公开(公告)号：US07076321B2

公开(公告)日：2006-07-11

申请号：US10958891

申请日：2004-10-05

申请人： Matthew A. Purdy

发明人： Matthew A. Purdy

IPC分类号： G06F19/00 ,  G05B21/02

CPC分类号： H01L22/20

摘要： The present invention is generally directed to various methods and systems for dynamically adjusting metrology sampling based upon available metrology capacity. In one illustrative embodiment, the method comprises providing a metrology control unit that is adapted to determine a baseline metrology sampling rate for at least one metrology operation, determining available metrology capacity, and providing the determined available metrology capacity to the metrology control unit wherein the metrology control unit determines a new metrology sampling rate based upon the determined available metrology capacity.

摘要翻译： 本发明一般涉及用于基于可用的测量能力来动态地调整计量取样的各种方法和系统。 在一个说明性实施例中，该方法包括提供一个度量控制单元，其适于确定用于至少一个测量操作的基准测量采样率，确定可用的测量能力，以及将所确定的可用测量能力提供给度量控制单元，其中计量学 控制单元基于确定的可用测量能力来确定新的测量采样率。

公开(公告)号：US06988045B2

公开(公告)日：2006-01-17

申请号：US10634013

申请日：2003-08-04

申请人： Matthew A. Purdy

发明人： Matthew A. Purdy

IPC分类号： G06F19/00

CPC分类号： H01L22/20 ,  H01L2924/0002 ,  Y02P90/14 ,  H01L2924/00

摘要： The present invention is generally directed to various methods and systems for adaptive metrology sampling plans that may be employed to monitor various manufacturing processes. In one example, the method includes creating a plurality of metrology sampling rules, assigning each of the metrology sampling rules a sampling weight value, identifying at least one workpiece that satisfies at least one of the metrology sampling rules, assigning the sampling weight value for each of the satisfied metrology sampling rules with the identified workpieces that satisfy the rules, and indicating a metrology operation should be performed when a cumulative total of the sampling weight values is at least equal to a pre-established trigger value.

摘要翻译： 本发明一般涉及可用于监测各种制造过程的自适应测量采样计划的各种方法和系统。 在一个示例中，该方法包括创建多个计量采样规则，将每个测量采样规则分配给采样权重值，识别满足至少一个计量采样规则的至少一个工件，为每个 满足计量采样规则的识别工件满足规则，并且当采样权重值的累积总和至少等于预先建立的触发值时，应当执行计量操作。

公开(公告)号：US06912436B1

公开(公告)日：2005-06-28

申请号：US10261156

申请日：2002-09-30

申请人： Gary Jones ,  Christopher A. Bode ,  Richard D. Edwards ,  Matthew A. Purdy

发明人： Gary Jones ,  Christopher A. Bode ,  Richard D. Edwards ,  Matthew A. Purdy

IPC分类号： G05B13/04 ,  G06F19/00

CPC分类号： G05B13/042

摘要： A method and an apparatus for selectively applying correction to a process control. Manufacturing data relating to the processing of a workpiece is acquired. The manufacturing data includes metrology data relating to the processed workpiece. An adjustment for at least a first or a second control input parameter is determined based upon the manufacturing data. The first and second control input parameters are organized to isolate the first control input parameter from the second control input parameter for adjusting at least one of the first and the second control input parameters, using a controller.

摘要翻译： 一种用于选择性地对过程控制应用校正的方法和装置。 获取与工件的处理有关的制造数据。 制造数据包括与加工的工件相关的计量数据。 基于制造数据确定至少第一或第二控制输入参数的调整。 组织第一和第二控制输入参数以将第一控制输入参数与第二控制输入参数隔离，以使用控制器调整第一和第二控制输入参数中的至少一个。

公开(公告)号：US07715941B1

公开(公告)日：2010-05-11

申请号：US10980407

申请日：2004-11-03

申请人： Matthew A. Purdy

发明人： Matthew A. Purdy

IPC分类号： G06F19/00

CPC分类号： G05B19/41865 ,  G05B2219/32254 ,  G05B2219/32266 ,  G05B2219/45031 ,  Y02P90/20

摘要： The present invention provides a method and apparatus for scheduling a plurality of processing tools. The method comprises providing a first processing tool and a plurality of second processing tools, selecting one of the plurality of second processing tools, and determining a target output parameter of a combination of processing tools comprising said first processing tool and said selected one of the plurality of second processing tools. The method also includes determining at least one input parameter of a process model for controlling the first processing tool based upon the target output parameter of the combination of processing tools.

