which the examination date is included within a designated first period. A reference data determination unit classifies the examination data extracted by the first narrowing unit by an examinee and determines, for every examinee, one piece of the examination data to be a reference in accordance with a predetermined rule. A second narrowing unit sets, for every examinee, a second period designated in at least one of the past direction and the future direction starting from a reference date that is the examination date of the examination data determined by the reference data determination unit and extracts examination data in which the examination date is included within the second period.

摘要翻译： 记录单元保存包括执行检查的检查日期的多个检查数据。 搜索单元提取与保持在记录单元中的多个检查数据相匹配的设定条件的检查数据。 输出单元通过搜索单元输出搜索结果。 第一缩小单元提取在指定的第一周期内包括检查日期的检查数据。 参考数据确定单元将由第一变窄单元提取的检查数据分类为受检者，并且根据预定规则为每个受检者确定一个检查数据作为参考。 第二缩小单元针对每个受试者设定从作为由参考数据确定单元确定的检查数据的检查日期的参考日期开始的至少一个过去方向和未来方向指定的第二时段，并且提取检查 在第二期间内包含审查日期的数据。

公开(公告)号：US08277569B2

公开(公告)日：2012-10-02

申请号：US12161263

申请日：2006-01-17

申请人： Hiroyuki Araki ,  Kentaro Tokuri

发明人： Hiroyuki Araki ,  Kentaro Tokuri

IPC分类号： B08B3/00

CPC分类号： B08B3/10 ,  H01L21/67028 ,  H01L21/67051

摘要： A substrate processing apparatus and a substrate processing method are capable of restraining or preventing the generation of streaky particles on a substrate surface by excellent removal of a rinsing liquid therefrom. The substrate processing apparatus has a substrate inclining mechanism for inclining a substrate held by a substrate holding mechanism. After a rinsing liquid has been supplied onto a substrate to form a liquid mass, the substrate is inclined at a small angle by the substrate inclining mechanism. Then, the liquid mass is downwardly moved without being fragmented and then falls down without leaving minute droplets on the substrate top. Thereafter, the substrate is returned to a horizontal posture and then dried.

摘要翻译： 基板处理装置和基板处理方法能够通过从其中除去漂洗液而抑制或防止在基板表面上产生条纹颗粒。 基板处理装置具有用于使由基板保持机构保持的基板倾斜的基板倾斜机构。 在冲洗液已经被供给到基板上以形成液体块之后，基板通过基板倾斜机构以小角度倾斜。 然后，液体物质向下移动而不被分散，然后落下而不在基板顶部上留下微小的液滴。 此后，将基板返回到水平姿势，然后干燥。

公开(公告)号：US20080070418A1

公开(公告)日：2008-03-20

申请号：US11853231

申请日：2007-09-11

申请人： Masahiro Miyagi ,  Masanobu Sato ,  Hiroyuki Araki

发明人： Masahiro Miyagi ,  Masanobu Sato ,  Hiroyuki Araki

IPC分类号： B08B3/04 ,  H01L21/461

CPC分类号： H01L21/67051

摘要： A substrate processing apparatus has a cup part for receiving processing liquid which is applied from a processing liquid applying part and is splashed from a substrate, and the cup part is formed of electrical insulation material. Hydrophilic treatment is performed on an outer annular surface of the cup part and water is held on the outer annular surface of the cup part while processing the substrate. With this structure, charged potential of the cup part generated in splashing of pure water can be suppressed by the water held on the outer annular surface, without greatly increasing the manufacturing cost of the substrate processing apparatus by forming the cup part with special conductive material. As a result, it is possible to prevent electric discharge from occurring on the substrate due to induction charging of the substrate, in application of the processing liquid onto the substrate.

摘要翻译： 基板处理装置具有用于接收从处理液施加部施加并从基板溅出的处理液的杯部，杯部由电绝缘材料形成。 在杯部的外环形表面上进行亲水处理，并且在处理基板的同时将水保持在杯部的外环形表面上。 通过这种结构，通过保持在外环形表面上的水可以抑制在纯水溅出中产生的杯部分的带电电位，而不会通过用特殊导电材料形成杯部而大大增加基板处理装置的制造成本。 结果，可以在将处理液施加到基板上时防止由于基板的感应充电而在基板上发生放电。

公开(公告)号：US20050177394A1

公开(公告)日：2005-08-11

申请号：US10992388

申请日：2004-11-18

申请人： Ryoichi Hosoya ,  Nobuaki Matsubara ,  Hiroyuki Araki ,  Hideki Yasuda ,  Shinichi Omori ,  Masafumi Kobayashi ,  Yoshinori Matsumoto ,  Kazuyuki Inokihara

发明人： Ryoichi Hosoya ,  Nobuaki Matsubara ,  Hiroyuki Araki ,  Hideki Yasuda ,  Shinichi Omori ,  Masafumi Kobayashi ,  Yoshinori Matsumoto ,  Kazuyuki Inokihara

IPC分类号： A61B1/00 ,  A61B5/00 ,  G06F19/00 ,  G06Q50/22 ,  G06Q50/24 ,  G06F17/60

CPC分类号： G06Q50/22 ,  G16H15/00

摘要： An examination management system according to the present invention comprises implemented information input means for inputting implemented information including information related to a content of implementation of medical service, implemented regarding an examination and information related to a report about the medical service, implemented information storing means for storing the implemented information input by the implemented information input means, implemented information acquisition means for obtaining the implemented information related to the report from the implemented information storage means by using information indicating the same examination of the same patient matching a key, report comparison means for the comparison of a plurality of reports obtained by the implemented information acquisition means, and report comparison result display means for the display of the result of the comparison by the report comparison means.

