WAFER TRANSFER SYSTEM AND A METHOD FOR TRANSPORTING WAFERS

    公开(公告)号:US20240387218A1

    公开(公告)日:2024-11-21

    申请号:US18788701

    申请日:2024-07-30

    Abstract: A cart for wafer transportation includes a cart body, a separator disposed between first and second wafer holders, an airtight lock configured to seal the cart body. A wafer transfer system includes a cart including a space for holding a wafer holder, a first workstation configured to load the wafer holder into the space and pressurize the space, and a second workstation configured to depressurize the space and unload the wafer holder from the space, wherein the cart is transportable between the first workstation and the second workstation. A method for transporting wafers includes docking a cart in a workstation; loading a wafer holder into a space of the cart; pressurizing the space to cause a pressure of the space to be greater than an atmospheric pressure; maintaining the pressure of the space at the pressure; and moving the cart carrying the wafer holder away from the workstation.

    SEMICONDUCTOR APPARATUS AND METHOD OF COLLECTING RESIDUES

    公开(公告)号:US20240387215A1

    公开(公告)日:2024-11-21

    申请号:US18784956

    申请日:2024-07-26

    Abstract: A method for collecting residues of curable material includes: performing a curing process on a semiconductor wafer in a chamber, where the semiconductor wafer is held by a wafer cassette, and residues of curable material is formed in the chamber; and collecting the residues of curable material. A first portion of the residues dripping from a ceiling of the chamber is directed toward a tray using a flow-directing structure, where the flow-directing structure is below the ceiling of the chamber, the flow-directing structure includes a central opening and a slanted surface sloped to direct the first portion of the residues toward the central opening. The first portion of the residues is collected on a collecting surface of the tray which covers the central opening of the flow-directing structure.

    Vapor deposition method and vapor deposition device

    公开(公告)号:US12142482B2

    公开(公告)日:2024-11-12

    申请号:US17603056

    申请日:2020-02-07

    Abstract: Using the first robot, the carrier standing by in the load lock chamber is deposited into the reaction chamber without mounting the wafer before processing, and cleaning gas is supplied while the reaction chamber is maintained at a predetermined cleaning temperature, and the carrier that has been cleaned in the reaction chamber is transferred to the load lock chamber using the first robot. The carrier and susceptor are cleaned at a predetermined frequency. After that, the carrier is carried out from the reaction chamber, and the reaction gas is supplied to the reaction chamber to form a polysilicon film on the surface of the susceptor.

    Mask pod and semiconductor device
    27.
    发明授权

    公开(公告)号:US12125726B2

    公开(公告)日:2024-10-22

    申请号:US17657799

    申请日:2022-04-04

    Abstract: The present disclosure relates to the technical field of semiconductors, and provides a mask pod and a semiconductor device. The mask pod includes: a body, wherein the body has an accommodation space configured to accommodate a mask, the accommodation space has a first opening, and the first opening is located on a circumferential side of the body; and a shielding member, wherein the shielding member is provided on the body and is movably provided relative to the body, to shield or release the first opening.

    COVER FOR A WAFER
    29.
    发明公开
    COVER FOR A WAFER 审中-公开

    公开(公告)号:US20240347358A1

    公开(公告)日:2024-10-17

    申请号:US18608524

    申请日:2024-03-18

    Inventor: Liang ZHOU Ling LIU

    CPC classification number: H01L21/67353

    Abstract: In some implementations, a cover for a wafer that is on a wafer frame includes a top portion configured to span an entirety of a top surface of the wafer; and a side portion configured to span an entirety of a side surface of the wafer, wherein the side portion extends at a non-zero angle from the top portion to allow the cover to enclose the wafer on the wafer frame. In some implementations, a carrier for a wafer includes the wafer, the wafer frame, and the cover.

    APPARATUS FOR MANUFACTURING THIN FILM DEVICES

    公开(公告)号:US20240339553A1

    公开(公告)日:2024-10-10

    申请号:US18297352

    申请日:2023-04-07

    Abstract: A system for manufacturing thin-film devices is provided, the system comprising: a computing device; robotic arm or conveyor system; holder which is configured to retain a first substrate; dispenser which configured to dispense a solution onto an upper surface of the first substrate; an X-Y press, which includes a base, a vertically disposed member which is attached to the base, a horizontal arm which is moveably attached to the vertically disposed member, a vertical actuator which is configured to urge the horizontal arm up and down and is attached to the vertically disposed member, a horizontal actuator which is attached to the horizontal arm, a block which is attached to the horizontal actuator, wherein the horizontal actuator is configured to urge the block horizontally; and a dryer, wherein the robotic arm or the conveyor system, the dispenser, the X-Y press and the dryer are under control of the computing device.

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