摘要翻译： 本发明提供一种用于调度多个处理工具的方法和装置。 该方法包括提供第一处理工具和多个第二处理工具，选择多个第二处理工具中的一个，以及确定包括所述第一处理工具和所述多个第二处理工具中的所选择的一个的处理工具的组合的目标输出参数 的第二处理工具。 该方法还包括基于处理工具的组合的目标输出参数来确定用于控制第一处理工具的过程模型的至少一个输入参数。

公开(公告)号：US07299106B1

公开(公告)日：2007-11-20

申请号：US11109298

申请日：2005-04-19

申请人： Cabe W. Nicksic ,  Matthew A. Purdy

发明人： Cabe W. Nicksic ,  Matthew A. Purdy

IPC分类号： G06F19/00

CPC分类号： G05B19/41875 ,  G05B2219/32225 ,  G05B2219/45031 ,  Y02P90/20 ,  Y02P90/22

摘要： The present invention provides a method that includes determining a jeopardy count associated with at least one processing tool and selecting at least one wafer based upon the jeopardy count, the at least one wafer having been processed by the at least one processing tool.

摘要翻译： 本发明提供了一种方法，其包括确定与至少一个处理工具相关联的危险计数，并且基于危险计数选择至少一个晶片，所述至少一个晶片已被所述至少一个处理工具处理。

公开(公告)号：US07296103B1

公开(公告)日：2007-11-13

申请号：US10958834

申请日：2004-10-05

申请人： Matthew A. Purdy ,  Cabe W. Nicksic

发明人： Matthew A. Purdy ,  Cabe W. Nicksic

IPC分类号： G06F19/00 ,  G05B21/02 ,  G05B13/04 ,  G05B17/02

CPC分类号： G05B19/41865 ,  G05B2219/32247 ,  G05B2219/32306 ,  G05B2219/45031 ,  Y02P90/20 ,  Y02P90/86

摘要： The present invention is generally directed to various methods and systems for dynamically controlling metrology work in progress. In one illustrative embodiment, the method comprises providing a metrology control unit that is adapted to control metrology work flow to at least one metrology tool, identifying a plurality of wafer lots that are in a metrology queue wherein the wafer lots are intended to be processed in at least one metrology tool, and wherein the metrology control unit selects at least one of the wafer lots for metrology processing in the at least one metrology tool and selects at least one other of the plurality of wafer lots to be removed from the metrology queue based upon the metrology processing of the selected at least one wafer lot in the at least one metrology tool.

摘要翻译： 本发明一般涉及用于动态控制进行中的计量工作的各种方法和系统。 在一个说明性实施例中，该方法包括提供一个度量控制单元，其适于将测量工作流程控制到至少一个计量工具，识别处于计量队列中的多个晶片批次，其中晶片批次旨在被处理 至少一个计量工具，并且其中所述计量控制单元在所述至少一个计量工具中选择所述晶片批次中的至少一个用于度量处理，并且从所述计量学队列中选择所述多个晶片批次中的至少另一个待移除 在所述至少一个计量工具中对所选择的至少一个晶片批次进行计量处理。

公开(公告)号：US07153709B1

公开(公告)日：2006-12-26

申请号：US10930257

申请日：2004-08-31

申请人： Matthew A. Purdy ,  Richard J. Markle

发明人： Matthew A. Purdy ,  Richard J. Markle

IPC分类号： H01L21/00

CPC分类号： H01L21/67288 ,  G05B2219/50129

摘要： The present invention is generally directed to various methods and systems for calibrating degradable components using process state data. In one illustrative embodiment, the method includes providing a tool comprised of at least one process chamber, providing at least one process state sensor that is adapted to obtain process state data regarding at least one characteristic of a process environment established in the chamber in performance of a process operation, operatively coupling at least one of a new or repaired degradable component to the tool, and calibrating the new or repaired degradable component based upon the process state data. In further embodiments, the method comprises processing a plurality of additional workpieces in the tool after the new or repaired degradable components have been calibrated using process state data in accordance with one aspect of the present invention.

