摘要:
A method of dispatching wafer lots through a plurality of process chambers, wherein the process chambers are disposed in at least one machine. The method includes: receiving wafer lot information and process chamber data, wherein the wafer lot information identifies the wafer lots to be processed at the machine, and the process chamber data includes process information associated with the process chambers; determining a load factor of each process chamber based on the wafer lot information and process chamber data; receiving historical data of run lots previously processed through the process chambers, and determining a processing time of the wafer lots based on the historical data; generating a dispatching criteria for the wafer lots based on the load factors of the process chambers and the determined processing time of the wafer lots; and dispatching the wafer lots through the process chambers based on the dispatching criteria.
摘要:
Disclosed is a method of controlling a manufacturing system. The invention automatically monitors current levels of partially completed products waiting to be processed by a tool (or group of tools) and determines whether the current levels exceed a predetermined limit. If the current levels do exceed the predetermined limit, the invention performs an optimization process. However, if the current levels do not exceed the predetermined limit, the invention performs a dispatching process. In this dispatching process, the invention automatically projects future levels of partially completed products that will be supplied to the tool to identify a future work-in-process (WIP) bubble. The WIP bubble occurs when larger than normal amounts of partially completed products are supplied to the tool. The invention automatically adjusts the operating parameters of the tool based upon both the current levels and the future levels.
摘要:
Disclosed is a method of controlling a manufacturing system. The invention automatically monitors current levels of partially completed products waiting to be processed by a tool (or group of tools) and determines whether the current levels exceed a predetermined limit. If the current levels do exceed the predetermined limit, the invention performs an optimization process. However, if the current levels do not exceed the predetermined limit, the invention performs a dispatching process. In this dispatching process, the invention automatically projects future levels of partially completed products that will be supplied to the tool to identify a future work-in-process (WIP) bubble. The WIP bubble occurs when larger than normal amounts of partially completed products are supplied to the tool. The invention automatically adjusts the operating parameters of the tool based upon both the current levels and the future levels.
摘要:
Disclosed is a method of controlling a manufacturing system. The invention automatically monitors current levels of partially completed products waiting to be processed by a tool (or group of tools) and determines whether the current levels exceed a predetermined limit. If the current levels do exceed the predetermined limit, the invention performs an optimization process. However, if the current levels do not exceed the predetermined limit, the invention performs a dispatching process. In this dispatching process, the invention automatically projects future levels of partially completed products that will be supplied to the tool to identify a future work-in-process (WIP) bubble. The WIP bubble occurs when larger than normal amounts of partially completed products are supplied to the tool. The invention automatically adjusts the operating parameters of the tool based upon both the current levels and the future levels.
摘要:
The present invention is generally directed to various methods and systems for dynamically controlling metrology work in progress. In one illustrative embodiment, the method comprises providing a metrology control unit that is adapted to control metrology work flow to at least one metrology tool, identifying a plurality of wafer lots that are in a metrology queue wherein the wafer lots are intended to be processed in at least one metrology tool, and wherein the metrology control unit selects at least one of the wafer lots for metrology processing in the at least one metrology tool and selects at least one other of the plurality of wafer lots to be removed from the metrology queue based upon the metrology processing of the selected at least one wafer lot in the at least one metrology tool.
摘要:
Disclosed is a method of controlling a manufacturing system. The invention automatically monitors current levels of partially completed products waiting to be processed by a tool (or group of tools) and determines whether the current levels exceed a predetermined limit. If the current levels do exceed the predetermined limit, the invention performs an optimization process. However, if the current levels do not exceed the predetermined limit, the invention performs a dispatching process. In this dispatching process, the invention automatically projects future levels of partially completed products that will be supplied to the tool to identify a future work-in-process (WIP) bubble. The WIP bubble occurs when larger than normal amounts of partially completed products are supplied to the tool. The invention automatically adjusts the operating parameters of the tool based upon both the current levels and the future levels.
摘要:
A system for dispatching a plurality of semiconductor lots among a plurality of tools is provided. The system includes a dispatch server manager and a dispatch integrator and display device. The dispatch integrator and display device conveys a dispatch request to the manager and receives a dispatch list from the manager. The manager queries for a processing status of the plurality of semiconductor lots and displays a dispatch list in response to the processing status. The dispatch list includes an associated reason and/or code related to the processing status.
摘要:
A method to handle operation exceptions in an automated manufacturing system is achieved. The method comprises providing an automated manufacturing system comprising a means to track progress of work in process against standard process flows and a means to select product lots for processing from the work in process and to select equipment for processing the product lots based on next step information from the standard process flows. The automated manufacturing system is monitored for operation exception events. The product lots must deviate from the standard process flows. A floating process flow is selected corresponding to the operation exception event and the product lots from a floating process flow database. The floating process flow is linked to the standard process flow such that the next step is derived from the floating process flow. Manufacturing is continued using the floating process flow. The floating process flow is unlinked from the standard process flow such that the next step is derived from the standard process flow when the floating process flow is completed. A control system apparatus for handling operation exceptions in an automated manufacturing plant is achieved.
摘要:
A wafer cluster tool is described which operates in a regular, periodic fashion. Embodiments of the invention have a periodicity of one sending period. The invention enables the determination of pick-up times for process chambers in the cluster tool, and embodiments of the invention allow the creation and maintenance of an updated timetable. The timetable indicates times when each of the process chambers is to be serviced. These values are updated as the process chambers receive new wafers. Robots in the cluster tool may pre-position themselves in front of modules, or process chambers, to be served. Robot pre-positioning eliminates the wait time of individual modules beyond queue times which have been pre-determined for the modules. This renders the path of the individual robots pre-deterministic, and enables the cluster tool to utilize single gripper robots.
摘要:
A method to handle operation exceptions in an automated manufacturing system is achieved. The method comprises providing an automated manufacturing system comprising a means to track progress of work in process against standard process flows and a means to select product lots for processing from the work in process and to select equipment for processing the product lots based on next step information from the standard process flows. The automated manufacturing system is monitored for operation exception events. The product lots must deviate from the standard process flows. A floating process flow is selected corresponding to the operation exception event and the product lots from a floating process flow database. The floating process flow is linked to the standard process flow such that the next step is derived from the floating process flow. Manufacturing is continued using the floating process flow. The floating process flow is unlinked from the standard process flow such that the next step is derived from the standard process flow when the floating process flow is completed. A control system apparatus for handling operation exceptions in an automated manufacturing plant is achieved.