摘要:
Embodiments of the invention relate to a resin composition, in particular suitable for printing, a kit comprising components of the resin composition, printing methods, a polymer obtained by the printing methods, an article comprising or formed from the polymer, uses thereof, and a composition. The resin composition comprises at least one compound C1 having at least one terminal alkyne functional group; at least one compound C2 having at least two thiol functional groups; at least one compound C3 having at least one carbon-carbon double bond; at least one photoinitiator; and at least one stabilizer.
摘要:
A hydrogel comprising water, a gel strength improving agent, and a polymer matrix containing the water and the gel strength improving agent, in which the polymer matrix includes a copolymer of a monofunctional monomer having one ethylenically unsaturated group and a polyfunctional monomer having 2 to 6 ethylenically unsaturated groups, the copolymer has a hydrophilic group binding to its main chain, and the hydrogel has a breaking strength of 5 kPa or more and a breaking elongation of 200% or more in a tensile test.
摘要:
A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer.
摘要:
The present invention is a process for preparing a multistage polymer by contacting under emulsion polymerization conditions an acrylic monomer, a sulfur acid monomer, and a phosphorous acid monomer as described herein. The present invention is also a composition comprising a nonionic surfactant and a stable aqueous dispersion of polymer particles comprising structural units of butyl acrylate, methyl methacrylate, a sodium vinylbenzenesulfonate, and phosphoethyl methacrylate; wherein the polymer particles have a Tg of less than 10° C. The composition of the present invention is useful as a binder for coatings compositions.
摘要:
A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.
摘要:
A method of preparing a monomer comprises reacting a sultone of the formula (I): wherein each R is independently F, C1-10 alkyl, fluoro-substituted C1-10 alkyl, C1-10 cycloalkyl, or fluoro-substituted C1-10 cycloalkyl, provided that at least one R is F; n is an integer of from 0 to 10, and m is an integer of 1 to 4+2n, with a nucleophile having a polymerizable group. Monomers, including a photoacid-generating monomer, may be prepared by this method.
摘要:
An adhesive composition for metals including an unsaturated thiirane compound having at least one thiirane group bonded with a saturated carbon atom and having at least one olefin-type double bond is provided. The composition is useful for adhesion of noble metals or noble metal alloys.
摘要:
A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).
摘要:
The present invention is a process for preparing a multistage polymer by contacting under emulsion polymerization conditions an acrylic monomer, a sulfur acid monomer, and a phosphorous acid monomer as described herein. The multistage polymer is useful as a binder for coatings compositions.
摘要:
A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer.