公开(公告)号：US20070294309A1

公开(公告)日：2007-12-20

申请号：US11424901

申请日：2006-06-19

申请人： Larisa Shwartz ,  Maheswaran Surendra ,  Naga A. Ayachitula ,  Genady Grabarnik ,  James S. Lipscomb

发明人： Larisa Shwartz ,  Maheswaran Surendra ,  Naga A. Ayachitula ,  Genady Grabarnik ,  James S. Lipscomb

IPC分类号： G06F17/30

CPC分类号： H04L47/78 ,  G06F9/5061 ,  G06F17/30091 ,  G06F2209/5011 ,  H04L41/0893 ,  H04L67/104 ,  H04L67/1055 ,  H04L67/34

摘要： Embodiments of the present invention address deficiencies of the art in respect to server provisioning in a heterogeneous computing environment and provide a method, system and computer program product for secure and verified distributed orchestration and provisioning. In one embodiment of the invention, a server provisioning method can be provided. The server provisioning method can include establishing grouping criteria, grouping different target computing nodes into different groups of target computing nodes according to the established grouping criteria, server provisioning a root node in each of the different groups of target computing nodes, and relying upon the root node in each of the different groups to peer-to-peer server provision remaining nodes in each of the different groups.

摘要翻译： 本发明的实施例解决了在异构计算环境中关于服务器提供的本领域的缺点，并提供了用于安全和验证的分布式编排和供应的方法，系统和计算机程序产品。 在本发明的一个实施例中，可以提供服务器配置方法。 服务器配置方法可以包括建立分组标准，根据建立的分组标准将不同目标计算节点分组到不同的目标计算节点组，服务器在目标计算节点的不同组中的每一个中提供根节点，并依赖于根 节点在每个不同的组中，以对等服务器提供每个不同组中的剩余节点。

公开(公告)号：US20060267208A1

公开(公告)日：2006-11-30

申请号：US11405283

申请日：2006-04-17

申请人： Matthew Colburn ,  Timothy Dalton ,  Elbert Huang ,  Simon Karecki ,  Satya Nitta ,  Sampath Purushothaman ,  Katherine Saenger ,  Maheswaran Surendra

发明人： Matthew Colburn ,  Timothy Dalton ,  Elbert Huang ,  Simon Karecki ,  Satya Nitta ,  Sampath Purushothaman ,  Katherine Saenger ,  Maheswaran Surendra

IPC分类号： H01L23/48 ,  H01L21/4763

CPC分类号： H01L21/76807 ,  H01L21/7682 ,  H01L23/5222 ,  H01L23/53238 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method to form a closed air gap interconnect structure is described. A starting structure made of regions of a permanent support dielectric under the interconnect lines and surrounding interconnect vias with one or more sacrificial dielectrics present in the remaining portions of the interconnect structure, is capped with a dielectric barrier which is perforated using a stencil with a regular array of holes. The sacrificial dielectrics are then extracted through the holes in the dielectric barrier layer such that the interconnect lines are substantially surrounded by air except for the regions of the support dielectric under the lines. The holes in the cap layer are closed off by depositing a second barrier dielectric so that a closed air gap is formed. Several embodiments of this method and the resulting structures are described.

摘要翻译： 描述了形成闭合气隙互连结构的方法。 在互连线下方由永久支撑电介质的区域构成的起始结构和在互连结构的其余部分中存在的具有一个或多个牺牲电介质的周围的互连通孔被封装有电介质阻挡层，其使用具有规则的模板 孔阵列 然后通过电介质阻挡层中的孔提取牺牲电介质，使得互连线基本上被除了线下方的支撑电介质的区域之外的空气包围。 通过沉积第二阻挡电介质来封闭盖层中的孔，从而形成封闭的气隙。 描述该方法的几个实施例和所得到的结构。

公开(公告)号：US07056782B2

公开(公告)日：2006-06-06

申请号：US10786901

申请日：2004-02-25

申请人： Ricky S. Amos ,  Diane C. Boyd ,  Cyril Cabral, Jr. ,  Richard D. Kaplan ,  Jakub T. Kedzierski ,  Victor Ku ,  Woo-Hyeong Lee ,  Ying Li ,  Anda C. Mocuta ,  Vijay Narayanan ,  An L. Steegen ,  Maheswaran Surendra

发明人： Ricky S. Amos ,  Diane C. Boyd ,  Cyril Cabral, Jr. ,  Richard D. Kaplan ,  Jakub T. Kedzierski ,  Victor Ku ,  Woo-Hyeong Lee ,  Ying Li ,  Anda C. Mocuta ,  Vijay Narayanan ,  An L. Steegen ,  Maheswaran Surendra

IPC分类号： H01L21/8238

CPC分类号： H01L21/76897 ,  H01L21/28052 ,  H01L21/28097 ,  H01L21/823835 ,  H01L29/66545 ,  H01L29/6656

摘要： The present invention provides a complementary metal oxide semiconductor integration process whereby a plurality of silicided metal gates are fabricated atop a gate dielectric. Each silicided metal gate that is formed using the integration scheme of the present invention has the same silicide metal phase and substantially the same height, regardless of the dimension of the silicide metal gate. The present invention also provides various methods of forming a CMOS structure having silicided contacts in which the polySi gate heights are substantially the same across the entire surface of a semiconductor structure.

