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公开(公告)号：US08722306B2
公开(公告)日：2014-05-13
申请号：US12602769
申请日：2008-05-26
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译： 辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。 辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。 其中R1，R2和R3分别表示碳原子数为1〜4的直链或支链烷基，R4表示氢原子，碳原子数2〜4的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。
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公开(公告)号：US08580482B2
公开(公告)日：2013-11-12
申请号：US13338569
申请日：2011-12-28
申请人： Takashi Chiba , Toru Kimura , Tomohiro Utaka , Hiroki Nakagawa , Hirokazu Sakakibara , Hiroshi Dougauchi
发明人： Takashi Chiba , Toru Kimura , Tomohiro Utaka , Hiroki Nakagawa , Hirokazu Sakakibara , Hiroshi Dougauchi
CPC分类号： G03F7/11 , C08F220/18 , C08F220/26 , C08F220/38 , C08F228/00 , G03F7/2041
摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.
摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。
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公开(公告)号：US20120045719A1
公开(公告)日：2012-02-23
申请号：US13288963
申请日：2011-11-04
CPC分类号： C07C65/10 , C08F8/12 , C08F12/22 , C08F212/14 , C09D125/18 , G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/122 , Y10S430/126 , C08F2220/1891 , C08F220/18
摘要： A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, and a compound shown by the following general formula (1). wherein Z− represents a monovalent anion shown by a general formula (2), M+ represents a monovalent onium cation, R1 represents a linear or branched alkyl group having 1 to 12 carbon atoms substituted or unsubstantiated with a fluorine atom, or a linear or branched alkoxy group having 1 to 12 carbon atoms, and n is 1 or 2.
摘要翻译： 辐射敏感性树脂组合物包含含酸解离基团的树脂和由以下通式（1）表示的化合物。 其中Z-表示由通式（2）表示的一价阴离子，M +表示一价鎓阳离子，R1表示碳原子数1〜12的被氟原子取代或未取代的直链或支链烷基，或直链或支链 具有1至12个碳原子的烷氧基，n为1或2。
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公开(公告)号：US20100178608A1
公开(公告)日：2010-07-15
申请号：US12602769
申请日：2008-05-26
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译： 辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。 辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。 其中R1，R2和R3分别代表具有1-4个碳原子的直链或支链烷基，R4代表氢原子，具有2至4个碳原子的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。
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