摘要翻译： 根据本发明的检查管理系统包括：实现的信息输入装置，用于输入实现的信息，包括与关于检查实现的医疗服务的实现内容有关的信息以及与关于医疗服务的报告相关的信息;实现的信息存储装置， 存储由所实现的信息输入装置输入的所实现的信息，实现信息获取装置，用于通过使用指示与一个密钥相匹配的相同病人的相同检查的信息从所实现的信息存储装置中获得与该报告有关的实现信息;报告比较装置， 通过实施信息获取装置获得的多个报告的比较以及用于通过报告比较装置显示比较结果的报告比较结果显示装置。

公开(公告)号：US06092098A

公开(公告)日：2000-07-18

申请号：US121826

申请日：1998-07-24

申请人： Hiroyuki Araki ,  Kosuke Tatsukawa

发明人： Hiroyuki Araki ,  Kosuke Tatsukawa

IPC分类号： G06F15/17 ,  G06F9/46 ,  G06F13/00

CPC分类号： G06F9/544 ,  G06F9/461

摘要： Disclosed is a method for controlling a distributed-memory multiprocessor system having a plurality of nodes mutually connected by a network, each of the nodes having a CPU and a memory, and a plurality of user tasks which belong to the same application and are executed in different nodes, which method comprises the steps of: (a) assigning a transmission resource of a network interface in the node to a user task that will be executed next and starting the execution of the user task when a context switching operation is performed; (b) reading data written by the user task from the transmission resource, adding to the data a communication identifier that is assigned to an application to which the user task belongs and that identifies a data reception area, and transmitting the resultant data to a reception side node through the network, in the network interface of each transmission side node; and (c) selecting a data reception area for storing data received from another node from a plurality of data receiving areas on the basis of the communication identifier added to the received data and storing the received data in the selected data reception area, in the network interface of each reception side node.

摘要翻译： 公开了一种用于控制分布式存储器多处理器系统的方法，所述分布式存储器多处理器系统具有由网络相互连接的多个节点，每个节点具有CPU和存储器，以及属于相同应用程序并且被执行的多个用户任务 不同的节点，该方法包括以下步骤：（a）在执行上下文切换操作时，将节点中的网络接口的传输资源分配给将要执行的用户任务，并开始执行用户任务; （b）从所述传输资源读取由所述用户任务写入的数据，向所述数据添加分配给所述用户任务所属的应用的通信标识符，并且识别数据接收区域，并将所得到的数据发送到接收 侧节点通过网络，在每个传输侧节点的网络接口中; 以及（c）根据添加到所接收的数据的通信标识符，选择用于存储从多个数据接收区域中的从另一个节点接收的数据的数据接收区域，并将所接收的数据存储在所选择的数据接收区域中， 每个接收侧节点的接口。

公开(公告)号：US5275184A

公开(公告)日：1994-01-04

申请号：US779481

申请日：1991-10-18

申请人： Hisao Nishizawa ,  Yoshio Nomura ,  Hiroyuki Araki

发明人： Hisao Nishizawa ,  Yoshio Nomura ,  Hiroyuki Araki

IPC分类号： B08B3/10 ,  H01L21/00

CPC分类号： H01L21/67023 ,  B08B3/10 ,  Y10S134/902

摘要： A dipping type wafer treatment apparatus includes a treatment solution bath capable of forming a uniform rising flow of a treatment solution inside from an inlet to an outlet, a treatment solution supplying unit for supplying a treatment solution at a constant velocity to the inlet of the treatment solution bath to form a uniform rising flow of the treatment solution inside the treatment solution bath and a device for dipping and retrieving the wafer into and out of the uniform flow of the treatment solution. The treatment solution is supplied from the inlet in the treatment solution bath and drown off through an outlet of the treatment solution bath. Accordingly, the treatment solution can be rapidly substituted, and the wafers to no experience contact with air during replacement of the treatment solutions.

摘要翻译： 浸渍型晶片处理设备包括能够从入口到出口形成处理溶液的均匀上升流的处理溶液浴，将处理溶液以恒定速度供给到处理入口的处理溶液供给单元 溶液浴以在处理溶液浴中形成均匀的处理溶液的上升流，以及用于将晶片浸入和取出进入和流出处理溶液的均匀流动的装置。 处理溶液从处理溶液浴中的入口提供，并通过处理溶液浴的出口淹没。 因此，可以快速地替代处理溶液，并且在更换处理溶液期间晶片不经历与空气的接触。