公开(公告)号：US06584368B2

公开(公告)日：2003-06-24

申请号：US10245461

申请日：2002-09-17

申请人： Raymond J. Bunkofske ,  John Z. Colt, Jr. ,  James J. McGill ,  Nancy T. Pascoe ,  Maheswaran Surendra ,  Marc A. Taubenblatt ,  Asif Ghias

发明人： Raymond J. Bunkofske ,  John Z. Colt, Jr. ,  James J. McGill ,  Nancy T. Pascoe ,  Maheswaran Surendra ,  Marc A. Taubenblatt ,  Asif Ghias

IPC分类号： G05B1500

CPC分类号： G05B23/0221 ,  G05B2219/45031 ,  H01L22/20

摘要： A method and structure for controlling a manufacturing tool includes measuring different manufacturing parameters of the tool, transforming a plurality of time series of the manufacturing parameters into intermediate variables based on restrictions and historical reference statistics, generating a surrogate variable based on the intermediate variables, if the surrogate variable exceeds a predetermined limit, identifying a first intermediate variable, of the intermediate variables, that caused the surrogate variable to exceed the predetermined limit and identifying a first manufacturing parameter associated with the first intermediate variable, and inhibiting further operation of the tool until the first manufacturing parameter has been modified to bring the surrogate value within the predetermined limit.

公开(公告)号：US06528363B2

公开(公告)日：2003-03-04

申请号：US09811707

申请日：2001-03-19

申请人： Victor Ku ,  Maheswaran Surendra ,  Len Tsou ,  Ying Zhang

发明人： Victor Ku ,  Maheswaran Surendra ,  Len Tsou ,  Ying Zhang

IPC分类号： H01L21336

CPC分类号： H01L29/42376 ,  H01L21/28114

摘要： A method of forming a notched gate structure having substantially vertical sidewalls and a sub-0.05 &mgr;m electrical critical dimension is provided. The method includes forming a conductive layer on an insulating layer; forming a mask on the conductive layer so as to at least protect a portion of the conductive layer; anisotropically etching the conductive layer not protected by the mask so as to thin the conductive layer to a predetermined thickness and to form a conductive feature underlying the mask, the conductive feature having substantially vertical sidewalls; forming a passivating layer at least on the substantially vertical sidewalls; and isotropically etching remaining conductive layer not protected by the mask to remove the predetermined thickness thereby exposing a lower portion of said conductive feature not containing the passivating layer, while simultaneously removing notched regions in the lower portion of the conductive feature.

公开(公告)号：US08386995B2

公开(公告)日：2013-02-26

申请号：US11763726

申请日：2007-06-15

申请人： David Wiley Coleman ,  Steven E. Froehlich ,  Joseph L. Hellerstein ,  Lawrence S. Hsiung ,  Edwin Richie Lassettre ,  Todd William Mummert ,  Mukund Raghavachari ,  Lance Warren Russell ,  Maheswaran Surendra ,  Noshir Cavas Wadia ,  Peng Ye

发明人： David Wiley Coleman ,  Steven E. Froehlich ,  Joseph L. Hellerstein ,  Lawrence S. Hsiung ,  Edwin Richie Lassettre ,  Todd William Mummert ,  Mukund Raghavachari ,  Lance Warren Russell ,  Maheswaran Surendra ,  Noshir Cavas Wadia ,  Peng Ye

IPC分类号： G06F9/44

CPC分类号： G06F11/008

摘要： Automated or autonomic techniques for managing deployment of one or more resources in a computing environment based on varying workload levels. The automated techniques may comprise predicting a future workload level based on data associated with the computing environment. Then, an estimation is performed to determine whether a current resource deployment is insufficient, sufficient, or overly sufficient to satisfy the future workload level. Then, one or more actions are caused to be taken when the current resource deployment is estimated to be insufficient or overly sufficient to satisfy the future workload level. Actions may comprise resource provisioning, resource tuning and/or admission control.

摘要翻译： 用于根据不同的工作负载水平管理计算环境中的一个或多个资源的部署的自动或自主技术。 自动化技术可以包括基于与计算环境相关联的数据预测未来的工作负载水平。 然后，执行估计以确定当前资源部署是否不充足，足够或过度足以满足未来的工作负载水平。 然后，当估计当前资源部署不足够或过度足以满足未来的工作负载级别时，会采取一个或多个动作。 动作可以包括资源调配，资源调整和/或准入控制。

公开(公告)号：US20080208792A1

公开(公告)日：2008-08-28

申请号：US11679999

申请日：2007-02-28

申请人： Glenn C. Aikens ,  Melissa Jane Buco ,  Maheswaran Surendra ,  Christopher Ward ,  Steve Weinberger ,  Sam Shixiong Yang

发明人： Glenn C. Aikens ,  Melissa Jane Buco ,  Maheswaran Surendra ,  Christopher Ward ,  Steve Weinberger ,  Sam Shixiong Yang

IPC分类号： G06F17/30

CPC分类号： H04L41/085

摘要： Techniques for managing a plurality of configuration items in an information repository are provided. Lifecycle state transitions of the plurality of configuration items are regulated in accordance with one or more lifecycle state transition diagrams and, when a life cycle state transition involves a protected life cycle state, one or more request for change identifiers.

