Abstract:
A memory circuitry includes memory components operable in response to first edges of an internal clock; and internal clock generating circuitry to generate the internal clock in response to a system clock, wherein the first edges of the internal clock are generated in response to both a rising and a falling edge of the system clock.
Abstract:
An IC including first and second FDSOI UTBOX cells arranged in a row, the first having an nMOS transistor arranged plumb with and above a ground plane and an N-type well, and a pMOS transistor arranged plumb with and above a ground plane and a P-type well, the N-type well and the P-type well being arranged on either side of a row axis, wherein the second includes a diode protecting against antenna effects or a well tap cell, the second cell comprising a P-type well arranged in the alignment of the P-type well of the pMOS transistor and comprising an N-type well arranged in the alignment of the N-type well of the nMOS transistor, the second cell comprising a metal connection coupled to its P-type well and coupled to a higher-level metal connection element arranged plumb with the N-type well, the metal connection extending on either side of the axis.
Abstract:
A simulation model is for an optical modulator that may include an optical phase shifter in a semiconductor material structure between two sections of an optical waveguide. The semiconductor material structure may include one of a P-N and P-I-N junction in a plane parallel to an axis of the optical waveguide. The model may include a diode configured to characterize an electrical behavior of the one of the P-N and P-I-N junction such that a change in a global refractive index of the optical phase shifter is expressed, by a coefficient, based upon an amount of charges in the one of the P-N and P-I-N junctions and raised to a power. The coefficient and the power may be empirical values based upon the semiconductor material and a wavelength.
Abstract:
A motion estimation method and device are provided for processing images to be inserted, between a preceding original image and a following original image, into a sequence of images. Each image is divided into pixel blocks associated with motion vectors. For a current block of an image being processed, motion vectors associated with blocks of the image being processed and/or associated with blocks of a processed image are selected. Candidate vectors are generated from selected motion vectors. An error is calculated for each candidate vector. A penalty is determined for a subset of candidate vectors on the basis of the values of the pixels of the pixel block in the preceding original image from which the candidate motion vector points to the current block and/or on the basis of the values of the pixels of the pixel block in the following original image to which the candidate motion vector points from the current block.
Abstract:
A first assembly of critical cells is to be monitored. An equivalent capacitance of output cells coupled to the critical path is determined. Logic level inputs of the critical cells for signal propagation are also determined. A second assembly of control logic cells is provided which copies the first assembly in terms of number of cells, type of cells and cell connection such that each of the control cells is a homolog of a corresponding critical cell. Charge cells are provided at the outputs of the control cells having an equivalent capacitance in accordance with the determined capacitance of the output cells. For each control cell, logic levels are asserted in accordance with the determined configuration of the critical path. A signal generator applies a signal the input of the second assembly and a signal receiver is coupled to the output of the second assembly.
Abstract:
An SRAM having two capacitors connected in series between respective bit storage nodes of each memory cell. The two inverters of the memory cell are powered by a positive voltage and a low voltage. The two capacitors are connected to each other at a common node. A leakage current generator is coupled to the common node. The leakage current generator supplies to the common node a leakage current to maintain a voltage which is approximately halfway between the voltages of the high and low SRAM supplies.
Abstract:
The electric behavior of a reverse-biased PN junction diode is modeled by measuring the value of voltage V present across the diode and the value of the corresponding current I running through this diode, the voltage V varying within a range of values including the value of diode breakdown voltage. A representation of a function ln ( I - I s ) according to voltage V is established from the measured values of current I and of voltage V, IS being the saturation current of the diode. A linear function representative of a substantially linear portion of the function, characterized by voltages V greater than breakdown voltage VBK in terms of absolute value, is determined. An avalanche multiplication factor MM is then calculated by MM = 1 + ( - slbv · V + bv bv ) , with parameter slbv equal to the ordinate at the origin of the linear function, and parameter slbv/bv equal to the slope of the linear function.
Abstract:
An integrated circuit includes a semiconductor substrate, a silicon layer, a buried isolating layer arranged between the substrate and the layer, a bipolar transistor comprising a collector and emitter having a first doping, and a base and a base contact having a second doping, the base forming a junction with the collector and emitter, the collector, emitter, base contact, and the base being coplanar, a well having the second doping and plumb with the collector, emitter, base contact and base, the well separating the collector, emitter and base contact from the substrate, having the second doping and extending between the base contact and base, a isolating trench plumb with the base and extending beyond the layer but without reaching a bottom of the emitter and collector, and another isolating trench arranged between the base contact, collector, and emitter, the trench extending beyond the buried layer into the well.
Abstract:
Continuous time analogue/digital converter, comprising a sigma delta modulator (MSD1) configured to receive an analogue input signal (x(t)) and comprising high-pass filtering means (MF) the chopping frequency of which is equal to half of the sampling frequency (Fs) of the quantization means (QTZ) of the modulator (MSD1).
Abstract:
A method for manufacturing a bipolar transistor, including the steps of: forming a first surface-doped region of a semiconductor substrate having a semiconductor layer extending thereon with an interposed first insulating layer; forming, at the surface of the device, a stack of a silicon layer and of a second insulating layer; defining a trench crossing the stack and the semiconductor layer opposite to the first doped region, and then an opening in the exposed region of the first insulating layer; forming a single-crystal silicon region in the opening; forming a silicon-germanium region at the surface of single-crystal silicon region, in contact with the remaining regions of the semiconductor layer and of the silicon layer; and forming a second doped region at least in the remaining space of the trench.