摘要翻译： 本发明一般涉及使用过程状态数据校准可降解组分的各种方法和系统。 在一个说明性实施例中，该方法包括提供由至少一个处理室组成的工具，提供至少一个过程状态传感器，该过程状态传感器适于获得关于室内建立的过程环境的至少一个特性的过程状态数据， 工艺操作，可操作地将新的或修复的可降解组分中的至少一种与工具结合，以及基于过程状态数据校准新的或修复的可降解组分。 在另外的实施例中，该方法包括在使用根据本发明的一个方面的过程状态数据校准新的或修复的可降解组分之后，在工具中处理多个附加工件。

公开(公告)号：US07069098B2

公开(公告)日：2006-06-27

申请号：US10909606

申请日：2004-08-02

申请人： Matthew A. Purdy

发明人： Matthew A. Purdy

IPC分类号： G06F19/00

CPC分类号： G05B19/41865 ,  Y02P90/20

摘要： The present invention is generally directed to various methods and systems for prioritizing material to clear exception conditions. In one illustrative embodiment, the method includes providing a plurality of workpieces, each of the workpieces having an associated quantity of material that cannot be processed until the workpiece has been processed, and determining a priority for processing each of the plurality of workpieces based upon at least the associated quantity of material that cannot be processed.

摘要翻译： 本发明一般涉及用于优先处理材料以清除异常情况的各种方法和系统。 在一个说明性实施例中，该方法包括提供多个工件，每个工件具有在工件被处理之前不能被加工的相关数量的材料，并且基于在...处确定用于处理多个工件中的每一个的优先级 至少不能处理的材料的相关数量。

公开(公告)号：US06988225B1

公开(公告)日：2006-01-17

申请号：US10285003

申请日：2002-10-31

申请人： Matthew A. Purdy ,  Richard J. Markle ,  Timothy L. Jackson

发明人： Matthew A. Purdy ,  Richard J. Markle ,  Timothy L. Jackson

IPC分类号： G06F11/00

CPC分类号： G05B23/0262

摘要： A method and an apparatus are provided for verifying a fault detection result in a system. The apparatus includes an interface and a control unit. The interface is adapted to receive data associated with a process operation and adapted to receive information provided by a process controller associated with the process operation. The control unit, which is communicatively coupled to the interface, is adapted to perform a fault detection analysis based on the data associated with the process operation and verify a result of the fault detection analysis based on the information provided by the process controller.

摘要翻译： 提供了一种用于验证系统中的故障检测结果的方法和装置。 该装置包括接口和控制单元。 接口适于接收与过程操作相关联的数据，并且适于接收由过程操作相关联的过程控制器提供的信息。 通信地耦合到接口的控制单元适于基于与处理操作相关联的数据执行故障检测分析，并且基于由过程控制器提供的信息来验证故障检测分析的结果。

公开(公告)号：US06790686B1

公开(公告)日：2004-09-14

申请号：US10323562

申请日：2002-12-18

申请人： Matthew A. Purdy ,  Cabe W. Nicksic

发明人： Matthew A. Purdy ,  Cabe W. Nicksic

IPC分类号： H01L2166

CPC分类号： G05B19/41865 ,  G05B2219/32266 ,  G05B2219/45031 ,  Y02P90/20

摘要： A method includes scheduling a plurality of workpieces for processing by a plurality of tools. Each workpiece has an associated priority. The processing in at least one of the tools is controlled in accordance with a process control model. A process control request associated with the controlling of the tool is generated. The priorities of at least a subset of the workpieces are determined based on the process control request. A manufacturing system includes a plurality of tools for processing workpieces, a dispatch unit, and a process control unit. The dispatch unit is configured to schedule a plurality of workpieces for processing by the tools. Each workpiece has an associated priority. The process control unit is configured to control the processing in at least one of the tools in accordance with a process control model and generate a process control request associated with the controlling of the tool. The dispatch unit is further configured to receive the process control request and determine the priorities of at least a subset of the workpieces based on the process control request.

摘要翻译： 一种方法包括调度多个工件以供多个工具进行处理。 每个工件都有一个相关的优先级。 根据过程控制模型控制至少一个工具中的处理。 产生与控制工具相关联的过程控制请求。 基于过程控制请求确定工件的至少一个子集的优先级。 制造系统包括用于处理工件的多个工具，调度单元和过程控制单元。 调度单元被配置为安排用于由工具进行处理的多个工件。 每个工件都有一个相关的优先级。 过程控制单元被配置为根据过程控制模型控制至少一个工具中的处理，并且生成与该工具的控制相关联的过程控制请求。 调度单元还被配置为基于过程控制请求接收过程控制请求并确定工件的至少一个子集的优先级。