摘要翻译： 提供了用于管理信息库中的多个配置项的技术。 根据一个或多个生命周期状态转换图来调节多个配置项的生命周期状态转换，并且当生命周期状态转换涉及受保护的生命周期状态时，对变化标识符进行一个或多个请求。

公开(公告)号：US20080168436A1

公开(公告)日：2008-07-10

申请号：US11669781

申请日：2007-01-31

申请人： Larisa Shwartz ,  Genady Grabarnik ,  Maheswaran Surendra ,  Naga A. Ayachitula

发明人： Larisa Shwartz ,  Genady Grabarnik ,  Maheswaran Surendra ,  Naga A. Ayachitula

IPC分类号： G06F9/445

CPC分类号： G06F8/61

摘要： A system and method for provisioning software on a plurality of computational nodes in a distributed computing environment. A plurality of support processing requirements associated with a software product is accepted. The plurality of requirements is expanded into multiple sets of installation requirements. At least one set of installation requirements in the multiple sets of installation requirements are minimized to produce at least one minimized set of installation requirements. A determination is made as to whether any pair of requirements in the minimized set of installation requirements includes a pair of conflicting requirements. A determination of whether the software product allows each requirement in the pair of conflicting requirements to be located on separate nodes is also made. At least one multi-node installation topology is determined for the software product. The multi-node installation topology includes a plurality of installation requirement sets for each node in the multi-node installation topology.

摘要翻译： 一种用于在分布式计算环境中的多个计算节点上配置软件的系统和方法。 接受与软件产品相关联的多个支持处理要求。 多项要求扩展到多套安装要求。 在多组安装要求中至少有一组安装要求最小化，以产生至少一组最小化的安装要求。 确定最小化安装要求中的任何一对要求是否包含一对冲突的要求。 还确定软件产品是否允许该对冲突要求中的每个需求位于单独的节点上。 为软件产品确定至少一个多节点安装拓扑。 多节点安装拓扑包括多节点安装拓扑中每个节点的多个安装要求集。

公开(公告)号：US20080005186A1

公开(公告)日：2008-01-03

申请号：US11478745

申请日：2006-06-30

申请人： Naga A. Ayachitula ,  Krishna S. Garimella ,  Yan Or ,  Larisa Shwartz ,  Maheswaran Surendra

发明人： Naga A. Ayachitula ,  Krishna S. Garimella ,  Yan Or ,  Larisa Shwartz ,  Maheswaran Surendra

IPC分类号： G06F17/30

CPC分类号： H04L41/0856 ,  G06Q10/06 ,  H04L41/0233 ,  H04L41/0843 ,  H04L41/085 ,  H04L41/22

摘要： Methods and apparatus of managing a CMDB are provided. At least one composite CI is utilized in the CMDB. The at least one composite CI is represented as a graph of navigable relationships between one or more supporting elements in accordance with a template. The one or more supporting elements comprise at least a root element of the composite CI.

摘要翻译： 提供了管理CMDB的方法和设备。 在CMDB中使用至少一个复合CI。 至少一个复合CI被表示为根据模板的一个或多个支撑元件之间的可导航关系的图表。 一个或多个支撑元件至少包括复合CI的根元件。

公开(公告)号：US20060112075A1

公开(公告)日：2006-05-25

申请号：US10993269

申请日：2004-11-19

申请人： Joseph Hellerstein ,  Kaan Katircioglu ,  Maheswaran Surendra

发明人： Joseph Hellerstein ,  Kaan Katircioglu ,  Maheswaran Surendra

IPC分类号： G06F17/30

CPC分类号： G06Q10/06 ,  Y10S707/99933 ,  Y10S707/99935 ,  Y10S707/99943

摘要： Techniques are provided for use in accordance with relates to computing utilities. For example, in one aspect of the invention, a method for use in a computing utility, wherein the computing utility comprises a plurality of application service provider systems and a utility controller, and each application service provider system comprising an application controller, comprises the following steps. An application request to one of the plurality of application service provider systems is obtained. Then, in response to the application request, at least one of: (i) the application controller of the application service provider system to which the application request is directed computes a value of a business metric associated with a resource action; and (ii) the utility controller computes a value of a business metric associated with a resource action.

摘要翻译： 根据与计算实用程序有关的技术被提供用于使用。 例如，在本发明的一个方面，一种在计算实用程序中使用的方法，其中所述计算实用程序包括多个应用服务提供者系统和效用控制器，并且包括应用控制器的每个应用服务提供商系统包括以下 脚步。 获得对多个应用服务提供商系统之一的应用请求。 然后，响应于所述应用请求，至少一个：（i）应用请求所针对的应用服务提供商系统的应用控制器计算与资源动作相关联的业务度量的值; 和（ii）公用事业控制器计算与资源动作相关联的业务度量的值。