Developer composition for irradiated, radiation-sensitive
positive-working, negative-working and reversible reprographic layers
    31.
    发明授权
    Developer composition for irradiated, radiation-sensitive positive-working, negative-working and reversible reprographic layers 失效
    用于辐射,辐射敏感的正面工作,负面工作和可逆复制层的显影剂组合物

    公开(公告)号:US5292626A

    公开(公告)日:1994-03-08

    申请号:US750313

    申请日:1991-08-27

    CPC classification number: G03F7/322

    Abstract: The present invention relates to a developer composition for radiation-sensitive positive-working and negative-working and reversible reprographic layers which apart from a radiation-sensitive compound or radiation-sensitive combination of compounds contain, as an essential constituent, a binder which is insoluble in water but soluble in aqueous-alkaline solutions, said developer composition being characterized in that it contains, as essential constituents,(a) O- carboxymethyl- or O,O'-biscarboxymethylethylene glycol or an appropriately substituted polyethylene glycol comprising 2 to about 500 ethylene glycol units,(b) at least one compound showing an alkaline reaction in water, selected from the group including alkali metal hydroxides, alkali metal silicates, alkali metal phosphates, alkali metal borates, ammonium hydroxides, ammonium silicates, ammonium phosphates and ammonium borates, and(c) water.The developer composition gives a very good yield, makes possible short developing times and does not cause any problems due to flaky deposits of layer constituents or foaming. A process for developing positive-working, negative-working and reversible reprographic layers with the developer composition is also disclosed.

    Abstract translation: 本发明涉及一种用于辐射敏感的阳性作用和负性和可逆复制层的显影剂组合物,除了辐射敏感化合物或化合物的辐射敏感组合之外,其包含作为必需成分的不溶性粘合剂的粘合剂 所述显影剂组合物的特征在于其含有(a)O-羧甲基或O,O-双羧基甲基乙二醇或适当取代的聚乙二醇,其包含2至约500个 乙二醇单元,(b)至少一种在水中显示碱性反应的化合物,其选自碱金属氢氧化物,碱金属硅酸盐,碱金属磷酸盐,碱金属硼酸盐,氢氧化铵,硅酸铵,磷酸铵和硼酸铵 ,(c)水。 显影剂组合物产生非常好的产率,使得可能短的显影时间,并且不会由于层成分的片状沉积或发泡而引起任何问题。 还公开了利用显影剂组合物开发正性,负性和可逆复制层的方法。

    Radiation-sensitive positive working composition and copying material
    32.
    发明授权
    Radiation-sensitive positive working composition and copying material 失效
    辐射敏感积极的工作组合物和复制材料

    公开(公告)号:US5068163A

    公开(公告)日:1991-11-26

    申请号:US362688

    申请日:1989-06-07

    CPC classification number: G03F7/0233 G03F7/0045

    Abstract: The invention relates to a positive-working radiation-sensitive mixture and a copying material produced therefrom on a layer support. The mixture contains as essential constituents a 1,2-quinone diazide or a combination of:1) a compound forming strong acid when exposed to actinic radiation and2) a compound containing at least one acid-cleavable C--O--C bond,and a binder with repeating units of the general formula I ##STR1## wherein R.sub.1 denotes a hydrogen or halogen atom, or a cyanide or an alkyl group,R.sub.2, R.sub.3, R.sub.4 are identical or different and denote hydrogen, or alkyl or aryl groups,R.sub.5, R.sub.6 and optionally R.sub.7 are identical or different and denote hydrogen or halogen atoms, or alkyl, aryl or alkoxy groups, andX denotes the atoms necessary to complete a mononuclear or polynuclear carbocyclic aromatic ring system, andn is 1, 2 or 3.The mixture according to the invention yields lithographic printing plates with a high print run which can be thermally post-cured and have good resistance to chemicals, also photoresists with high heat resistance.

    Abstract translation: 本发明涉及一种正性辐射敏感混合物及其在层载体上由其制备的复印材料。 该混合物含有作为必要成分的1,2-醌二叠氮化物或其组合:1)当暴露于光化辐射时形成强酸的化合物和2)含有至少一个可酸切割的COC键的化合物和具有重复的粘合剂 其中R 1表示氢或卤素原子,或氰化物或烷基,R 2,R 3,R 4相同或不同,表示氢或烷基或芳基,R 5,R 6和 任选的R 7相同或不同,表示氢或卤素原子,或烷基,芳基或烷氧基,X表示完成单核或多核碳环芳环体系所必需的原子,n为1,2或3。 本发明产生具有高印刷速度的平版印刷版,其可以热后固化并且具有良好的耐化学品性,以及具有高耐热性的光致抗蚀剂。

Patent Agency Ranking