Abstract:
A semiconductor optical device and an optical device array is provided which can be used in an optical logic circuit, photonic switching OEIB, etc. The device includes a light amplifying arrangement provided on a bypass wavelength that connects a plurality of optical waveguides, thereby enabling improvement of the light crosstalk and the light propagation loss. In particular, by virtue of providing a light amplifying means in addition to the light deflecting portion, noise components are not amplified, and, therefore, the SN radio is markedly increased.
Abstract:
An optical device has multilayer films formed by periodically laminating a number of layers each comprising at least two kinds of optical crystal thin films (f.sub.n, g.sub.n) having different refractive indices onto a substrate. The multilayer films include a semiconductor material having a large non-linear optical coefficient as a composing material and have artificial optical anisotropy. Since the multilayer films of the optical device have a large non-linear coefficient and optical anisotropy, a non-linear phenomenon such as second-harmonic generation or the like can be efficiently caused.
Abstract:
An optical waveguide comprising a layer formed on a substrate, having a mixed composition of silicon oxide and silicon nitride and having an arbitrary value of refractive index ranging between those of the silicon oxide and the silicon nitride. The layer of said mixed composition can be formed on the substrate to easily fabricate the optical waveguide of the present invention by conducting a sputtering method employing a Si target and controlling the composition of a sputtering gas composed of a mixture of N.sub.2 and O.sub.2 gases.
Abstract:
An optical switch wherein a stripe layer of a compound semiconductor whose refractive index is changed by changing a carrier concentration thereof is disposed so as to cut off both optical waveguides at a position of a longer diagonal line of an intersection portion between the optical waveguides formed on a substrate of a compound semiconductor and intersecting each other at a predetermined angle, and the refractive index is changed by causing current to flow to the stripe layer.
Abstract:
An optical waveguide obtained by forming on a substrate an amorphous silicon film which contains a predetermined quantity of at least one of the elements of hydrogen, nitrogen and oxygen so that the amorphous silicon film has a predetermined value of refractive index. The optical waveguide can be made easily by carrying out a sputtering operation, in which Si is used as a target with a mixed gas of argon and at least one of hydrogen, nitrogen and oxygen, or a mixed gas of hydrogen and at least one of nitrogen and oxygen used as a sputtering gas, the composition of the sputtering gas being controlled in a predetermined manner during the sputtering operation.
Abstract:
A method of producing an optical fiber comprising (i) the step of depositing a glass film of desired refractive index onto the inner wall surface of a quartz tube by the CVD (chemical vapor deposition) process, (ii) the step of heating the quartz tube to a high temperature while the gas of a compound which forms an oxide, enhancing the refractive index of the glass film, in an oxidizing atmosphere at the high temperature is kept flowing into the quartz tube along with an oxidizing gas, (iii) the step of heating and collapsing the quartz tube into a solid rod or the so-called preform, and (iv) the step of heating and drawing the optical fiber preform into the optical fiber.In the optical fiber produced by this method of manufacture, the lowering of the refractive index of the central part of the optical fiber is sharply reduced.At the step (iii), one end of the quartz tube is sealed and a gas is introduced into the tube from the other end so as to slightly raise the internal pressure of the tube, whereby a more favorable result is obtained.
Abstract:
An information is written or erased in such way that, while a memory employing electrooptic ceramics wherein a ferroelectric phase and an anti-ferroelectric phase (or paraelectric phase) coexist having a morphotropic phase boundary is being heated to a temperature at which the polymorphic base boundary of the ceramic material occurs, an electric field opposite in polarity to the spontaneous polarization of the memory is applied to the material.According to the writing or erasing method, the writing of the information into the memory employing the material or the erasure of the information can be perfectly performed.