公开(公告)号：US11114427B2

公开(公告)日：2021-09-07

申请号：US16786060

申请日：2020-02-10

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Jin-Woo Han

IPC: H01L25/18 ,  H01L25/065 ,  H01L23/00 ,  H01L25/00

Abstract: A 3D semiconductor device, the device including: a first level including first single crystal transistors; and a second level including second single crystal transistors, where the first level is overlaid by the second level, where a vertical distance from the first single crystal transistors to the second single crystal transistors is less than four microns, where the first level includes a plurality of processors, and where the second level includes a plurality of memory cells.

公开(公告)号：US11107808B1

公开(公告)日：2021-08-31

申请号：US17246612

申请日：2021-05-01

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Brian Cronquist

IPC: H01L27/06 ,  H01L27/02 ,  H01L25/16 ,  H01L23/00 ,  H01L23/48 ,  H01L23/522 ,  H01L23/367

Abstract: A 3D semiconductor device including: a first level, where the first level includes a first layer and first transistors, and where the first level includes a second layer including first interconnections; a second level overlaying the first level, where the second level includes a third layer, the third layer including second transistors, and where the second level includes a fourth layer, the fourth layer including second interconnections; a plurality of connection paths, where the plurality of connection paths provides connections from a plurality of the first transistors to a plurality of the second transistors, where the second level is bonded to the first level, where the bonded includes oxide to oxide bond regions, where the bonded includes metal to metal bond regions, where the second level includes at least one memory array, where the third layer includes crystalline silicon; and where the second level includes at least one SerDes circuit.

公开(公告)号：US11107803B2

公开(公告)日：2021-08-31

申请号：US17214883

申请日：2021-03-28

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Jin-Woo Han ,  Brian Cronquist

IPC: H01L21/30 ,  H01L25/18 ,  H01L21/66 ,  H01L23/00 ,  H01L25/065 ,  H01L25/00 ,  H01L21/78

Abstract: A method to construct a 3D system, the method including: providing a base wafer; and then transferring a memory control on top; and then thinning the memory control, transferring a first memory wafer on top; and then thinning the first memory wafer; and then transferring a second memory wafer on top; and then thinning the second memory wafer. A 3D device, the device including: a first stratum including first bit-cell memory arrays; a second stratum including second bit-cell memory arrays; and a third stratum, where the second stratum overlays the first stratum, where the first stratum overlays the third stratum, where the third stratum includes a plurality of word-line decoders to control the first bit-cell memory arrays and the second bit-cell memory arrays.

公开(公告)号：US20210226050A1

公开(公告)日：2021-07-22

申请号：US17222784

申请日：2021-04-05

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach

IPC: H01L29/78 ,  H01L27/11 ,  H01L27/11578 ,  G11C16/02 ,  G11C11/404 ,  H01L27/24 ,  G11C11/4097 ,  H01L27/108 ,  H01L27/115

Abstract: A 3D semiconductor device including: a first level including a first single-crystal layer, a plurality of first transistors, and at least one metal layer, the metal layer overlaying the first single crystal layer with interconnects between the first transistors forming control circuits; a second level overlaying the metal layer, a plurality of second transistors, and a plurality of first memory cells including at least one of the second transistors; a third level overlaying the second level and including a plurality of third transistors, including second memory cells each including at least one third transistor, where at least one of the second memory cells is at least partially atop of the control circuits, where the control circuits are connected so to control second transistors and third transistors, where the second level is bonded to the third level and to the first level, where the bonded includes oxide to oxide bonds; and a fourth level above the third level, including a second single-crystal layer.

公开(公告)号：US20210193498A1

公开(公告)日：2021-06-24

申请号：US17195628

申请日：2021-03-08

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Brian Cronquist ,  Deepak C. Sekar

IPC: H01L21/683 ,  H01L21/74 ,  H01L21/762 ,  H01L21/768 ,  H01L21/822 ,  H01L21/8238 ,  H01L21/84 ,  H01L23/48 ,  H01L23/525 ,  H01L27/02 ,  H01L27/06 ,  H01L27/092 ,  H01L27/10 ,  H01L27/105 ,  H01L27/108 ,  H01L27/11 ,  H01L27/112 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551 ,  H01L27/11573 ,  H01L27/11578 ,  H01L27/118 ,  H01L27/12 ,  H01L29/423 ,  H01L29/66 ,  H01L29/78 ,  H01L29/788 ,  H01L29/792 ,  G11C8/16

Abstract: A 3D semiconductor device, the device including: a first level including a first single crystal layer, the first level including first transistors, where the first transistors each include a single crystal channel; first metal layers interconnecting at least the first transistors; and a second level including a second single crystal layer, the second level including second transistors, where the second level overlays the first level, where the second level is bonded to the first level, where the bonded includes oxide to oxide bonds, where the bonded includes metal to metal bonds, and where at least one of the first transistors controls power delivery to at least one of the second transistors.

公开(公告)号：US11018156B2

公开(公告)日：2021-05-25

申请号：US17099706

申请日：2020-11-16

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Jin-Woo Han ,  Eli Lusky

IPC: G11C16/04 ,  H01L27/11582 ,  H01L27/1157 ,  H01L29/423 ,  G11C7/18 ,  H01L27/11565

Abstract: A 3D memory device, the device including: a plurality of memory cells, where each of the plurality of memory cells includes at least one memory transistor, where each of the at least one memory transistor includes a source and a drain; a plurality of bit-line pillars, where each of the plurality of bit-line pillars is directly connected to a plurality of the source or the drain, where each of the plurality of bit-line pillars includes metal atoms such that the plurality of bit-line pillars have at least partial metallic properties; and a thermal path from the bit-line pillars to an external surface of the device to remove heat. Various 3D processing flows and methods are also disclosed.

公开(公告)号：US10998374B1

公开(公告)日：2021-05-04

申请号：US17113045

申请日：2020-12-05

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Deepak C. Sekar

IPC: H01L27/146 ,  H01L27/15 ,  H01L25/075 ,  H01L33/62 ,  H01L33/38

Abstract: A 3D micro display, the 3D micro display including: a first single crystal layer including at least one LED driving circuit; a second single crystal layer including a first plurality of light emitting diodes (LEDs), where the second single crystal layer includes at least ten individual first LED pixels; and a second plurality of light emitting diodes (LEDs), where the first plurality of light emitting diodes (LEDs) emits a first light with a first wavelength, where the second plurality of light emitting diodes (LEDs) emits a second light with a second wavelength, where the first wavelength and the second wavelength differ by greater than 10 nm, and where the 3D micro display includes an oxide to oxide bonding structure.

公开(公告)号：US10978501B1

公开(公告)日：2021-04-13

申请号：US17121726

申请日：2020-12-14

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Deepak C. Sekar ,  Brian Cronquist

IPC: H01L27/146 ,  H01L21/762 ,  H01L23/00 ,  H01L21/84 ,  H01L25/16 ,  H01L25/065 ,  G02B6/12 ,  H01L33/06 ,  G02F1/017

Abstract: A multi-level semiconductor device, the device including: a first level including integrated circuits; a second level including an electromagnetic waveguide, where the second level is disposed above the first level, where the first level includes crystalline silicon; and an oxide layer disposed between the first level and the second level, where the second level is bonded to the oxide layer, and where the bonded includes oxide to oxide bonds.

公开(公告)号：US10950581B2

公开(公告)日：2021-03-16

申请号：US17065424

申请日：2020-10-07

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Brian Cronquist

IPC: H01L25/065 ,  H01L23/00 ,  H01L21/66 ,  H01L25/00

Abstract: A 3D semiconductor device including: a first level including a first layer, the first layer including first transistors, and where the first level includes a second layer, the second layer including first interconnections; a second level overlaying the first level, where the second level includes a third layer, the third layer including second transistors, where the second level includes a fourth layer, the fourth layer including second interconnections; and a plurality of connection paths, where the plurality of connection paths provides connections from a plurality of the first transistors to a plurality of the second transistors, where the second level is bonded to the first level, where the bonded includes oxide to oxide bond regions, where the bonded includes metal to metal bond regions, where the second level includes at least one memory array, where the third layer includes crystalline silicon, where the second layer includes radio frequency type circuits.

公开(公告)号：US10833108B2

公开(公告)日：2020-11-10

申请号：US16860027

申请日：2020-04-27

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Deepak C. Sekar

IPC: H01L27/146 ,  H01L27/15 ,  H01L27/12 ,  H01L27/28

Abstract: A 3D micro display, the 3D micro display including: a first single crystal layer including at least one LED driving circuit; a second single crystal layer including a first plurality of light emitting diodes (LEDs), where the second single crystal layer is on top of the first single crystal layer, where the second single crystal layer includes at least ten individual first LED pixels; and a second plurality of light emitting diodes (LEDs), where the 3D micro display includes an oxide to oxide bonding structure.